Silicon technologies: ion implantation and thermal treatment
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Bibliographic Details
Format: Electronic eBook
Language:English
Published: London ISTE 2011
Subjects:
Online Access:FRO01
UBG01
Volltext
Item Description:Title from PDF title page (viewed on Feb. 28, 2013)
Includes bibliographical references and index
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion
Physical Description:1 Online-Ressource
ISBN:9781118601044
1118601041
9781118601112
1118601114
9781118601143
1118601149
9781848212312

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