Advanced Ta-based diffusion barriers for Cu interconnects:
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Bibliographic Details
Main Author: Hübner, René (Author)
Format: Electronic eBook
Language:English
Published: New York Nova Science Publishers c2009
Subjects:
Online Access:FAW01
FAW02
Volltext
Item Description:Includes bibliographical references (p. [73]-86) and index
Physical Description:1 Online-Ressource (93 p.)
ISBN:1607416751
9781607416753

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