Optical lithography: here is why
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the...
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE
2010
|
| Series: | SPIE Press monograph
PM190 |
| Subjects: | |
| Online Access: | FHD01 Volltext |
| Summary: | This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future |
| Physical Description: | 1 online resource (xiv, 477 pages) illustrations |
| ISBN: | 9780819481825 |
| DOI: | 10.1117/3.821000 |
Staff View
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV044232927 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 170320s2010 |||| o||u| ||||||eng d | ||
| 020 | |a 9780819481825 |9 978-0-8194-8182-5 | ||
| 024 | 7 | |a 10.1117/3.821000 |2 doi | |
| 035 | |a (ZDB-50-SPI)9780819481825 | ||
| 035 | |a (OCoLC)812346839 | ||
| 035 | |a (DE-599)BVBBV044232927 | ||
| 040 | |a DE-604 |b ger |e rda | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1050 | ||
| 082 | 0 | |a 621.3815/31 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 100 | 1 | |a Lin, Burn Jeng |d 1942- |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Optical lithography |b here is why |c Burn J. Lin |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 2010 | |
| 300 | |a 1 online resource (xiv, 477 pages) |b illustrations | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a SPIE Press monograph |v PM190 | |
| 520 | |a This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future | ||
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Semiconductors / Etching | |
| 650 | 4 | |a Lasers / Industrial applications | |
| 650 | 0 | 7 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Laserstrahlätzen |0 (DE-588)4568583-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Maskentechnik |0 (DE-588)4125845-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | 1 | |a Laserstrahlätzen |0 (DE-588)4568583-6 |D s |
| 689 | 0 | 2 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |D s |
| 689 | 0 | 3 | |a Maskentechnik |0 (DE-588)4125845-9 |D s |
| 689 | 0 | |8 1\p |5 DE-604 | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe |z 978-0-8194-7560-2 |
| 856 | 4 | 0 | |u https://doi.org/10.1117/3.821000 |x Verlag |z URL des Erstveröffentlichers |3 Volltext |
| 912 | |a ZDB-50-SPI | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-029638504 | ||
| 883 | 1 | |8 1\p |a cgwrk |d 20201028 |q DE-101 |u https://d-nb.info/provenance/plan#cgwrk | |
| 966 | e | |u https://doi.org/10.1117/3.821000 |l FHD01 |p ZDB-50-SPI |x Verlag |3 Volltext | |
Record in the Search Index
| _version_ | 1804177388495437824 |
|---|---|
| any_adam_object | |
| author | Lin, Burn Jeng 1942- |
| author_facet | Lin, Burn Jeng 1942- |
| author_role | aut |
| author_sort | Lin, Burn Jeng 1942- |
| author_variant | b j l bj bjl |
| building | Verbundindex |
| bvnumber | BV044232927 |
| classification_rvk | ZN 4170 |
| collection | ZDB-50-SPI |
| ctrlnum | (ZDB-50-SPI)9780819481825 (OCoLC)812346839 (DE-599)BVBBV044232927 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.821000 |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02632nmm a2200529zcb4500</leader><controlfield tag="001">BV044232927</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">170320s2010 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780819481825</subfield><subfield code="9">978-0-8194-8182-5</subfield></datafield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1117/3.821000</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(ZDB-50-SPI)9780819481825</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)812346839</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV044232927</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rda</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Lin, Burn Jeng</subfield><subfield code="d">1942-</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Optical lithography</subfield><subfield code="b">here is why</subfield><subfield code="c">Burn J. Lin</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE</subfield><subfield code="c">2010</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (xiv, 477 pages)</subfield><subfield code="b">illustrations</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">SPIE Press monograph</subfield><subfield code="v">PM190</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors / Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lasers / Industrial applications</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Laserstrahlätzen</subfield><subfield code="0">(DE-588)4568583-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Maskentechnik</subfield><subfield code="0">(DE-588)4125845-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Lithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4191584-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Laserstrahlätzen</subfield><subfield code="0">(DE-588)4568583-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="3"><subfield code="a">Maskentechnik</subfield><subfield code="0">(DE-588)4125845-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe</subfield><subfield code="z">978-0-8194-7560-2</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://doi.org/10.1117/3.821000</subfield><subfield code="x">Verlag</subfield><subfield code="z">URL des Erstveröffentlichers</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-50-SPI</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-029638504</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">https://doi.org/10.1117/3.821000</subfield><subfield code="l">FHD01</subfield><subfield code="p">ZDB-50-SPI</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV044232927 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T07:47:17Z |
| institution | BVB |
| isbn | 9780819481825 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029638504 |
| oclc_num | 812346839 |
| open_access_boolean | |
| owner | DE-1050 |
| owner_facet | DE-1050 |
| physical | 1 online resource (xiv, 477 pages) illustrations |
| psigel | ZDB-50-SPI |
| publishDate | 2010 |
| publishDateSearch | 2010 |
| publishDateSort | 2010 |
| publisher | SPIE |
| record_format | marc |
| series2 | SPIE Press monograph |
| spelling | Lin, Burn Jeng 1942- Verfasser aut Optical lithography here is why Burn J. Lin Bellingham, Wash. SPIE 2010 1 online resource (xiv, 477 pages) illustrations txt rdacontent c rdamedia cr rdacarrier SPIE Press monograph PM190 This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future Microlithography Semiconductors / Etching Lasers / Industrial applications Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Laserstrahlätzen (DE-588)4568583-6 gnd rswk-swf Maskentechnik (DE-588)4125845-9 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Laserstrahlätzen (DE-588)4568583-6 s Halbleitertechnologie (DE-588)4158814-9 s Maskentechnik (DE-588)4125845-9 s 1\p DE-604 Erscheint auch als Druck-Ausgabe 978-0-8194-7560-2 https://doi.org/10.1117/3.821000 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Lin, Burn Jeng 1942- Optical lithography here is why Microlithography Semiconductors / Etching Lasers / Industrial applications Halbleitertechnologie (DE-588)4158814-9 gnd Laserstrahlätzen (DE-588)4568583-6 gnd Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4158814-9 (DE-588)4568583-6 (DE-588)4125845-9 (DE-588)4191584-7 |
| title | Optical lithography here is why |
| title_auth | Optical lithography here is why |
| title_exact_search | Optical lithography here is why |
| title_full | Optical lithography here is why Burn J. Lin |
| title_fullStr | Optical lithography here is why Burn J. Lin |
| title_full_unstemmed | Optical lithography here is why Burn J. Lin |
| title_short | Optical lithography |
| title_sort | optical lithography here is why |
| title_sub | here is why |
| topic | Microlithography Semiconductors / Etching Lasers / Industrial applications Halbleitertechnologie (DE-588)4158814-9 gnd Laserstrahlätzen (DE-588)4568583-6 gnd Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Microlithography Semiconductors / Etching Lasers / Industrial applications Halbleitertechnologie Laserstrahlätzen Maskentechnik Lithografie Halbleitertechnologie |
| url | https://doi.org/10.1117/3.821000 |
| work_keys_str_mv | AT linburnjeng opticallithographyhereiswhy |