Introduction to plasma technology: science, engineering and applications
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| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Weinheim
Wiley-VCH
2010
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| Subjects: | |
| Online Access: | Inhaltstext Inhaltsverzeichnis |
| Physical Description: | XVI, 215 S. Ill., graph. Darst. 25 cm |
| ISBN: | 9783527327638 |
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Record in the Search Index
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| adam_text |
CONTENTS PREFACE XI SYMBOLS, CONSTANTS AND ELECTRONIC SYMBOLS XIII 1
PLASMA, AN OVERVIEW 2 1.1 INTRODUCTION 1 1.2 PLASMA 4 1.2.1 SPACE
PLASMAS 4 1.2.2 KINETIC PLASMAS 4 1.2.3 TECHNOLOGICAL PLASMAS 5 1.3
CLASSICAL MODELS 5 1.3.1 SIMPLE BALLISTIC AND STATISTICAL MODELS 5 1.3.2
STATISTICAL BEHAVIOUR 6 1.3.3 COLLISIONS BETWEEN PARTICLES 8 1.3.4
COULOMB FORCES 9 1.3.5 BOUNDARIES AND SHEATHS 10 1.3.6 DEGREE OF
IONIZATION 10 1.4 PLASMA RESONANCE 11 1.5 THE DEFINING CHARACTERISTICS
OF A PLASMA 11 REFERENCES 13 FURTHER READING 13 2 ELASTIC AND INELASTIC
COLLISION PROCESSES IN WEAKLY IONIZED CASES 25 2.1 INTRODUCTION 15 2.2
THE DRIFT VELOCITY 15 2.2.1 ELECTRICAL CONDUCTIVITY 17 2.2.2 MOBILITY 17
2.2.3 THERMAL VELOCITY 18 2.2.4 COLLISION FREQUENCY 18 2.2.5 COLLISION
CROSS-SECTION 19 2.3 INELASTIC COLLISION PROCESSES 21 BIBLIOGRAFISCHE
INFORMATIONEN HTTP://D-NB.INFO/1002408482 DIGITALISIERT DURCH VI I
CONTENTS 2.3.2 IONIZATION AND RECOMBINATION PROCESSES 23 2.3.2.1 CHARGE
TRANSFER 24 2.3.2.2 DISSOCIATION 24 2.3.2.3 NEGATIVE IONIZATION 24
2.3.2.4 RECOMBINATION 24 2.3.2.5 METASTABLE IONIZATION 25 REFERENCES 26
3 THE INTERACTION OF ELECTROMAGNETIC FIELDS WITH PLASMAS 29 3.1
INTRODUCTION 29 3.2 THE BEHAVIOUR OF PLASMAS AT DC AND LOW FREQUENCIES
IN THE NEAR FIELD 29 3.2.1 CHARGED PARTICLES IN ELECTROMAGNETIC FIELDS
31 3.2.1.1 BEHAVIOUR OF A CHARGED PARTICLE IN AN OSCILLATING ELECTRIC
FIELD 32 3.2.1.2 PLASMA FREQUENCY 34 3.2.1.3 THE DEBYE RADIUS 35 3.3
BEHAVIOUR OF CHARGED PARTICLES IN MAGNETIC FIELDS (MAGNETIZED PLASMAS)
37 3.4 INITIATION OF AN ELECTRICAL DISCHARGE OR PLASMA 41 3.5 SIMILARITY
CONDITIONS 41 REFERENCES 43 FURTHER READING 43 4 4.1 4.2 4.2.1 4.2.1.1
4.2.2 4.2.3 4.2. CONTENTS VII 5 APPLICATIONS OF NONEQUILIBRIUM COLD
LOW-PRESSURE DISCHARGES AND PLASMAS 77 5.1 INTRODUCTION 77 5.2 PLASMA
PROCESSES USED IN ELECTRONICS FABRICATION 77 5.2.1 THE GLOW DISCHARGE
DIODE 80 5.2.2 THE MAGNETRON 83 5.2.3 INDUCTIVELY COUPLED PLASMAS 84
5.2.4 ELECTRON CYCLOTRON RESONANCE REACTOR 85 5.2.5 THE HELICAL REACTOR
86 5.2.6 THE HELICON REACTOR 87 5.3 LOW-PRESSURE ELECTRIC DISCHARGE AND
PLASMA LAMPS 88 5.3.1 THE LOW-PRESSURE MERCURY VAPOUR LAMP 88 5.3.2 COLD
CATHODE LOW-PRESSURE LAMPS 92 5.3.3 ELECTRODELESS LOW-PRESSURE DISCHARGE
LAMPS 92 5.4 GAS LASERS 92 5.5 FREE ELECTRON AND ION BEAMS 94 5.5.1
ELECTRON AND ION BEAM EVAPORATION 94 5.5.2 ION BEAM PROCESSES 95 5.5.3
HIGH-POWER ELECTRON BEAMS 97 5.6 GLOW DISCHARGE SURFACE TREATMENT 99 5.7
PROPULSION IN SPACE 200 REFERENCES 202 FURTHER READING 202 6
NONEQUILIBRIUM ATMOSPHERIC PRESSURE DISCHARGES AND PLASMAS 203 6.1
INTRODUCTION 203 6. VILI CONTENTS 7.2.2 TUNGSTEN INERT GAS WELDING 127
7.2.3 SUBMERGED ARC WELDING 129 7.2.4 THE PLASMA TORCH 229 7.3 ELECTRIC
ARC MELTING 232 7.3.1 THE THREE-PHASE AC ARC FURNACE 13 2 7.3.2 DC ARC
FURNACES 134 7.3.3 ELECTRIC ARC SMELTING 235 7.3.4 PLASMA MELTING
FURNACES 236 7.3.5 VACUUM ARC FURNACES 237 7.4 ARC GAS HEATERS 238 7.4.1
INDUCTIVELY COUPLED ARC DISCHARGES 139 7.5 HIGH-PRESSURE DISCHARGE LAMPS
