Silicide technology for integrated circuits:
Gespeichert in:
| Format: | Elektronisch E-Book |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
London
Institution of Electrical Engineers
©2004
|
| Schriftenreihe: | EMIS processing series
no. 5 |
| Schlagworte: | |
| Online-Zugang: | FAW01 FAW02 Volltext |
| Beschreibung: | Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002 Includes bibliographical references and index 1. Silicides -- an introduction / J.W. Mayer and S.S. Lau -- 2. Silicide formation / L.J. Chen -- 3. Titanium silicide technology / Z. Ma and L.H. Allen -- 4. Cobalt silicide technology / T. Kikkawa, K. Inoue and K. Imai -- 5. Nickel silicide technology / C. Lavoie, C. Detavernier and P. Besser -- 6. Light-emitting iron disilicide / L.J. Chou -- 7. Silicide contacts for Si/Ge devices / J.E. Burnette, M. Himmerlich and R.J. Nemanich -- 8. Silicide technology for SOI devices / L.P. Ren and K.N. Tu -- 9. Characterisation of metal silicides / Y.F. Hsieh, S.L. Cheng and L.J. Chen |
| Beschreibung: | 1 Online-Ressource (xviii, 279 pages) |
| ISBN: | 1849190666 9781849190664 |
Internformat
MARC
| LEADER | 00000nmm a2200000zcb4500 | ||
|---|---|---|---|
| 001 | BV043098768 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | cr|uuu---uuuuu | ||
| 008 | 151126s2004 |||| o||u| ||||||eng d | ||
| 020 | |a 1849190666 |c electronic bk. |9 1-84919-066-6 | ||
| 020 | |a 9781849190664 |c electronic bk. |9 978-1-84919-066-4 | ||
| 035 | |a (OCoLC)460736337 | ||
| 035 | |a (DE-599)BVBBV043098768 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-1046 |a DE-1047 | ||
| 082 | 0 | |a 621.38152 |2 22 | |
| 084 | |a ZN 3460 |0 (DE-625)157317: |2 rvk | ||
| 245 | 1 | 0 | |a Silicide technology for integrated circuits |c edited by Lih J. Chen |
| 264 | 1 | |a London |b Institution of Electrical Engineers |c ©2004 | |
| 300 | |a 1 Online-Ressource (xviii, 279 pages) | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b c |2 rdamedia | ||
| 338 | |b cr |2 rdacarrier | ||
| 490 | 0 | |a EMIS processing series |v no. 5 | |
| 500 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002 | ||
| 500 | |a Includes bibliographical references and index | ||
| 500 | |a 1. Silicides -- an introduction / J.W. Mayer and S.S. Lau -- 2. Silicide formation / L.J. Chen -- 3. Titanium silicide technology / Z. Ma and L.H. Allen -- 4. Cobalt silicide technology / T. Kikkawa, K. Inoue and K. Imai -- 5. Nickel silicide technology / C. Lavoie, C. Detavernier and P. Besser -- 6. Light-emitting iron disilicide / L.J. Chou -- 7. Silicide contacts for Si/Ge devices / J.E. Burnette, M. Himmerlich and R.J. Nemanich -- 8. Silicide technology for SOI devices / L.P. Ren and K.N. Tu -- 9. Characterisation of metal silicides / Y.F. Hsieh, S.L. Cheng and L.J. Chen | ||
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Solid State |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING / Electronics / Semiconductors |2 bisacsh | |
| 650 | 7 | |a Integrated circuits / Materials |2 fast | |
| 650 | 7 | |a Silicides |2 fast | |
| 650 | 4 | |a Silicides | |
| 650 | 4 | |a Integrated circuits |x Materials | |
| 700 | 1 | |a Chen, L. J. |e Sonstige |4 oth | |
| 710 | 2 | |a Institution of Electrical Engineers |e Sonstige |4 oth | |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe, Hardcover |z 0-86341-352-8 |
| 776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe, Hardcover |z 978-0-86341-352-0 |
| 856 | 4 | 0 | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235 |x Aggregator |3 Volltext |
| 912 | |a ZDB-4-EBA | ||
| 999 | |a oai:aleph.bib-bvb.de:BVB01-028522959 | ||
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235 |l FAW01 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
| 966 | e | |u http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235 |l FAW02 |p ZDB-4-EBA |q FAW_PDA_EBA |x Aggregator |3 Volltext | |
Datensatz im Suchindex
| _version_ | 1804175506539544576 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV043098768 |
| classification_rvk | ZN 3460 |
| collection | ZDB-4-EBA |
| ctrlnum | (OCoLC)460736337 (DE-599)BVBBV043098768 |
| dewey-full | 621.38152 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38152 |
| dewey-search | 621.38152 |
| dewey-sort | 3621.38152 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02845nmm a2200493zcb4500</leader><controlfield tag="001">BV043098768</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">151126s2004 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1849190666</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">1-84919-066-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781849190664</subfield><subfield code="c">electronic bk.</subfield><subfield code="9">978-1-84919-066-4</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)460736337</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV043098768</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield><subfield code="a">DE-1047</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.38152</subfield><subfield code="2">22</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 3460</subfield><subfield code="0">(DE-625)157317:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Silicide technology for integrated circuits</subfield><subfield code="c">edited by Lih J. Chen</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">London</subfield><subfield code="b">Institution of Electrical Engineers</subfield><subfield code="c">©2004</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xviii, 