Fundamental principles of optical lithography: the science of microfabrication
Gespeichert in:
| 1. Verfasser: | |
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Chichester, West Sussex, England
Wiley
©2007
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| Schlagworte: | |
| Online-Zugang: | FAW01 FAW02 Volltext |
| Beschreibung: | Includes bibliographical references and index Fundamental Principles of Optical Lithography: The Science of Microfabrication; Contents; Preface; 1: Introduction to Semiconductor Lithography; 2: Aerial Image Formation -The Basics; 3: Aerial Image Formation -The Details; 4: Imaging in Resist: Standing Waves and Swing Curves; 5: Conventional Resists: Exposure and Bake Chemistry; 6: Chemically Amplified Resists: Exposure and Bake Chemistry; 7: Photoresist Development; 8: Lithographic Control in Semiconductor Manufacturing; 8: Lithographic Control in Semiconductor Manufacturing The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formatio |
| Beschreibung: | 1 Online-Ressource (xvii, 515 pages) |
| ISBN: | 0470018933 0470723866 9780470018934 9780470723869 |
Internformat
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| 245 | 1 | 0 | |a Fundamental principles of optical lithography |b the science of microfabrication |c Chris Mack |
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| 500 | |a The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formatio | ||
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Datensatz im Suchindex
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| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
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| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| isbn | 0470018933 0470723866 9780470018934 9780470723869 |
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| spelling | Mack, Chris A. Verfasser aut Fundamental principles of optical lithography the science of microfabrication Chris Mack Chichester, West Sussex, England Wiley ©2007 1 Online-Ressource (xvii, 515 pages) txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index Fundamental Principles of Optical Lithography: The Science of Microfabrication; Contents; Preface; 1: Introduction to Semiconductor Lithography; 2: Aerial Image Formation -The Basics; 3: Aerial Image Formation -The Details; 4: Imaging in Resist: Standing Waves and Swing Curves; 5: Conventional Resists: Exposure and Bake Chemistry; 6: Chemically Amplified Resists: Exposure and Bake Chemistry; 7: Photoresist Development; 8: Lithographic Control in Semiconductor Manufacturing; 8: Lithographic Control in Semiconductor Manufacturing The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formatio TECHNOLOGY & ENGINEERING / Imaging Systems bisacsh Integrated circuits / Design and construction fast Microlithography / Industrial applications fast Integrated circuits Design and construction Microlithography Industrial applications Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s 1\p DE-604 Erscheint auch als Druck-Ausgabe, Paperback 0-470-72730-6 Erscheint auch als Druck-Ausgabe, Paperback 978-0-470-72730-0 http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=449993 Aggregator Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Mack, Chris A. Fundamental principles of optical lithography the science of microfabrication TECHNOLOGY & ENGINEERING / Imaging Systems bisacsh Integrated circuits / Design and construction fast Microlithography / Industrial applications fast Integrated circuits Design and construction Microlithography Industrial applications Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 |
| title | Fundamental principles of optical lithography the science of microfabrication |
| title_auth | Fundamental principles of optical lithography the science of microfabrication |
| title_exact_search | Fundamental principles of optical lithography the science of microfabrication |
| title_full | Fundamental principles of optical lithography the science of microfabrication Chris Mack |
| title_fullStr | Fundamental principles of optical lithography the science of microfabrication Chris Mack |
| title_full_unstemmed | Fundamental principles of optical lithography the science of microfabrication Chris Mack |
| title_short | Fundamental principles of optical lithography |
| title_sort | fundamental principles of optical lithography the science of microfabrication |
| title_sub | the science of microfabrication |
| topic | TECHNOLOGY & ENGINEERING / Imaging Systems bisacsh Integrated circuits / Design and construction fast Microlithography / Industrial applications fast Integrated circuits Design and construction Microlithography Industrial applications Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | TECHNOLOGY & ENGINEERING / Imaging Systems Integrated circuits / Design and construction Microlithography / Industrial applications Integrated circuits Design and construction Microlithography Industrial applications Fotolithografie Halbleitertechnologie |
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