Plasma etching in semiconductor fabrication:
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | Undetermined |
| Published: |
Amsterdam <<[u.a.]>>
Elsevier
1985
|
| Series: | Plasma technology
1 |
| Subjects: | |
| Physical Description: | X, 316 S. |
Staff View
MARC
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Record in the Search Index
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| any_adam_object | |
| author | Morgan, Russ A. |
| author_facet | Morgan, Russ A. |
| author_role | aut |
| author_sort | Morgan, Russ A. |
| author_variant | r a m ra ram |
| building | Verbundindex |
| bvnumber | BV024647768 |
| classification_rvk | ZN 4150 |
| ctrlnum | (OCoLC)636682301 (DE-599)BVBBV024647768 |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV024647768 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T21:54:00Z |
| institution | BVB |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-018059371 |
| oclc_num | 636682301 |
| open_access_boolean | |
| owner | DE-83 |
| owner_facet | DE-83 |
| physical | X, 316 S. |
| publishDate | 1985 |
| publishDateSearch | 1985 |
| publishDateSort | 1985 |
| publisher | Elsevier |
| record_format | marc |
| series | Plasma technology |
| series2 | Plasma technology |
| spelling | Morgan, Russ A. Verfasser aut Plasma etching in semiconductor fabrication Russ A. Morgan Amsterdam <<[u.a.]>> Elsevier 1985 X, 316 S. txt rdacontent n rdamedia nc rdacarrier Plasma technology 1 Plasmastrahl (DE-588)4206366-8 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf Bearbeitung (DE-588)4120981-3 gnd rswk-swf Halbleiterindustrie (DE-588)4158803-4 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 s Plasmaätzen (DE-588)4174821-9 s DE-604 Halbleiterindustrie (DE-588)4158803-4 s Plasmastrahl (DE-588)4206366-8 s Halbleiter (DE-588)4022993-2 s Bearbeitung (DE-588)4120981-3 s Plasma technology 1 (DE-604)BV001897163 1 |
| spellingShingle | Morgan, Russ A. Plasma etching in semiconductor fabrication Plasma technology Plasmastrahl (DE-588)4206366-8 gnd Plasmaätzen (DE-588)4174821-9 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Halbleiter (DE-588)4022993-2 gnd Bearbeitung (DE-588)4120981-3 gnd Halbleiterindustrie (DE-588)4158803-4 gnd |
| subject_GND | (DE-588)4206366-8 (DE-588)4174821-9 (DE-588)4158814-9 (DE-588)4022993-2 (DE-588)4120981-3 (DE-588)4158803-4 |
| title | Plasma etching in semiconductor fabrication |
| title_auth | Plasma etching in semiconductor fabrication |
| title_exact_search | Plasma etching in semiconductor fabrication |
| title_full | Plasma etching in semiconductor fabrication Russ A. Morgan |
| title_fullStr | Plasma etching in semiconductor fabrication Russ A. Morgan |
| title_full_unstemmed | Plasma etching in semiconductor fabrication Russ A. Morgan |
| title_short | Plasma etching in semiconductor fabrication |
| title_sort | plasma etching in semiconductor fabrication |
| topic | Plasmastrahl (DE-588)4206366-8 gnd Plasmaätzen (DE-588)4174821-9 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Halbleiter (DE-588)4022993-2 gnd Bearbeitung (DE-588)4120981-3 gnd Halbleiterindustrie (DE-588)4158803-4 gnd |
| topic_facet | Plasmastrahl Plasmaätzen Halbleitertechnologie Halbleiter Bearbeitung Halbleiterindustrie |
| volume_link | (DE-604)BV001897163 |
| work_keys_str_mv | AT morganrussa plasmaetchinginsemiconductorfabrication |