279 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">EMIS processing series</subfield><subfield code="v">no. 5</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">1. Silicides -- an introduction / J.W. Mayer and S.S. Lau -- 2. Silicide formation / L.J. Chen -- 3. Titanium silicide technology / Z. Ma and L.H. Allen -- 4. Cobalt silicide technology / T. Kikkawa, K. Inoue and K. Imai -- 5. Nickel silicide technology / C. Lavoie, C. Detavernier and P. Besser -- 6. Light-emitting iron disilicide / L.J. Chou -- 7. Silicide contacts for Si/Ge devices / J.E. Burnette, M. Himmerlich and R.J. Nemanich -- 8. Silicide technology for SOI devices / L.P. Ren and K.N. Tu -- 9. Characterisation of metal silicides / Y.F. Hsieh, S.L. Cheng and L.J. Chen</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Solid State</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">TECHNOLOGY & ENGINEERING / Electronics / Semiconductors</subfield><subfield code="2">bisacsh</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Integrated circuits / Materials</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Silicides</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Silicides</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Materials</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chen, L. J.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">Institution of Electrical Engineers</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe, Hardcover</subfield><subfield code="z">0-86341-352-8</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe, Hardcover</subfield><subfield code="z">978-0-86341-352-0</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-4-EBA</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-028522959</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235</subfield><subfield code="l">FAW01</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="966" ind1="e" ind2=" "><subfield code="u">http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235</subfield><subfield code="l">FAW02</subfield><subfield code="p">ZDB-4-EBA</subfield><subfield code="q">FAW_PDA_EBA</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield></record></collection> |
| id | DE-604.BV043098768 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-10T07:17:22Z |
| institution | BVB |
| isbn | 1849190666 9781849190664 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028522959 |
| oclc_num | 460736337 |
| open_access_boolean | |
| owner | DE-1046 DE-1047 |
| owner_facet | DE-1046 DE-1047 |
| physical | 1 Online-Ressource (xviii, 279 pages) |
| psigel | ZDB-4-EBA ZDB-4-EBA FAW_PDA_EBA |
| publishDate | 2004 |
| publishDateSearch | 2004 |
| publishDateSort | 2004 |
| publisher | Institution of Electrical Engineers |
| record_format | marc |
| series2 | EMIS processing series |
| spelling | Silicide technology for integrated circuits edited by Lih J. Chen London Institution of Electrical Engineers ©2004 1 Online-Ressource (xviii, 279 pages) txt rdacontent c rdamedia cr rdacarrier EMIS processing series no. 5 Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002 Includes bibliographical references and index 1. Silicides -- an introduction / J.W. Mayer and S.S. Lau -- 2. Silicide formation / L.J. Chen -- 3. Titanium silicide technology / Z. Ma and L.H. Allen -- 4. Cobalt silicide technology / T. Kikkawa, K. Inoue and K. Imai -- 5. Nickel silicide technology / C. Lavoie, C. Detavernier and P. Besser -- 6. Light-emitting iron disilicide / L.J. Chou -- 7. Silicide contacts for Si/Ge devices / J.E. Burnette, M. Himmerlich and R.J. Nemanich -- 8. Silicide technology for SOI devices / L.P. Ren and K.N. Tu -- 9. Characterisation of metal silicides / Y.F. Hsieh, S.L. Cheng and L.J. Chen TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Integrated circuits / Materials fast Silicides fast Silicides Integrated circuits Materials Chen, L. J. Sonstige oth Institution of Electrical Engineers Sonstige oth Erscheint auch als Druck-Ausgabe, Hardcover 0-86341-352-8 Erscheint auch als Druck-Ausgabe, Hardcover 978-0-86341-352-0 http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235 Aggregator Volltext |
| spellingShingle | Silicide technology for integrated circuits TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Integrated circuits / Materials fast Silicides fast Silicides Integrated circuits Materials |
| title | Silicide technology for integrated circuits |
| title_auth | Silicide technology for integrated circuits |
| title_exact_search | Silicide technology for integrated circuits |
| title_full | Silicide technology for integrated circuits edited by Lih J. Chen |
| title_fullStr | Silicide technology for integrated circuits edited by Lih J. Chen |
| title_full_unstemmed | Silicide technology for integrated circuits edited by Lih J. Chen |
| title_short | Silicide technology for integrated circuits |
| title_sort | silicide technology for integrated circuits |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh Integrated circuits / Materials fast Silicides fast Silicides Integrated circuits Materials |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Solid State TECHNOLOGY & ENGINEERING / Electronics / Semiconductors Integrated circuits / Materials Silicides Integrated circuits Materials |
| url | http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=292235 |
| work_keys_str_mv | AT chenlj silicidetechnologyforintegratedcircuits AT institutionofelectricalengineers silicidetechnologyforintegratedcircuits |