Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects:
Gespeichert in:
Format: | Elektronisch E-Book |
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Sprache: | English |
Veröffentlicht: |
1999
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Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | Silicon technology today forms the basis of a world-wide, multi-billion dollar component industry. The reason for this expansion can be found not only in the physical properties of silicon but also in the unique properties of the silicon-silicon dioxide interface. However, silicon devices are still subject to undesired electrical phenomena called "instabilities". These are due mostly to the imperfect nature of the insulators used, to the not-so-perfect silicon-insulator interface and to the generation of defects and ionization phenomena caused by radiation. The problem of instabilities is addressed in this volume, the third of this book series. Vol.3 updates and supplements the material presented in the previous two volumes, and devotes five chapters to the problems of radiation-matter and radiation-device interactions. The volume will aid circuit manufacturers and circuit users alike to relate unstable electrical parameters and characteristics to the presence of physical defects and impurities or to the radiation environment which caused them Includes bibliographical references and indexes |
Beschreibung: | 1 Online-Ressource (xxvii, 933 p.) |
ISBN: | 9780444818010 0444818014 1281058106 9781281058102 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV042315747 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 150129s1999 |||| o||u| ||||||eng d | ||
020 | |a 9780444818010 |9 978-0-444-81801-0 | ||
020 | |a 0444818014 |9 0-444-81801-4 | ||
020 | |a 1281058106 |9 1-281-05810-6 | ||
020 | |a 9781281058102 |9 978-1-281-05810-2 | ||
035 | |a (OCoLC)162131299 | ||
035 | |a (DE-599)BVBBV042315747 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
049 | |a DE-1046 | ||
082 | 0 | |a 621.38152 |2 22 | |
245 | 1 | 0 | |a Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects |c edited by Gérard Barbottin and André Vapaille |
246 | 1 | 3 | |a New insulators, devices and radiation effects |
264 | 1 | |c 1999 | |
300 | |a 1 Online-Ressource (xxvii, 933 p.) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
500 | |a Silicon technology today forms the basis of a world-wide, multi-billion dollar component industry. The reason for this expansion can be found not only in the physical properties of silicon but also in the unique properties of the silicon-silicon dioxide interface. However, silicon devices are still subject to undesired electrical phenomena called "instabilities". These are due mostly to the imperfect nature of the insulators used, to the not-so-perfect silicon-insulator interface and to the generation of defects and ionization phenomena caused by radiation. The problem of instabilities is addressed in this volume, the third of this book series. Vol.3 updates and supplements the material presented in the previous two volumes, and devotes five chapters to the problems of radiation-matter and radiation-device interactions. The volume will aid circuit manufacturers and circuit users alike to relate unstable electrical parameters and characteristics to the presence of physical defects and impurities or to the radiation environment which caused them | ||
500 | |a Includes bibliographical references and indexes | ||
546 | |a English text with abstracts in French and German | ||
650 | 7 | |a Integrated circuits / Passivation |2 fast | |
650 | 7 | |a Silicon / Electric properties |2 fast | |
650 | 4 | |a Silicon |x Electric properties | |
650 | 4 | |a Integrated circuits |x Passivation | |
700 | 1 | |a Vapaille, André |e Sonstige |4 oth | |
700 | 1 | |a Barbottin, Gérard |e Sonstige |4 oth | |
856 | 4 | 0 | |u http://www.sciencedirect.com/science/book/9780444818010 |x Verlag |3 Volltext |
912 | |a ZDB-33-ESD |a ZDB-33-EBS | ||
940 | 1 | |q FAW_PDA_ESD | |
940 | 1 | |q FLA_PDA_ESD | |
999 | |a oai:aleph.bib-bvb.de:BVB01-027752738 |
Datensatz im Suchindex
_version_ | 1804152910308704256 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV042315747 |
collection | ZDB-33-ESD ZDB-33-EBS |
ctrlnum | (OCoLC)162131299 (DE-599)BVBBV042315747 |
dewey-full | 621.38152 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.38152 |
dewey-search | 621.38152 |
dewey-sort | 3621.38152 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02663nmm a2200457zc 4500</leader><controlfield tag="001">BV042315747</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">150129s1999 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780444818010</subfield><subfield code="9">978-0-444-81801-0</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0444818014</subfield><subfield code="9">0-444-81801-4</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1281058106</subfield><subfield code="9">1-281-05810-6</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781281058102</subfield><subfield code="9">978-1-281-05810-2</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)162131299</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV042315747</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1046</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.38152</subfield><subfield code="2">22</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects</subfield><subfield code="c">edited by Gérard Barbottin and André Vapaille</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">New insulators, devices and radiation effects</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1999</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xxvii, 933 p.)