Oberflächenchemie von Silicium, speziell: Verhalten von Silicium bei der Si3N4-Schlickerguß-Technologie
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Bibliographic Details
Main Author: Meisel, Ingrid (Author)
Format: Thesis Book
Language:German
Published: 1989
Subjects:
Physical Description:VI, 129 S. graph. Darst.

There is no print copy available.

Interlibrary loan Place Request Caution: Not in THWS collection!