Computational lithography:
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Elektronisch E-Book |
Sprache: | English |
Veröffentlicht: |
Hoboken, N.J.
Wiley
c2010
|
Schriftenreihe: | Wiley series in pure and applied optics
|
Schlagworte: | |
Online-Zugang: | Volltext |
Beschreibung: | Includes bibliographical references (p. 217-222) and index |
Beschreibung: | 1 Online-Ressource (xv, 226 p.) |
ISBN: | 9781282755963 |
Internformat
MARC
LEADER | 00000nmm a2200000zc 4500 | ||
---|---|---|---|
001 | BV041910183 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | cr|uuu---uuuuu | ||
008 | 140612s2010 |||| o||u| ||||||eng d | ||
020 | |a 9781282755963 |c MyiLibrary |9 978-1-282-75596-3 | ||
035 | |a (OCoLC)689995793 | ||
035 | |a (DE-599)BVBBV041910183 | ||
040 | |a DE-604 |b ger |e aacr | ||
041 | 0 | |a eng | |
082 | 0 | |a 621.3815/31 |2 22 | |
100 | 1 | |a Ma, Xu |e Verfasser |4 aut | |
245 | 1 | 0 | |a Computational lithography |c Xu Ma and Gonzalo R. Arce |
264 | 1 | |a Hoboken, N.J. |b Wiley |c c2010 | |
300 | |a 1 Online-Ressource (xv, 226 p.) | ||
336 | |b txt |2 rdacontent | ||
337 | |b c |2 rdamedia | ||
338 | |b cr |2 rdacarrier | ||
490 | 0 | |a Wiley series in pure and applied optics | |
500 | |a Includes bibliographical references (p. 217-222) and index | ||
650 | 4 | |a Mathematik | |
650 | 4 | |a Microlithography / Mathematics | |
650 | 4 | |a Integrated circuits / Design and construction / Mathematics | |
650 | 4 | |a Photolithography / Mathematics | |
650 | 4 | |a Semiconductors / Etching / Mathematics | |
650 | 4 | |a Resolution (Optics) | |
700 | 1 | |a Arce, Gonzalo R. |e Sonstige |4 oth | |
776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe, Hardcover |z 978-0-470-59697-5 |
776 | 0 | 8 | |i Erscheint auch als |n Druck-Ausgabe, Hardcover |z 0-470-59697-X |
856 | 4 | 0 | |u http://lib.myilibrary.com?id=275596 |x Aggregator |3 Volltext |
912 | |a ZDB-26-MYL | ||
999 | |a oai:aleph.bib-bvb.de:BVB01-027353853 |
Datensatz im Suchindex
_version_ | 1804152271979675648 |
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any_adam_object | |
author | Ma, Xu |
author_facet | Ma, Xu |
author_role | aut |
author_sort | Ma, Xu |
author_variant | x m xm |
building | Verbundindex |
bvnumber | BV041910183 |
collection | ZDB-26-MYL |
ctrlnum | (OCoLC)689995793 (DE-599)BVBBV041910183 |
dewey-full | 621.3815/31 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/31 |
dewey-search | 621.3815/31 |
dewey-sort | 3621.3815 231 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Electronic eBook |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01465nmm a2200409zc 4500</leader><controlfield tag="001">BV041910183</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">cr|uuu---uuuuu</controlfield><controlfield tag="008">140612s2010 |||| o||u| ||||||eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9781282755963</subfield><subfield code="c">MyiLibrary</subfield><subfield code="9">978-1-282-75596-3</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)689995793</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV041910183</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield><subfield code="2">22</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Ma, Xu</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Computational lithography</subfield><subfield code="c">Xu Ma and Gonzalo R. Arce</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Hoboken, N.J.</subfield><subfield code="b">Wiley</subfield><subfield code="c">c2010</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 Online-Ressource (xv, 226 p.)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Wiley series in pure and applied optics</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references (p. 217-222) and index</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Mathematik</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography / Mathematics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits / Design and construction / Mathematics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photolithography / Mathematics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors / Etching / Mathematics</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Resolution (Optics)</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Arce, Gonzalo R.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe, Hardcover</subfield><subfield code="z">978-0-470-59697-5</subfield></datafield><datafield tag="776" ind1="0" ind2="8"><subfield code="i">Erscheint auch als</subfield><subfield code="n">Druck-Ausgabe, Hardcover</subfield><subfield code="z">0-470-59697-X</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">http://lib.myilibrary.com?id=275596</subfield><subfield code="x">Aggregator</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">ZDB-26-MYL</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-027353853</subfield></datafield></record></collection> |
id | DE-604.BV041910183 |
illustrated | Not Illustrated |
indexdate | 2024-07-10T01:08:04Z |
institution | BVB |
isbn | 9781282755963 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-027353853 |
oclc_num | 689995793 |
open_access_boolean | |
physical | 1 Online-Ressource (xv, 226 p.) |
psigel | ZDB-26-MYL |
publishDate | 2010 |
publishDateSearch | 2010 |
publishDateSort | 2010 |
publisher | Wiley |
record_format | marc |
series2 | Wiley series in pure and applied optics |
spelling | Ma, Xu Verfasser aut Computational lithography Xu Ma and Gonzalo R. Arce Hoboken, N.J. Wiley c2010 1 Online-Ressource (xv, 226 p.) txt rdacontent c rdamedia cr rdacarrier Wiley series in pure and applied optics Includes bibliographical references (p. 217-222) and index Mathematik Microlithography / Mathematics Integrated circuits / Design and construction / Mathematics Photolithography / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) Arce, Gonzalo R. Sonstige oth Erscheint auch als Druck-Ausgabe, Hardcover 978-0-470-59697-5 Erscheint auch als Druck-Ausgabe, Hardcover 0-470-59697-X http://lib.myilibrary.com?id=275596 Aggregator Volltext |
spellingShingle | Ma, Xu Computational lithography Mathematik Microlithography / Mathematics Integrated circuits / Design and construction / Mathematics Photolithography / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) |
title | Computational lithography |
title_auth | Computational lithography |
title_exact_search | Computational lithography |
title_full | Computational lithography Xu Ma and Gonzalo R. Arce |
title_fullStr | Computational lithography Xu Ma and Gonzalo R. Arce |
title_full_unstemmed | Computational lithography Xu Ma and Gonzalo R. Arce |
title_short | Computational lithography |
title_sort | computational lithography |
topic | Mathematik Microlithography / Mathematics Integrated circuits / Design and construction / Mathematics Photolithography / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) |
topic_facet | Mathematik Microlithography / Mathematics Integrated circuits / Design and construction / Mathematics Photolithography / Mathematics Semiconductors / Etching / Mathematics Resolution (Optics) |
url | http://lib.myilibrary.com?id=275596 |
work_keys_str_mv | AT maxu computationallithography AT arcegonzalor computationallithography |