Etching in microsystem technology:
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Weinheim
Wiley-VCH
©1999
|
| Subjects: | |
| Online Access: | FRO01 UBG01 Volltext |
| Item Description: | Includes bibliographical references ([345]-360) and index Microcomponents and microdevices are increasingly finding application in everyday life. The specific functions of all modern microdevices depend strongly on the selection and combination of the materials used in their construction, i.e., the chemical and physical solid-state properties of these materials, and their treatment. The precise patterning of various materials, which is normally performed by lithographic etching processes, is a prerequisite for the fabrication of microdevices. The microtechnical etching of functional patterns is a multidisciplinary area, the basis for the etching proc |
| Physical Description: | 1 Online-Ressource (xvi, 368 pages) |
| ISBN: | 9783527613786 3527613781 9783527613793 352761379X 3527295615 9783527295616 |
Staff View
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| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Circuits / General |2 bisacsh | |
| 650 | 7 | |a Masks (Electronics) |2 fast | |
| 650 | 7 | |a Microlithography |2 fast | |
| 650 | 7 | |a Plasma etching |2 fast | |
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Record in the Search Index
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| author | Köhler, J. M. |
| author_facet | Köhler, J. M. |
| author_role | aut |
| author_sort | Köhler, J. M. |
| author_variant | j m k jm jmk |
| building | Verbundindex |
| bvnumber | BV043387500 |
| collection | ZDB-35-WIC |
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| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| id | DE-604.BV043387500 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:24:33Z |
| institution | BVB |
| isbn | 9783527613786 3527613781 9783527613793 352761379X 3527295615 9783527295616 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028806084 |
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| physical | 1 Online-Ressource (xvi, 368 pages) |
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| publisher | Wiley-VCH |
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| spelling | Köhler, J. M. Verfasser aut Ätzverfahren für die Mikrotechnik Etching in microsystem technology Michael Köhler ; translated by Antje Wiegand Weinheim Wiley-VCH ©1999 1 Online-Ressource (xvi, 368 pages) txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references ([345]-360) and index Microcomponents and microdevices are increasingly finding application in everyday life. The specific functions of all modern microdevices depend strongly on the selection and combination of the materials used in their construction, i.e., the chemical and physical solid-state properties of these materials, and their treatment. The precise patterning of various materials, which is normally performed by lithographic etching processes, is a prerequisite for the fabrication of microdevices. The microtechnical etching of functional patterns is a multidisciplinary area, the basis for the etching proc TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Masks (Electronics) fast Microlithography fast Plasma etching fast Circuitos eletrônicos larpcal Ätzen swd Mikrosystemtechnik swd Masks (Electronics) Microlithography Plasma etching Ätzen (DE-588)4000648-7 gnd rswk-swf Mikrosystemtechnik (DE-588)4221617-5 gnd rswk-swf Mikrosystemtechnik (DE-588)4221617-5 s Ätzen (DE-588)4000648-7 s 1\p DE-604 https://onlinelibrary.wiley.com/doi/book/10.1002/9783527613786 Verlag URL des Erstveröffentlichers Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Köhler, J. M. Etching in microsystem technology TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Masks (Electronics) fast Microlithography fast Plasma etching fast Circuitos eletrônicos larpcal Ätzen swd Mikrosystemtechnik swd Masks (Electronics) Microlithography Plasma etching Ätzen (DE-588)4000648-7 gnd Mikrosystemtechnik (DE-588)4221617-5 gnd |
| subject_GND | (DE-588)4000648-7 (DE-588)4221617-5 |
| title | Etching in microsystem technology |
| title_alt | Ätzverfahren für die Mikrotechnik |
| title_auth | Etching in microsystem technology |
| title_exact_search | Etching in microsystem technology |
| title_full | Etching in microsystem technology Michael Köhler ; translated by Antje Wiegand |
| title_fullStr | Etching in microsystem technology Michael Köhler ; translated by Antje Wiegand |
| title_full_unstemmed | Etching in microsystem technology Michael Köhler ; translated by Antje Wiegand |
| title_short | Etching in microsystem technology |
| title_sort | etching in microsystem technology |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Circuits / General bisacsh Masks (Electronics) fast Microlithography fast Plasma etching fast Circuitos eletrônicos larpcal Ätzen swd Mikrosystemtechnik swd Masks (Electronics) Microlithography Plasma etching Ätzen (DE-588)4000648-7 gnd Mikrosystemtechnik (DE-588)4221617-5 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Circuits / General Masks (Electronics) Microlithography Plasma etching Circuitos eletrônicos Ätzen Mikrosystemtechnik |
| url | https://onlinelibrary.wiley.com/doi/book/10.1002/9783527613786 |
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