Polycrystalline silicon thin films for electronic applications:
Saved in:
| Main Author: | |
|---|---|
| Format: | Thesis Book |
| Language: | English |
| Published: |
Garching
Verein zur Förderung des Walter Schottky Inst. der Techn. Univ. München e.V.
2012
|
| Edition: | 1. Aufl. |
| Series: | Selected topics of semiconductor physics and technology
136 |
| Subjects: | |
| Physical Description: | III, 202 S. graph. Darst. |
| ISBN: | 9783941650367 |
Staff View
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV040024888 | ||
| 003 | DE-604 | ||
| 005 | 20180913 | ||
| 007 | t | ||
| 008 | 120402s2012 d||| m||| 00||| eng d | ||
| 020 | |a 9783941650367 |9 978-3-941650-36-7 | ||
| 035 | |a (OCoLC)796190896 | ||
| 035 | |a (DE-599)BVBBV040024888 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 |a DE-12 | ||
| 084 | |a ELT 279d |2 stub | ||
| 084 | |a PHY 690d |2 stub | ||
| 100 | 1 | |a Jäger, Christian Claus |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Polycrystalline silicon thin films for electronic applications |c Christian Claus Jäger |
| 250 | |a 1. Aufl. | ||
| 264 | 1 | |a Garching |b Verein zur Förderung des Walter Schottky Inst. der Techn. Univ. München e.V. |c 2012 | |
| 300 | |a III, 202 S. |b graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Selected topics of semiconductor physics and technology |v 136 | |
| 502 | |a Zugl.: München, Techn. Univ., Diss., 2011 | ||
| 650 | 0 | 7 | |a Polykristall |0 (DE-588)4188261-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Rekristallisation |0 (DE-588)4177655-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mehrschichtsystem |0 (DE-588)4244347-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Metallschicht |0 (DE-588)4252858-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Silicium |0 (DE-588)4077445-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Opferschicht |0 (DE-588)4707990-3 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a Silicium |0 (DE-588)4077445-4 |D s |
| 689 | 0 | 1 | |a Polykristall |0 (DE-588)4188261-1 |D s |
| 689 | 0 | 2 | |a Rekristallisation |0 (DE-588)4177655-0 |D s |
| 689 | 0 | 3 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |D s |
| 689 | 0 | 4 | |a Mehrschichtsystem |0 (DE-588)4244347-7 |D s |
| 689 | 0 | 5 | |a Metallschicht |0 (DE-588)4252858-6 |D s |
| 689 | 0 | 6 | |a Opferschicht |0 (DE-588)4707990-3 |D s |
| 689 | 0 | |5 DE-604 | |
| 830 | 0 | |a Selected topics of semiconductor physics and technology |v 136 |w (DE-604)BV011499438 |9 136 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-024881909 | ||
Record in the Search Index
| _version_ | 1804149019105034240 |
|---|---|
| any_adam_object | |
| author | Jäger, Christian Claus |
| author_facet | Jäger, Christian Claus |
| author_role | aut |
| author_sort | Jäger, Christian Claus |
| author_variant | c c j cc ccj |
| building | Verbundindex |
| bvnumber | BV040024888 |
| classification_tum | ELT 279d PHY 690d |
| ctrlnum | (OCoLC)796190896 (DE-599)BVBBV040024888 |
| discipline | Physik Elektrotechnik |
| edition | 1. Aufl. |
| format | Thesis Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02067nam a2200517 cb4500</leader><controlfield tag="001">BV040024888</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180913 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">120402s2012 d||| m||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9783941650367</subfield><subfield code="9">978-3-941650-36-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)796190896</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV040024888</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-12</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 279d</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 690d</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Jäger, Christian Claus</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Polycrystalline silicon thin films for electronic applications</subfield><subfield code="c">Christian Claus Jäger</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">1. Aufl.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Garching</subfield><subfield code="b">Verein zur Förderung des Walter Schottky Inst. der Techn. Univ. München e.V.</subfield><subfield code="c">2012</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">III, 202 S.