Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy:
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| Main Author: | |
|---|---|
| Format: | Thesis Book |
| Language: | English |
| Published: |
2012
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| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Physical Description: | Getr. Zählung Ill., graph. Darst. |
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Record in the Search Index
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| adam_text | IMAGE 1
CONTENTS
1 INTRODUCTION 1
2 THEORETICAL BACKGROUND 5
2.1 R A M A N SCATTERING IN CRYSTALS 5
2.2 STRESS ANALYSIS IN SI-BASED S A M P L E S BY R A M A N SPECTROSCOPY
9
2.3 STRESS CHARACTERIZATION IN SI:GE ALLOYS BY R A M A N SPECTROSCOPY .
. . . 15
2 . 4 RESOLUTION IN FAR-FIELD A N D NEAR-FIELD OPTICS 20
2.4.1 PRINCIPLES O F NEAR-FIELD M I C R O S C O P Y 21
2.4.2 CONFIGURATIONS IN HIGH-RESOLUTION OPTICAL MICROSCOPY 2 3
2.4.3 NEAR-FIELD MICROSCOPY TECHNIQUES 25
2.5 TIP-ENHANCED R A M A N SPECTROSCOPY 28
3 EXPERIMENTAL METHODS 35
3.1 R A M A N SPECTROMETER SETUPS 35
3.1.1 RENISHAW R A M A N SPECTROMETER C O M B I N E D WITH NANONICS A T
O M I C
FORCE MICROSCOPE 3 5
3.1.2 N T E G R A R A M A N SPECTROMETER C O M B I N E D WITH N T - M D
T A T O M I C FORCE MICROSCOPE 37
3.1.3 UV-RAMAN SPECTROMETER (HORIBA JOBIN Y V O N N ) 38
3.2 PREPARATION O F NEAR-FIELD PROBES F O R T E R S MEASUREMENTS 3 9
3.3 NANOSCALE PATTERNING TECHNIQUES 41
3.3.1 FOCUSED ION B E A M MILLING 4 2
3.3.2 LOCAL A N O D I C OXIDATION 4 4
4 LOCAL S T R E S S CHARACTERIZATION IN SILICON A N D
SILICON-NITRIDE-CAPPING FILM STRUCTURES 47
4.1 INTRODUCTION 4 7
4 . 2 EXPERIMENTAL PART 4 8
4.3 RESULTS A N D DISCUSSION 5 0
4 . 4 CONCLUSIONS 5 7
5 PATTERNING INDUCED S T R E S S RELAXATION IN STRAINED
SILICON-ON-LNSULATOR A N D SIGE LAYERS 59
5.1 INTRODUCTION 5 9
5.2 EXPERIMENTAL DETAILS 6 0
HTTP://D-NB.INFO/1037733428
IMAGE 2
CONTENTS
5.3 EXPERIMENTAL RESULTS A N D MODELING 6 2
5.3.1 STRAINED SILICON-ON-INSULATOR (SSOI) PATTERNS 6 2
5.3.2 STRAINED S I G E PATTERNS 6 6
5.3.3 C O M P A R I S O N O F SSOI A N D SIGE ISLANDS 71
5.4 CONCLUSIONS 71
6 IMAGING AND STRAIN ANALYSIS OF NANOSCALE SILICON-GERMANIUM STRUC
TURES 75
6.1 INTRODUCTION 7 5
6.2 EXPERIMENTAL PART 7 6
6.3 RESULTS A N D DISCUSSION 7 7
6.4 CONCLUSIONS 84
7 ENHANCED RAMAN SCATTERING BY METALLIC A N D DIELECTRIC PARTICLES 8 5
7.1 INTRODUCTION 85
7.2 EXPERIMENTAL PART 8 6
7.3 RESULTS A N D DISCUSSION 88
7.3.1 ENHANCED R A M A N SCATTERING BY PARTICLES A N D SURFACE PATTERNS
. 88
7.3.2 PHOTONIC NANOJET-ENHANCED R A M A N SCATTERING ( P N E R S ) . . .
. 9 6
7.4 CONCLUSIONS AND S U M M A R Y 106
8 SUMMARY A N D OUTLOOK 109
A OBSERVATION OF SEPARATED LONGITUDINAL AND TRANSVERSAL OPTICAL P H O N
O N MODES IN T H E RAMAN SPECTRA OF THIN STRAINED SIGE LAYERS A
ABBREVIATIONS XXV
LIST OF PUBLICATIONS A N D CONFERENCES XXVII
DANKSAGUNG XXXI
CURRICULUM VITAE XXXV
EIDESSTATTLICHE ERKLARUNG XXXVII
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| spelling | Hermann, Peter 1978- Verfasser (DE-588)1036758486 aut Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy von Peter Hermann 2012 Getr. Zählung Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Dresden, Techn. Univ., Diss., 2012 (DE-588)4113937-9 Hochschulschrift gnd-content DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026182662&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Hermann, Peter 1978- Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy |
| subject_GND | (DE-588)4113937-9 |
| title | Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy |
| title_auth | Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy |
| title_exact_search | Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy |
| title_full | Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy von Peter Hermann |
| title_fullStr | Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy von Peter Hermann |
| title_full_unstemmed | Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy von Peter Hermann |
| title_short | Stress characterization and imaging of semiconductor nanostructures by far-field and near-field Raman spectroscopy |
| title_sort | stress characterization and imaging of semiconductor nanostructures by far field and near field raman spectroscopy |
| topic_facet | Hochschulschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026182662&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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