Dielectric thin films for future ULSI devices: science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008]
Saved in:
| Other Authors: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Tokyo
Japan Soc. of Applied Physics
2009
|
| Series: | Japanese journal of applied physics
48,5,2 : Special issue |
| Subjects: | |
| Item Description: | Einzelaufnahme eines Zeitschr.-Heftes |
| Physical Description: | Getr. Zählung Ill., graph. Darst. |
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| id | DE-604.BV036458343 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T22:39:53Z |
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| language | English |
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| physical | Getr. Zählung Ill., graph. Darst. |
| publishDate | 2009 |
| publishDateSearch | 2009 |
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| publisher | Japan Soc. of Applied Physics |
| record_format | marc |
| series2 | Japanese journal of applied physics |
| spelling | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] ed. by Akira Sakai ... Tokyo Japan Soc. of Applied Physics 2009 Getr. Zählung Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Japanese journal of applied physics 48,5,2 : Special issue Einzelaufnahme eines Zeitschr.-Heftes Dielektrische Schicht (DE-588)4194257-7 gnd rswk-swf ULSI (DE-588)4226286-0 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 2008 Tokio gnd-content ULSI (DE-588)4226286-0 s Dielektrische Schicht (DE-588)4194257-7 s DE-604 Sakai, Akira edt |
| spellingShingle | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] Dielektrische Schicht (DE-588)4194257-7 gnd ULSI (DE-588)4226286-0 gnd |
| subject_GND | (DE-588)4194257-7 (DE-588)4226286-0 (DE-588)1071861417 |
| title | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] |
| title_auth | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] |
| title_exact_search | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] |
| title_full | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] ed. by Akira Sakai ... |
| title_fullStr | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] ed. by Akira Sakai ... |
| title_full_unstemmed | Dielectric thin films for future ULSI devices science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] ed. by Akira Sakai ... |
| title_short | Dielectric thin films for future ULSI devices |
| title_sort | dielectric thin films for future ulsi devices science and technology selection of papers presented at the 2008 international workshop on dielectric thin films for future ulsi devices science and technology iwdtf2008 which was held in tokyo from november 5 through 7 in 2008 |
| title_sub | science and technology ; [selection of papers presented at the 2008 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" ; (IWDTF2008), which was held in Tokyo from November 5 through 7 in 2008] |
| topic | Dielektrische Schicht (DE-588)4194257-7 gnd ULSI (DE-588)4226286-0 gnd |
| topic_facet | Dielektrische Schicht ULSI Konferenzschrift 2008 Tokio |
| work_keys_str_mv | AT sakaiakira dielectricthinfilmsforfutureulsidevicesscienceandtechnologyselectionofpaperspresentedatthe2008internationalworkshopondielectricthinfilmsforfutureulsidevicesscienceandtechnologyiwdtf2008whichwasheldintokyofromnovember5through7in2008 |