Holdings: Lecture notes on principles of plasma processing

Lecture notes on principles of plasma processing:

Saved in:

Bibliographic Details
Main Authors:	Chen, Francis F. 1929- (Author), Chang, Jane P. (Author)
Format:	Book
Language:	English
Published:	New York Springer 2003
Subjects:	Plasmaphysik Plasmatechnik
Online Access:	Inhaltsverzeichnis
Item Description:	Hier auch später erschienene, unveränderte Nachdrucke (ohne CD-ROM)
Physical Description:	IX, 208 S. Ill., graph. Darst. 1 CD-ROM
ISBN:	0306474972 9780306474972

Staff View

MARC


LEADER	00000nam a22000001c 4500
001	BV024502849
003	DE-604
005	20180516
007	t
008	090924s2003 ad\|\| \|\|\|\| 00\|\|\| eng d
020			\|a 0306474972 \|9 0-306-47497-2
020			\|a 9780306474972 \|9 978-0-306-47497-2
035			\|a (OCoLC)845543187
035			\|a (DE-599)BVBBV024502849
040			\|a DE-604 \|b ger \|e rakwb
041	0		\|a eng
049			\|a DE-83 \|a DE-11 \|a DE-384
082	0		\|a 621.044
084			\|a UR 8000 \|0 (DE-625)146642: \|2 rvk
100	1		\|a Chen, Francis F. \|d 1929- \|e Verfasser \|0 (DE-588)17201932X \|4 aut
245	1	0	\|a Lecture notes on principles of plasma processing \|c Francis F. Chen and Jane P. Chang
264		1	\|a New York \|b Springer \|c 2003
300			\|a IX, 208 S. \|b Ill., graph. Darst. \|e 1 CD-ROM
336			\|b txt \|2 rdacontent
337			\|b n \|2 rdamedia
338			\|b nc \|2 rdacarrier
500			\|a Hier auch später erschienene, unveränderte Nachdrucke (ohne CD-ROM)
650	0	7	\|a Plasmaphysik \|0 (DE-588)4046259-6 \|2 gnd \|9 rswk-swf
650	0	7	\|a Plasmatechnik \|0 (DE-588)4140353-8 \|2 gnd \|9 rswk-swf
689	0	0	\|a Plasmaphysik \|0 (DE-588)4046259-6 \|D s
689	0		\|5 DE-604
689	1	0	\|a Plasmatechnik \|0 (DE-588)4140353-8 \|D s
689	1		\|5 DE-604
700	1		\|a Chang, Jane P. \|e Verfasser \|4 aut
856	4	2	\|m GBV Datenaustausch \|q application/pdf \|u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=018477504&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA \|3 Inhaltsverzeichnis
999			\|a oai:aleph.bib-bvb.de:BVB01-018477504

