Wächtler, T. (2010). Thin films of copper oxide and copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices. Univ.-Verl.
Chicago Style (17th ed.) CitationWächtler, Thomas. Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices. Chemnitz: Univ.-Verl, 2010.
MLA (9th ed.) CitationWächtler, Thomas. Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices. Univ.-Verl, 2010.
Warning: These citations may not always be 100% accurate.