Atomic layer deposition for nanotechnology: an enabling process for nanotechnology fabrication
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Ivoryton, Conn.
Ivoryton Press
2008
|
| Schlagworte: | |
| Beschreibung: | XV, 239 S. Ill., graph. Darst. |
| ISBN: | 9780981466347 9780981466378 |
Internformat
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| 300 | |a XV, 239 S. |b Ill., graph. Darst. | ||
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| 650 | 4 | |a Chemical vapor deposition | |
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| 650 | 4 | |a Microelectronics | |
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Datensatz im Suchindex
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| id | DE-604.BV036565394 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T22:42:59Z |
| institution | BVB |
| isbn | 9780981466347 9780981466378 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-020486625 |
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| physical | XV, 239 S. Ill., graph. Darst. |
| publishDate | 2008 |
| publishDateSearch | 2008 |
| publishDateSort | 2008 |
| publisher | Ivoryton Press |
| record_format | marc |
| spelling | Sherman, Arthur Verfasser (DE-588)137287038 aut Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication by Arthur Sherman Ivoryton, Conn. Ivoryton Press 2008 XV, 239 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Chemical vapor deposition Epitaxy Microelectronics Nanotechnology Atomlagenabscheidung (DE-588)7712127-2 gnd rswk-swf Atomlagenabscheidung (DE-588)7712127-2 s DE-604 |
| spellingShingle | Sherman, Arthur Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication Chemical vapor deposition Epitaxy Microelectronics Nanotechnology Atomlagenabscheidung (DE-588)7712127-2 gnd |
| subject_GND | (DE-588)7712127-2 |
| title | Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication |
| title_auth | Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication |
| title_exact_search | Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication |
| title_full | Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication by Arthur Sherman |
| title_fullStr | Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication by Arthur Sherman |
| title_full_unstemmed | Atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication by Arthur Sherman |
| title_short | Atomic layer deposition for nanotechnology |
| title_sort | atomic layer deposition for nanotechnology an enabling process for nanotechnology fabrication |
| title_sub | an enabling process for nanotechnology fabrication |
| topic | Chemical vapor deposition Epitaxy Microelectronics Nanotechnology Atomlagenabscheidung (DE-588)7712127-2 gnd |
| topic_facet | Chemical vapor deposition Epitaxy Microelectronics Nanotechnology Atomlagenabscheidung |
| work_keys_str_mv | AT shermanarthur atomiclayerdepositionfornanotechnologyanenablingprocessfornanotechnologyfabrication |