Plasma processes for semiconductor fabrication:
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be a...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Cambridge
Cambridge University Press
1999
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| Schriftenreihe: | Cambridge studies in semiconductor physics and microelectronic engineering
8 |
| Schlagworte: | |
| Online-Zugang: | BSB01 FHN01 URL des Erstveröffentlichers |
| Zusammenfassung: | Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry |
| Beschreibung: | Title from publisher's bibliographic system (viewed on 05 Oct 2015) |
| Beschreibung: | 1 online resource (ix, 221 pages) |
| ISBN: | 9780511529511 |
| DOI: | 10.1017/CBO9780511529511 |
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| 505 | 8 | |a 1. Introduction -- 2. Plasma Processes for Semiconductors -- 3. Plasma Electromagnetics and Circuit Models -- 4. Plasma Models -- 5. Plasma Chemistry -- 6. Transport at Long Mean Free Path -- 7. Evolution of the Trench -- 8. Physical Description of the Plasma -- 9. Going Further | |
| 520 | |a Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry | ||
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Datensatz im Suchindex
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| author | Hitchon, W. Nicholas G. |
| author_facet | Hitchon, W. Nicholas G. |
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| author_sort | Hitchon, W. Nicholas G. |
| author_variant | w n g h wng wngh |
| building | Verbundindex |
| bvnumber | BV043941820 |
| classification_rvk | ZM 7680 |
| collection | ZDB-20-CBO |
| contents | 1. Introduction -- 2. Plasma Processes for Semiconductors -- 3. Plasma Electromagnetics and Circuit Models -- 4. Plasma Models -- 5. Plasma Chemistry -- 6. Transport at Long Mean Free Path -- 7. Evolution of the Trench -- 8. Physical Description of the Plasma -- 9. Going Further |
| ctrlnum | (ZDB-20-CBO)CR9780511529511 (OCoLC)849941431 (DE-599)BVBBV043941820 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| doi_str_mv | 10.1017/CBO9780511529511 |
| format | Electronic eBook |
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| id | DE-604.BV043941820 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:39:16Z |
| institution | BVB |
| isbn | 9780511529511 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-029350790 |
| oclc_num | 849941431 |
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| owner_facet | DE-12 DE-92 |
| physical | 1 online resource (ix, 221 pages) |
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| publishDate | 1999 |
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| publisher | Cambridge University Press |
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| series2 | Cambridge studies in semiconductor physics and microelectronic engineering |
| spelling | Hitchon, W. Nicholas G. Verfasser aut Plasma processes for semiconductor fabrication W.N.G. Hitchon Cambridge Cambridge University Press 1999 1 online resource (ix, 221 pages) txt rdacontent c rdamedia cr rdacarrier Cambridge studies in semiconductor physics and microelectronic engineering 8 Title from publisher's bibliographic system (viewed on 05 Oct 2015) 1. Introduction -- 2. Plasma Processes for Semiconductors -- 3. Plasma Electromagnetics and Circuit Models -- 4. Plasma Models -- 5. Plasma Chemistry -- 6. Transport at Long Mean Free Path -- 7. Evolution of the Trench -- 8. Physical Description of the Plasma -- 9. Going Further Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry Semiconductors / Etching Plasma etching Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf Fertigung (DE-588)4016899-2 gnd rswk-swf Halbleiter (DE-588)4022993-2 s Fertigung (DE-588)4016899-2 s Plasmaätzen (DE-588)4174821-9 s 1\p DE-604 Erscheint auch als Druckausgabe 978-0-521-01800-5 Erscheint auch als Druckausgabe 978-0-521-59175-1 https://doi.org/10.1017/CBO9780511529511 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Hitchon, W. Nicholas G. Plasma processes for semiconductor fabrication 1. Introduction -- 2. Plasma Processes for Semiconductors -- 3. Plasma Electromagnetics and Circuit Models -- 4. Plasma Models -- 5. Plasma Chemistry -- 6. Transport at Long Mean Free Path -- 7. Evolution of the Trench -- 8. Physical Description of the Plasma -- 9. Going Further Semiconductors / Etching Plasma etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiter (DE-588)4022993-2 gnd Fertigung (DE-588)4016899-2 gnd |
| subject_GND | (DE-588)4174821-9 (DE-588)4022993-2 (DE-588)4016899-2 |
| title | Plasma processes for semiconductor fabrication |
| title_auth | Plasma processes for semiconductor fabrication |
| title_exact_search | Plasma processes for semiconductor fabrication |
| title_full | Plasma processes for semiconductor fabrication W.N.G. Hitchon |
| title_fullStr | Plasma processes for semiconductor fabrication W.N.G. Hitchon |
| title_full_unstemmed | Plasma processes for semiconductor fabrication W.N.G. Hitchon |
| title_short | Plasma processes for semiconductor fabrication |
| title_sort | plasma processes for semiconductor fabrication |
| topic | Semiconductors / Etching Plasma etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiter (DE-588)4022993-2 gnd Fertigung (DE-588)4016899-2 gnd |
| topic_facet | Semiconductors / Etching Plasma etching Plasmaätzen Halbleiter Fertigung |
| url | https://doi.org/10.1017/CBO9780511529511 |
| work_keys_str_mv | AT hitchonwnicholasg plasmaprocessesforsemiconductorfabrication |