Sputtering by Particle Bombardment III: Characteristics of Sputtered Particles, Technical Applications
Saved in:
| Main Author: | |
|---|---|
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Berlin, Heidelberg
Springer Berlin Heidelberg
1991
|
| Series: | Topics in Applied Physics
64 |
| Subjects: | |
| Online Access: | Volltext |
| Item Description: | Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering |
| Physical Description: | 1 Online-Ressource (XV, 415 p) |
| ISBN: | 9783540468813 9783540534280 |
| ISSN: | 0303-4216 |
| DOI: | 10.1007/3-540-53428-8 |
Staff View
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| 500 | |a Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering | ||
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Record in the Search Index
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| illustrated | Not Illustrated |
| indexdate | 2024-07-10T01:20:52Z |
| institution | BVB |
| isbn | 9783540468813 9783540534280 |
| issn | 0303-4216 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027848506 |
| oclc_num | 906740507 |
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| physical | 1 Online-Ressource (XV, 415 p) |
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| publishDate | 1991 |
| publishDateSearch | 1991 |
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| publisher | Springer Berlin Heidelberg |
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| series2 | Topics in Applied Physics |
| spelling | Behrisch, Rainer Verfasser aut Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications edited by Rainer Behrisch, Klaus Wittmaack Berlin, Heidelberg Springer Berlin Heidelberg 1991 1 Online-Ressource (XV, 415 p) txt rdacontent c rdamedia cr rdacarrier Topics in Applied Physics 64 0303-4216 Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering Physics Particles (Nuclear physics) Surfaces (Physics) Solid State Physics and Spectroscopy Surfaces and Interfaces, Thin Films Physics and Applied Physics in Engineering Wittmaack, Klaus Sonstige oth https://doi.org/10.1007/3-540-53428-8 Verlag Volltext |
| spellingShingle | Behrisch, Rainer Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications Physics Particles (Nuclear physics) Surfaces (Physics) Solid State Physics and Spectroscopy Surfaces and Interfaces, Thin Films Physics and Applied Physics in Engineering |
| title | Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications |
| title_auth | Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications |
| title_exact_search | Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications |
| title_full | Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications edited by Rainer Behrisch, Klaus Wittmaack |
| title_fullStr | Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications edited by Rainer Behrisch, Klaus Wittmaack |
| title_full_unstemmed | Sputtering by Particle Bombardment III Characteristics of Sputtered Particles, Technical Applications edited by Rainer Behrisch, Klaus Wittmaack |
| title_short | Sputtering by Particle Bombardment III |
| title_sort | sputtering by particle bombardment iii characteristics of sputtered particles technical applications |
| title_sub | Characteristics of Sputtered Particles, Technical Applications |
| topic | Physics Particles (Nuclear physics) Surfaces (Physics) Solid State Physics and Spectroscopy Surfaces and Interfaces, Thin Films Physics and Applied Physics in Engineering |
| topic_facet | Physics Particles (Nuclear physics) Surfaces (Physics) Solid State Physics and Spectroscopy Surfaces and Interfaces, Thin Films Physics and Applied Physics in Engineering |
| url | https://doi.org/10.1007/3-540-53428-8 |
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