Rapid thermal processing: science and technology
Saved in:
| Format: | Electronic eBook |
|---|---|
| Language: | English |
| Published: |
Boston
Academic Press
©1993
|
| Subjects: | |
| Online Access: | FAW01 Volltext |
| Item Description: | Includes bibliographical references and index This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering |
| Physical Description: | 1 Online-Ressource (viii, 430 pages) |
| ISBN: | 0122476905 9780122476907 |
Staff View
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| 500 | |a Includes bibliographical references and index | ||
| 500 | |a This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering | ||
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| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
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| dewey-search | 621.3815/2 |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Electronic eBook |
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| isbn | 0122476905 9780122476907 |
| language | English |
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| physical | 1 Online-Ressource (viii, 430 pages) |
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| publishDate | 1993 |
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| publisher | Academic Press |
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| spelling | Rapid thermal processing science and technology edited by Richard B. Fair Boston Academic Press ©1993 1 Online-Ressource (viii, 430 pages) txt rdacontent c rdamedia cr rdacarrier Includes bibliographical references and index This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering Semiconductors Tecnologia de dispositivos semicondutores larpcal Rapid thermal processing fast Semiconductor doping fast Semiconductors / Heat treatment fast Semiconductors Heat treatment Semiconductor doping Rapid thermal processing Halbleiter (DE-588)4022993-2 gnd rswk-swf Fertigung (DE-588)4016899-2 gnd rswk-swf 1\p (DE-588)4143413-4 Aufsatzsammlung gnd-content Halbleiter (DE-588)4022993-2 s Fertigung (DE-588)4016899-2 s 2\p DE-604 Fair, Richard B. Sonstige oth http://www.sciencedirect.com/science/book/9780122476907 Verlag Volltext 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Rapid thermal processing science and technology Semiconductors Tecnologia de dispositivos semicondutores larpcal Rapid thermal processing fast Semiconductor doping fast Semiconductors / Heat treatment fast Semiconductors Heat treatment Semiconductor doping Rapid thermal processing Halbleiter (DE-588)4022993-2 gnd Fertigung (DE-588)4016899-2 gnd |
| subject_GND | (DE-588)4022993-2 (DE-588)4016899-2 (DE-588)4143413-4 |
| title | Rapid thermal processing science and technology |
| title_auth | Rapid thermal processing science and technology |
| title_exact_search | Rapid thermal processing science and technology |
| title_full | Rapid thermal processing science and technology edited by Richard B. Fair |
| title_fullStr | Rapid thermal processing science and technology edited by Richard B. Fair |
| title_full_unstemmed | Rapid thermal processing science and technology edited by Richard B. Fair |
| title_short | Rapid thermal processing |
| title_sort | rapid thermal processing science and technology |
| title_sub | science and technology |
| topic | Semiconductors Tecnologia de dispositivos semicondutores larpcal Rapid thermal processing fast Semiconductor doping fast Semiconductors / Heat treatment fast Semiconductors Heat treatment Semiconductor doping Rapid thermal processing Halbleiter (DE-588)4022993-2 gnd Fertigung (DE-588)4016899-2 gnd |
| topic_facet | Semiconductors Tecnologia de dispositivos semicondutores Rapid thermal processing Semiconductor doping Semiconductors / Heat treatment Semiconductors Heat treatment Halbleiter Fertigung Aufsatzsammlung |
| url | http://www.sciencedirect.com/science/book/9780122476907 |
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