Fabrication of GaAs devices:
Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: Baca, A. G. (VerfasserIn)
Format: Elektronisch E-Book
Sprache:English
Veröffentlicht: London Institution of Electrical Engineers ©2005
Schriftenreihe:EMIS processing series no. 6
Schlagworte:
Online-Zugang:FAW01
FAW02
Volltext
Beschreibung:Includes bibliographical references and index
Acknowledgment; Abbreviations; 1. Introduction to GaAs devices; 2. Semiconductor properties, growth, characterisation and processing techniques; 3. Cleaning and passivation of GaAs and related alloys; 4. Wet etching and photolithography of GaAs and related alloys; 5. Dry etching of GaAs and related alloys; 6. Ohmic contacts; 7. Schottky contacts; 8. Field effect transistors; 9. Heterojunction bipolar transistors; 10. Wet oxidation for optoelectronic and MIS GaAs devices; Glossary; Index
This book provides fundamental and practical information on all aspects of GaAs processing. The book also gives pragmatic advice on cleaning and passivation, wet and dry etching and photolithography, and dry etching. Other topics covered include device performance for HBTs (Heterojunction Bipolar Transistors) and FETs (Field Effect Transistors), how these relate to processing choices, and special processing issues such as wet oxidation, which are especially important in optoelectronic devices
Beschreibung:1 Online-Ressource (xvii, 350 pages)
ISBN:0863413536
1849190682
9781849190688

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