Photopolymers: photoresist materials, processes, and applications
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Boca Raton [u.a.]
CRC Press
2015
|
| Series: | Optics and photonics
10 |
| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Physical Description: | IX, 179 S. Ill., graph. Darst. |
| ISBN: | 9781466517288 |
Staff View
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV042058568 | ||
| 003 | DE-604 | ||
| 005 | 20150225 | ||
| 007 | t | ||
| 008 | 140904s2015 ad|| |||| 00||| eng d | ||
| 010 | |a 2014006188 | ||
| 020 | |a 9781466517288 |c hardback |9 978-1-4665-1728-8 | ||
| 035 | |a (OCoLC)900646854 | ||
| 035 | |a (DE-599)GBV78815821X | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-703 |a DE-29T | ||
| 084 | |a UV 5400 |0 (DE-625)146909: |2 rvk | ||
| 100 | 1 | |a Nakamura, Kenichiro |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Photopolymers |b photoresist materials, processes, and applications |c Kenichiro Nakamura |
| 264 | 1 | |a Boca Raton [u.a.] |b CRC Press |c 2015 | |
| 300 | |a IX, 179 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Optics and photonics |v 10 | |
| 650 | 0 | 7 | |a Photopolymerisation |0 (DE-588)4174541-3 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Photopolymere |0 (DE-588)4202465-1 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Photopolymerisation |0 (DE-588)4174541-3 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Photopolymere |0 (DE-588)4202465-1 |D s |
| 689 | 1 | |5 DE-604 | |
| 830 | 0 | |a Optics and photonics |v 10 |w (DE-604)BV037439917 |9 10 | |
| 856 | 4 | 2 | |m Digitalisierung UB Bayreuth - ADAM Catalogue Enrichment |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=027499490&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-027499490 | ||
Record in the Search Index
| _version_ | 1804152495809757184 |
|---|---|
| adam_text | Photoresist Materials, Processes
and Applications
Advancements in photopolymers have led to groundbreaking achieve¬
ments in the electronics, print, optical engineering, and medical fields.
At present, photopolymers have myriad applications in semiconductor
device manufacturing, printed circuit boards (PCBs), ultraviolet (UV)
curing, printing plates,
3-D
printing, microelectromechanical systems
(MEMS), and medical materials. Processes such as photopolymerization,
photodegradation, and photocrosslinking, as well as lithography
technology in which
photofabrications
are performed by images of
photopolymers, have given rise to very large scale integrated (VLSI)
circuits, microproducts, and more.
Addressing topics such as chemically amplified resists, immersion
lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting,
Photopolymers: Photoresist Materials, Processes, and Applications
covers photopolymers from core concepts to industrial applications,
providing the chemical formulae and structures of the materials discussed
as well as practical case studies from some of the world s largest
corporations. Offering a state-of-the-art review of progress in the devel¬
opment of photopolymers, this book provides valuable insight into
current and future opportunities for photopolymer use.
|
| any_adam_object | 1 |
| author | Nakamura, Kenichiro |
| author_facet | Nakamura, Kenichiro |
| author_role | aut |
| author_sort | Nakamura, Kenichiro |
| author_variant | k n kn |
| building | Verbundindex |
| bvnumber | BV042058568 |
| classification_rvk | UV 5400 |
| ctrlnum | (OCoLC)900646854 (DE-599)GBV78815821X |
| discipline | Physik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01528nam a2200385 cb4500</leader><controlfield tag="001">BV042058568</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20150225 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">140904s2015 ad|| |||| 00||| eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a">2014006188</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781466517288</subfield><subfield code="c">hardback</subfield><subfield code="9">978-1-4665-1728-8</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)900646854</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBV78815821X</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-29T</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UV 5400</subfield><subfield code="0">(DE-625)146909:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Nakamura, Kenichiro</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Photopolymers</subfield><subfield code="b">photoresist materials, processes, and applications</subfield><subfield code="c">Kenichiro Nakamura</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Boca Raton [u.a.]</subfield><subfield code="b">CRC Press</subfield><subfield code="c">2015</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">IX, 179 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Optics and photonics</subfield><subfield code="v">10</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Photopolymerisation</subfield><subfield code="0">(DE-588)4174541-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Photopolymere</subfield><subfield code="0">(DE-588)4202465-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Photopolymerisation</subfield><subfield code="0">(DE-588)4174541-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Photopolymere</subfield><subfield code="0">(DE-588)4202465-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Optics and photonics</subfield><subfield code="v">10</subfield><subfield code="w">(DE-604)BV037439917</subfield><subfield code="9">10</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Digitalisierung UB Bayreuth - ADAM Catalogue Enrichment</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=027499490&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027499490</subfield></datafield></record></collection> |
| id | DE-604.BV042058568 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T01:11:38Z |
| institution | BVB |
| isbn | 9781466517288 |
| language | English |
| lccn | 2014006188 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027499490 |
| oclc_num | 900646854 |
| open_access_boolean | |
| owner | DE-703 DE-29T |
| owner_facet | DE-703 DE-29T |
| physical | IX, 179 S. Ill., graph. Darst. |
| publishDate | 2015 |
| publishDateSearch | 2015 |
| publishDateSort | 2015 |
| publisher | CRC Press |
| record_format | marc |
| series | Optics and photonics |
| series2 | Optics and photonics |
| spelling | Nakamura, Kenichiro Verfasser aut Photopolymers photoresist materials, processes, and applications Kenichiro Nakamura Boca Raton [u.a.] CRC Press 2015 IX, 179 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Optics and photonics 10 Photopolymerisation (DE-588)4174541-3 gnd rswk-swf Photopolymere (DE-588)4202465-1 gnd rswk-swf Photopolymerisation (DE-588)4174541-3 s DE-604 Photopolymere (DE-588)4202465-1 s Optics and photonics 10 (DE-604)BV037439917 10 Digitalisierung UB Bayreuth - ADAM Catalogue Enrichment application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=027499490&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Nakamura, Kenichiro Photopolymers photoresist materials, processes, and applications Optics and photonics Photopolymerisation (DE-588)4174541-3 gnd Photopolymere (DE-588)4202465-1 gnd |
| subject_GND | (DE-588)4174541-3 (DE-588)4202465-1 |
| title | Photopolymers photoresist materials, processes, and applications |
| title_auth | Photopolymers photoresist materials, processes, and applications |
| title_exact_search | Photopolymers photoresist materials, processes, and applications |
| title_full | Photopolymers photoresist materials, processes, and applications Kenichiro Nakamura |
| title_fullStr | Photopolymers photoresist materials, processes, and applications Kenichiro Nakamura |
| title_full_unstemmed | Photopolymers photoresist materials, processes, and applications Kenichiro Nakamura |
| title_short | Photopolymers |
| title_sort | photopolymers photoresist materials processes and applications |
| title_sub | photoresist materials, processes, and applications |
| topic | Photopolymerisation (DE-588)4174541-3 gnd Photopolymere (DE-588)4202465-1 gnd |
| topic_facet | Photopolymerisation Photopolymere |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=027499490&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV037439917 |
| work_keys_str_mv | AT nakamurakenichiro photopolymersphotoresistmaterialsprocessesandapplications |