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Silicon technology today forms the basis of a world-wide, multi-billion dollar component industry. The reason for this expansion can be found not only in the physical properties of silicon but also in the unique properties of the silicon-silicon dioxide interface. However, silicon devices are still subject to undesired electrical phenomena called "instabilities". These are due mostly to the imperfect nature of the insulators used, to the not-so-perfect silicon-insulator interface and to the generation of defects and ionization phenomena caused by radiation. The problem of instabilities is addressed in this volume, the third of this book series. Vol.3 updates and supplements the material presented in the previous two volumes, and devotes five chapters to the problems of radiation-matter and radiation-device interactions. The volume will aid circuit manufacturers and circuit users alike to relate unstable electrical parameters and characteristics to the presence of physical defects and impurities or to the radiation environment which caused them</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and indexes</subfield></datafield><datafield tag="546" ind1=" " ind2=" "><subfield code="a">English text with abstracts in French and German</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Integrated circuits / Passivation</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Silicon / Electric properties</subfield><subfield code="2">fast</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Silicon</subfield><subfield code="x">Electric properties</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield><subfield code="x">Passivation</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Vapaille, André</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Barbottin, Gérard</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://www.sciencedirect.com/science/book/9780444818010</subfield><subfield code="x">Verlag</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-33-ESD</subfield><subfield code="a">ZDB-33-EBS</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">FAW_PDA_ESD</subfield></datafield><datafield tag="940" ind1="1" ind2=" "><subfield code="q">FLA_PDA_ESD</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027752738</subfield></datafield></record></collection> |
id | DE-604.BV042315747 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T01:18:13Z |
institution | BVB |
isbn | 9780444818010 0444818014 1281058106 9781281058102 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027752738 |
oclc_num | 162131299 |
open_access_boolean | |
owner | DE-1046 |
owner_facet | DE-1046 |
physical | 1 Online-Ressource (xxvii, 933 p.) |
psigel | ZDB-33-ESD ZDB-33-EBS FAW_PDA_ESD FLA_PDA_ESD |
publishDate | 1999 |
publishDateSearch | 1999 |
publishDateSort | 1999 |
record_format | marc |
spelling | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects edited by Gérard Barbottin and André Vapaille New insulators, devices and radiation effects 1999 1 Online-Ressource (xxvii, 933 p.) txt rdacontent c rdamedia cr rdacarrier Silicon technology today forms the basis of a world-wide, multi-billion dollar component industry. The reason for this expansion can be found not only in the physical properties of silicon but also in the unique properties of the silicon-silicon dioxide interface. However, silicon devices are still subject to undesired electrical phenomena called "instabilities". These are due mostly to the imperfect nature of the insulators used, to the not-so-perfect silicon-insulator interface and to the generation of defects and ionization phenomena caused by radiation. The problem of instabilities is addressed in this volume, the third of this book series. Vol.3 updates and supplements the material presented in the previous two volumes, and devotes five chapters to the problems of radiation-matter and radiation-device interactions. The volume will aid circuit manufacturers and circuit users alike to relate unstable electrical parameters and characteristics to the presence of physical defects and impurities or to the radiation environment which caused them Includes bibliographical references and indexes English text with abstracts in French and German Integrated circuits / Passivation fast Silicon / Electric properties fast Silicon Electric properties Integrated circuits Passivation Vapaille, André Sonstige oth Barbottin, Gérard Sonstige oth http://www.sciencedirect.com/science/book/9780444818010 Verlag Volltext |
spellingShingle | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects Integrated circuits / Passivation fast Silicon / Electric properties fast Silicon Electric properties Integrated circuits Passivation |
title | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects |
title_alt | New insulators, devices and radiation effects |
title_auth | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects |
title_exact_search | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects |
title_full | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects edited by Gérard Barbottin and André Vapaille |
title_fullStr | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects edited by Gérard Barbottin and André Vapaille |
title_full_unstemmed | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects edited by Gérard Barbottin and André Vapaille |
title_short | Instabilities in silicon devices, Volume 3, New insulators, devices and radiation effects |
title_sort | instabilities in silicon devices volume 3 new insulators devices and radiation effects |
topic | Integrated circuits / Passivation fast Silicon / Electric properties fast Silicon Electric properties Integrated circuits Passivation |
topic_facet | Integrated circuits / Passivation Silicon / Electric properties Silicon Electric properties Integrated circuits Passivation |
url | http://www.sciencedirect.com/science/book/9780444818010 |
work_keys_str_mv | AT vapailleandre instabilitiesinsilicondevicesvolume3newinsulatorsdevicesandradiationeffects AT barbottingerard instabilitiesinsilicondevicesvolume3newinsulatorsdevicesandradiationeffects AT vapailleandre newinsulatorsdevicesandradiationeffects AT barbottingerard newinsulatorsdevicesandradiationeffects |