242 7.6 ION LASERS 244 7.7 ARC INTERRUPTERS 245 7.7.1 VACUUM CIRCUIT
BREAKERS AND CONTACTORS 247 7.8 MAGNETOPLASMADYNAMIC POWER GENERATION
249 7.9 GENERATION OF ELECTRICITY BY NUCLEAR FUSION 249 7.10 NATURAL
PHENOMENA 150 7.10.1 LIGHTNING 250 FURTHER READING 152 8 DIAGNOSTIC
METHODS 155 8.1 INTRODUCTION 255 8.2 NEUTRAL PARTICLE DENSITY
MEASUREMENT 255 8.3 PROBES AND SENSORS 256 8.3.1 THE LANGMUIR PROBE 256
8.3.2 MAGNETIC PROBES 158 8.4 OPTICAL SPECTROSCOPY 259 8.4.1 OPTICAL
EMISSION SPECTROSCOPY 159 8.4.2 ABSORPTION SPECTROSCOPY 262 8.4.3
SCATTERING MEASUREMENTS 262 8.5 INTERFEROMETRY 262 8.5.1 MICROWAVE
INTERFEROMETER 263 8.6 MASS SPECTROMETRY 164 8.7 ELECTRICAL MEASUREMENTS
265 8.7. CONTENTS IX 9.3.1 REACTIVE STABILIZATION 276 9.4 EFFECT OF
FREQUENCY 279 9.5 INTERACTION BETWEEN THE PLASMA AND POWER SUPPLY TIME
CONSTANTS 279 9.6 MATCHING 280 9.7 RESONANCE 182 9.8 PARASITIC
INDUCTANCE AND CAPACITANCE 283 FURTHER READING 285 10 PLASMA POWER
SUPPLIES 287 10.1 INTRODUCTION 287 10.2 TRANSFORMERS AND INDUCTORS 287
10.3 RECTIFICATION 192 10.4 SEMICONDUCTOR POWER SUPPLIES 193 10.4.1 THE
INVERTER CIRCUIT 293 10.4.2 SEMICONDUCTOR SWITCHES 295 10.4.3 CURRENT
CONTROL 195 10.4.4 THE INVERTER CIRCUIT 296 10.4.5 CONVERTER CIRCUITS
297 10.4.6 INVERTER FREQUENCIES 198 10.4.7 HIGH-FREQUENCY INVERTER 298
10.5 ELECTRONIC VALVE OSCILLATORS 299 10.6 MICROWAVE POWER SUPPLIES 199
10.7 PULSED POWER SUPPLIES 200 10.8 IGNITION POWER SUPPLIES 202 10.9
ELECTROMAGNETIC INTERFERENCE 205 10.9.1 CONDUCTION 206 FURTHER READING
207 INDEX 209 |
| any_adam_object | 1 |
| author | Harry, John E. |
| author_facet | Harry, John E. |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Chemie / Pharmazie Maschinenbau / Maschinenwesen Physik Werkstoffwissenschaften / Fertigungstechnik |
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| isbn | 9783527327638 |
| language | English |
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| publishDate | 2010 |
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| spelling | Harry, John E. Verfasser aut Introduction to plasma technology science, engineering and applications John Harry Weinheim Wiley-VCH 2010 XVI, 215 S. Ill., graph. Darst. 25 cm txt rdacontent n rdamedia nc rdacarrier Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 s DE-604 text/html http://deposit.dnb.de/cgi-bin/dokserv?id=3474363&prov=M&dok_var=1&dok_ext=htm Inhaltstext DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=020633077&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Harry, John E. Introduction to plasma technology science, engineering and applications Plasmatechnik (DE-588)4140353-8 gnd |
| subject_GND | (DE-588)4140353-8 |
| title | Introduction to plasma technology science, engineering and applications |
| title_auth | Introduction to plasma technology science, engineering and applications |
| title_exact_search | Introduction to plasma technology science, engineering and applications |
| title_full | Introduction to plasma technology science, engineering and applications John Harry |
| title_fullStr | Introduction to plasma technology science, engineering and applications John Harry |
| title_full_unstemmed | Introduction to plasma technology science, engineering and applications John Harry |
| title_short | Introduction to plasma technology |
| title_sort | introduction to plasma technology science engineering and applications |
| title_sub | science, engineering and applications |
| topic | Plasmatechnik (DE-588)4140353-8 gnd |
| topic_facet | Plasmatechnik |
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