</subfield><subfield code="b">graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Selected topics of semiconductor physics and technology</subfield><subfield code="v">136</subfield></datafield><datafield tag="502" ind1=" " ind2=" "><subfield code="a">Zugl.: München, Techn. Univ., Diss., 2011</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Polykristall</subfield><subfield code="0">(DE-588)4188261-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Rekristallisation</subfield><subfield code="0">(DE-588)4177655-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mehrschichtsystem</subfield><subfield code="0">(DE-588)4244347-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Metallschicht</subfield><subfield code="0">(DE-588)4252858-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Opferschicht</subfield><subfield code="0">(DE-588)4707990-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Polykristall</subfield><subfield code="0">(DE-588)4188261-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Rekristallisation</subfield><subfield code="0">(DE-588)4177655-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="3"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="4"><subfield code="a">Mehrschichtsystem</subfield><subfield code="0">(DE-588)4244347-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="5"><subfield code="a">Metallschicht</subfield><subfield code="0">(DE-588)4252858-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="6"><subfield code="a">Opferschicht</subfield><subfield code="0">(DE-588)4707990-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Selected topics of semiconductor physics and technology</subfield><subfield code="v">136</subfield><subfield code="w">(DE-604)BV011499438</subfield><subfield code="9">136</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-024881909</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV040024888 |
| illustrated | Illustrated |
| indexdate | 2024-07-10T00:16:22Z |
| institution | BVB |
| isbn | 9783941650367 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-024881909 |
| oclc_num | 796190896 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-12 |
| owner_facet | DE-91 DE-BY-TUM DE-12 |
| physical | III, 202 S. graph. Darst. |
| publishDate | 2012 |
| publishDateSearch | 2012 |
| publishDateSort | 2012 |
| publisher | Verein zur Förderung des Walter Schottky Inst. der Techn. Univ. München e.V. |
| record_format | marc |
| series | Selected topics of semiconductor physics and technology |
| series2 | Selected topics of semiconductor physics and technology |
| spelling | Jäger, Christian Claus Verfasser aut Polycrystalline silicon thin films for electronic applications Christian Claus Jäger 1. Aufl. Garching Verein zur Förderung des Walter Schottky Inst. der Techn. Univ. München e.V. 2012 III, 202 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Selected topics of semiconductor physics and technology 136 Zugl.: München, Techn. Univ., Diss., 2011 Polykristall (DE-588)4188261-1 gnd rswk-swf Rekristallisation (DE-588)4177655-0 gnd rswk-swf Mehrschichtsystem (DE-588)4244347-7 gnd rswk-swf Metallschicht (DE-588)4252858-6 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf Opferschicht (DE-588)4707990-3 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Silicium (DE-588)4077445-4 s Polykristall (DE-588)4188261-1 s Rekristallisation (DE-588)4177655-0 s Dünnschichttechnik (DE-588)4136339-5 s Mehrschichtsystem (DE-588)4244347-7 s Metallschicht (DE-588)4252858-6 s Opferschicht (DE-588)4707990-3 s DE-604 Selected topics of semiconductor physics and technology 136 (DE-604)BV011499438 136 |
| spellingShingle | Jäger, Christian Claus Polycrystalline silicon thin films for electronic applications Selected topics of semiconductor physics and technology Polykristall (DE-588)4188261-1 gnd Rekristallisation (DE-588)4177655-0 gnd Mehrschichtsystem (DE-588)4244347-7 gnd Metallschicht (DE-588)4252858-6 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Silicium (DE-588)4077445-4 gnd Opferschicht (DE-588)4707990-3 gnd |
| subject_GND | (DE-588)4188261-1 (DE-588)4177655-0 (DE-588)4244347-7 (DE-588)4252858-6 (DE-588)4136339-5 (DE-588)4077445-4 (DE-588)4707990-3 (DE-588)4113937-9 |
| title | Polycrystalline silicon thin films for electronic applications |
| title_auth | Polycrystalline silicon thin films for electronic applications |
| title_exact_search | Polycrystalline silicon thin films for electronic applications |
| title_full | Polycrystalline silicon thin films for electronic applications Christian Claus Jäger |
| title_fullStr | Polycrystalline silicon thin films for electronic applications Christian Claus Jäger |
| title_full_unstemmed | Polycrystalline silicon thin films for electronic applications Christian Claus Jäger |
| title_short | Polycrystalline silicon thin films for electronic applications |
| title_sort | polycrystalline silicon thin films for electronic applications |
| topic | Polykristall (DE-588)4188261-1 gnd Rekristallisation (DE-588)4177655-0 gnd Mehrschichtsystem (DE-588)4244347-7 gnd Metallschicht (DE-588)4252858-6 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Silicium (DE-588)4077445-4 gnd Opferschicht (DE-588)4707990-3 gnd |
| topic_facet | Polykristall Rekristallisation Mehrschichtsystem Metallschicht Dünnschichttechnik Silicium Opferschicht Hochschulschrift |
| volume_link | (DE-604)BV011499438 |
| work_keys_str_mv | AT jagerchristianclaus polycrystallinesiliconthinfilmsforelectronicapplications |