Ellipsometry for Industrial Applications:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Vienna
Springer Vienna
1988
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| Schlagworte: | |
| Online-Zugang: | Volltext |
| Beschreibung: | During the past years, elliposometry, a non-destructive and contact-less optical surface analysis technique, has gained increased importance in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its accuracy limitations. This book endeavors to point out some of the less obvious features and possibilities of ellipsometry, particularly of dynamic "in situ" measurements, and reviews its applications in research and manufacturing of semiconductor and thin film devices. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided. Error correction or (numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested |
| Beschreibung: | 1 Online-Ressource (XIII, 99p. 43 illus) |
| ISBN: | 9783709189610 9783211820407 |
| DOI: | 10.1007/978-3-7091-8961-0 |
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| 500 | |a During the past years, elliposometry, a non-destructive and contact-less optical surface analysis technique, has gained increased importance in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its accuracy limitations. This book endeavors to point out some of the less obvious features and possibilities of ellipsometry, particularly of dynamic "in situ" measurements, and reviews its applications in research and manufacturing of semiconductor and thin film devices. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided. Error correction or (numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested | ||
| 650 | 4 | |a Physics | |
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| 650 | 4 | |a Surfaces (Physics) | |
| 650 | 4 | |a Solid State Physics | |
| 650 | 4 | |a Spectroscopy and Microscopy | |
| 650 | 4 | |a Optics, Optoelectronics, Plasmonics and Optical Devices | |
| 650 | 4 | |a Surfaces and Interfaces, Thin Films | |
| 650 | 4 | |a Optical and Electronic Materials | |
| 650 | 4 | |a Electronics and Microelectronics, Instrumentation | |
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| author | Riedling, Karl |
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| dewey-full | 530.41 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 530 - Physics |
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| discipline | Physik |
| doi_str_mv | 10.1007/978-3-7091-8961-0 |
| format | Electronic eBook |
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| isbn | 9783709189610 9783211820407 |
| language | English |
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| spelling | Riedling, Karl Verfasser aut Ellipsometry for Industrial Applications by Karl Riedling Vienna Springer Vienna 1988 1 Online-Ressource (XIII, 99p. 43 illus) txt rdacontent c rdamedia cr rdacarrier During the past years, elliposometry, a non-destructive and contact-less optical surface analysis technique, has gained increased importance in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its accuracy limitations. This book endeavors to point out some of the less obvious features and possibilities of ellipsometry, particularly of dynamic "in situ" measurements, and reviews its applications in research and manufacturing of semiconductor and thin film devices. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided. Error correction or (numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested Physics Electronics Optical materials Surfaces (Physics) Solid State Physics Spectroscopy and Microscopy Optics, Optoelectronics, Plasmonics and Optical Devices Surfaces and Interfaces, Thin Films Optical and Electronic Materials Electronics and Microelectronics, Instrumentation Ellipsometrie (DE-588)4152025-7 gnd rswk-swf 1\p (DE-588)4113937-9 Hochschulschrift gnd-content Ellipsometrie (DE-588)4152025-7 s 2\p DE-604 https://doi.org/10.1007/978-3-7091-8961-0 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Riedling, Karl Ellipsometry for Industrial Applications Physics Electronics Optical materials Surfaces (Physics) Solid State Physics Spectroscopy and Microscopy Optics, Optoelectronics, Plasmonics and Optical Devices Surfaces and Interfaces, Thin Films Optical and Electronic Materials Electronics and Microelectronics, Instrumentation Ellipsometrie (DE-588)4152025-7 gnd |
| subject_GND | (DE-588)4152025-7 (DE-588)4113937-9 |
| title | Ellipsometry for Industrial Applications |
| title_auth | Ellipsometry for Industrial Applications |
| title_exact_search | Ellipsometry for Industrial Applications |
| title_full | Ellipsometry for Industrial Applications by Karl Riedling |
| title_fullStr | Ellipsometry for Industrial Applications by Karl Riedling |
| title_full_unstemmed | Ellipsometry for Industrial Applications by Karl Riedling |
| title_short | Ellipsometry for Industrial Applications |
| title_sort | ellipsometry for industrial applications |
| topic | Physics Electronics Optical materials Surfaces (Physics) Solid State Physics Spectroscopy and Microscopy Optics, Optoelectronics, Plasmonics and Optical Devices Surfaces and Interfaces, Thin Films Optical and Electronic Materials Electronics and Microelectronics, Instrumentation Ellipsometrie (DE-588)4152025-7 gnd |
| topic_facet | Physics Electronics Optical materials Surfaces (Physics) Solid State Physics Spectroscopy and Microscopy Optics, Optoelectronics, Plasmonics and Optical Devices Surfaces and Interfaces, Thin Films Optical and Electronic Materials Electronics and Microelectronics, Instrumentation Ellipsometrie Hochschulschrift |
| url | https://doi.org/10.1007/978-3-7091-8961-0 |
| work_keys_str_mv | AT riedlingkarl ellipsometryforindustrialapplications |