Silicide technology for integrated circuits:
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Bibliographic Details
Format: Electronic eBook
Language:English
Published: London Institution of Electrical Engineers ©2004
Series:EMIS processing series no. 5
Subjects:
Online Access:FAW01
FAW02
Volltext
Item Description:Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002
Includes bibliographical references and index
1. Silicides -- an introduction / J.W. Mayer and S.S. Lau -- 2. Silicide formation / L.J. Chen -- 3. Titanium silicide technology / Z. Ma and L.H. Allen -- 4. Cobalt silicide technology / T. Kikkawa, K. Inoue and K. Imai -- 5. Nickel silicide technology / C. Lavoie, C. Detavernier and P. Besser -- 6. Light-emitting iron disilicide / L.J. Chou -- 7. Silicide contacts for Si/Ge devices / J.E. Burnette, M. Himmerlich and R.J. Nemanich -- 8. Silicide technology for SOI devices / L.P. Ren and K.N. Tu -- 9. Characterisation of metal silicides / Y.F. Hsieh, S.L. Cheng and L.J. Chen
Physical Description:1 Online-Ressource (xviii, 279 pages)
ISBN:1849190666
9781849190664

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