Computational lithography:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Hoboken, N.J.
Wiley
©2010
|
| Schriftenreihe: | Wiley series in pure and applied optics
|
| Schlagworte: | |
| Online-Zugang: | FRO01 UBG01 Volltext |
| Beschreibung: | Includes bibliographical references and index A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting |
| Beschreibung: | 1 Online-Ressource (xv, 226 pages) |
| ISBN: | 9780470618943 0470618949 9780470618936 0470618930 9781118043578 111804357X |
Internformat
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| 300 | |a 1 Online-Ressource (xv, 226 pages) | ||
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| 490 | 0 | |a Wiley series in pure and applied optics | |
| 500 | |a Includes bibliographical references and index | ||
| 500 | |a A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting | ||
| 650 | 4 | |a Design and construction | |
| 650 | 4 | |a Etching | |
| 650 | 4 | |a Integrated circuits | |
| 650 | 4 | |a Mathematics | |
| 650 | 4 | |a Microlithography | |
| 650 | 4 | |a Photolithography | |
| 650 | 4 | |a Semiconductors | |
| 650 | 4 | |a Electrical engineering | |
| 650 | 4 | |a Engineering | |
| 650 | 4 | |a Photolithography / Mathematics | |
| 650 | 4 | |a Integrated circuits / Design and construction / Mathematics | |
| 650 | 4 | |a Semiconductors / Etching / Mathematics | |
| 650 | 4 | |a Resolution (Optics) | |
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| 650 | 4 | |a Ingenieurwissenschaften | |
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| 650 | 4 | |a Integrated circuits / Design and construction / Mathematics | |
| 650 | 4 | |a Photolithography / Mathematics | |
| 650 | 4 | |a Semiconductors / Etching / Mathematics | |
| 650 | 4 | |a Resolution (Optics) | |
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Datensatz im Suchindex
| _version_ | 1804175969147158528 |
|---|---|
| any_adam_object | |
| author | Ma, Xu |
| author_facet | Ma, Xu |
| author_role | aut |
| author_sort | Ma, Xu |
| author_variant | x m xm |
| building | Verbundindex |
| bvnumber | BV043392582 |
| collection | ZDB-35-WIC |
| ctrlnum | (ZDB-35-WIC)ocn689995793 (OCoLC)839015060 (DE-599)BVBBV043392582 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:24:44Z |
| institution | BVB |
| isbn | 9780470618943 0470618949 9780470618936 0470618930 9781118043578 111804357X |
| language | English |
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| physical | 1 Online-Ressource (xv, 226 pages) |
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| publisher | Wiley |
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| series2 | Wiley series in pure and applied optics |
| spelling | Ma, Xu Verfasser aut Computational lithography Xu Ma and Gonzalo R. Arce Hoboken, N.J. Wiley ©2010 1 Online-Ressource (xv, 226 pages) txt rdacontent c rdamedia cr rdacarrier Wiley series in pure and applied optics Includes bibliographical references and index A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting Design and construction Etching Integrated circuits Mathematics Microlithography Photolithography Semiconductors Electrical engineering Engineering Photolithography / Mathematics Integrated circuits / Design and construction / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Ingenieurwissenschaften Mathematik Microlithography / Mathematics Electronic books Arce, Gonzalo R. Sonstige oth Erscheint auch als Druck-Ausgabe, Hardcover 978-0-470-59697-5 Erscheint auch als Druck-Ausgabe, Hardcover 0-470-59697-X https://onlinelibrary.wiley.com/doi/book/10.1002/9780470618943 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | Ma, Xu Computational lithography Design and construction Etching Integrated circuits Mathematics Microlithography Photolithography Semiconductors Electrical engineering Engineering Photolithography / Mathematics Integrated circuits / Design and construction / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Ingenieurwissenschaften Mathematik Microlithography / Mathematics |
| title | Computational lithography |
| title_auth | Computational lithography |
| title_exact_search | Computational lithography |
| title_full | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_fullStr | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_full_unstemmed | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_short | Computational lithography |
| title_sort | computational lithography |
| topic | Design and construction Etching Integrated circuits Mathematics Microlithography Photolithography Semiconductors Electrical engineering Engineering Photolithography / Mathematics Integrated circuits / Design and construction / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Ingenieurwissenschaften Mathematik Microlithography / Mathematics |
| topic_facet | Design and construction Etching Integrated circuits Mathematics Microlithography Photolithography Semiconductors Electrical engineering Engineering Photolithography / Mathematics Integrated circuits / Design and construction / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) TECHNOLOGY & ENGINEERING / Electronics / Circuits / General Ingenieurwissenschaften Mathematik Microlithography / Mathematics |
| url | https://onlinelibrary.wiley.com/doi/book/10.1002/9780470618943 |
| work_keys_str_mv | AT maxu computationallithography AT arcegonzalor computationallithography |