Record in the Search Index

_version_	1804140499641040896
adam_text	LECTURE NOTES ON PRINCIPLES OF PLASMA PROCESSING FRANCIS F. CHEN ELECTRICAL ENGINEERING DEPARTMENT AND JANE P. CHANG CHEMICAL ENGINEERING DEPARTMENT UNIVERSITY OF CALIFORNIA LOS ANGELES, CALIFORNIA KLUWER ACADEMIC / PLENUM PUBLISHERS NEW YORK, BOSTON, DORDRECHT, LONDON, MOSCOW TABLE OF CONTENTS VLL TABLE OF PLASMA PHYSICS PART AL: INTRODUCTION TO PLASMA SCIENCE I. WHAT IS A PLASMA? 1 II. PLASMA FUNDAMENTALS 3 1. QUASINEUTRALITY AND DEBYE LENGTH 2. PLASMA FREQUENCY AND ACOUSTIC VELOCITY 3. LARMOR RADIUS AND CYCLOTRON FREQUENCY 4. E X * DRIFT 5. SHEATHS AND PRESHEATHS PART A2: INTRODUCTION TO GAS DISCHARGES HI. GAS DISCHARGE FUNDAMENTALS 11 1. COLLISION CROSS SECTION AND MEAN FREE PATH 2. IONIZATION AND EXCITATION CROSS SECTIONS 3. COULOMB COLLISIONS; RESISTIVITY 4. TRANSITION BETWEEN NEUTRAL- AND ION- DOMINATED ELECTRON COLLISIONS 5. MOBILITY, DIFFUSION, AMBIPOLAR DIFFUSION 6. MAGNETIC FIELD EFFECTS; MAGNETIC BUCKETS CROSS SECTION DATA 21 PART A3: PLASMA SOURCES I IV. INTRODUCTION TO PLASMA SOURCES 25 1. DESIRABLE CHARACTERISTICS OF PLASMA PROCESSING SOURCES 2. ELEMENTS OF A PLASMA SOURCE PART A4: PLASMA SOURCES II V. RLE DISCHARGES 31 1. DEBYE SHEATH 2. CHILD-LANGMUIR SHEATH 3. APPLYING A DC BIAS 4. APPLYING AN RF BIAS 5. DISPLACEMENT CURRENT 6. ION DYNAMICS IN THE SHEATH 7. OTHER EFFECTS IN RIE REACTORS 8. DISADVANTAGES OF RIE REACTORS 9. MODIFIED RIE DEVICES PLASMA CHEMISTRY PART BL : OVERVIEW OF PLASMA PROCESSING IN MICROELECTRONICS FABRICATION I. PLASMA PROCESSING 99 II. APPLICATIONS IN MICROELECTRONICS 100 PART B2: KINETIC THEORY AND COLLISIONS I. KINETIC THEORY 103 II. PRACTICAL GAS KINETIC MODELS AND MACROSCOPIC PROPERTIES 109 1. MAXWELL-BOLTZMANN DISTRIBUTION (MBD) 2. A SIMPLIFIED GAS MODEL (SGM) 3. ENERGY CONTENT 4. COLLISION RATE BETWEEN MOLECULES 5. MEAN FREE PATH 6. FLUX OF GAS PARTICLES ON A SURFACE 7. GAS PRESSURE 8. TRANSPORT PROPERTIES 9. GAS FLOW III. COLLISION DYNAMICS 119 1. COLLISION CROSS SECTIONS 2. ENERGY TRANSFER 3. INELASTIC COLLISIONS PART B3: ATOMIC COLLISIONS AND SPECTRA I. ATOMIC ENERGY LEVELS 125 II. ATOMIC COLLISIONS 126 1. EXCITATION PROCESSES 2. RELAXATION AND RECOMBINATION PROCESSES III. ELASTIC COLLISIONS 129 1. COULOMB COLLISIONS 2. POLARIZATION SCATTERING IV. INELASTIC COLLISIONS 130 1. CONSTRAINTS ON ELECTRONIC TRANSITIONS 2. IDENTIFICATION OF ATOMIC SPECTRA 3. A SIMPLIFIED MODEL VLLL TABLE OF CONTENTS PART A5: PLASMA SOURCES III VI. ECR SOURCES 47 VII. INDUCTIVELY COUPLED PLASMAS (ICPS) 49 1. OVERVIEW OF ICPS 2. NORMAL SKIN DEPTH 3. ANOMALOUS SKIN DEPTH 4. IONIZATION ENERGY 5. TRANSFORMER COUPLED PLASMAS (TCPS) 6. MATCHING CIRCUITS 7. ELECTROSTATIC CHUCKS (ESCS) PART A6: PLASMA SOURCES IV VIII. HELICON WAVE SOURCES AND HDPS 61 1. DISPERSION RELATION 2. WAVE PATTERNS AND ANTENNAS 3. MODE JUMPING 4. MODIFIED SKIN DEPTH 5. TRIVELPIECE-GOULD MODES 6. EXAMPLES OF HELICON MEASUREMENTS 7. COMMERCIAL HELICON SOURCES IX. DISCHARGE EQUILIBRIUM 69 1. PARTICLE BALANCE 2. ENERGY BALANCE 3. ELECTRON TEMPERATURE 4. ION TEMPERATURE PART A7: PLASMA DIAGNOSTICS X. INTRODUCTION 75 XI. REMOTE DIAGNOSTICS 75 1. OPTICAL SPECTROSCOPY 2. MICROWAVE INTERFEROMETRY 3. LASER INDUCED FLUORESCENCE (LIF) XII. LANGMUIR PROBES 79 1. CONSTRUCTION AND CIRCUIT 2. THE ELECTRON CHARACTERISTIC 3. ELECTRON SATURATION 4. SPACE POTENTIAL 5. ION SATURATION CURRENT 83 6. DISTRIBUTION FUNCTIONS 90 7. RF COMPENSATION 8. DOUBLE PROBES AND HOT PROBES PART B4: MOLECULAR COLLISIONS AND SPECTRA I. MOLECULAR ENERGY LEVELS 137 1. ELECTRONIC ENERGY LEVEL 2. VIBRATIONAL ENERGY LEVEL 3. ROTATIONAL ENERGY LEVEL II. SELECTION RULE FOR OPTICAL EMISSION OF MOLECULES 139 III. ELECTRON COLLISIONS WITH MOLECULES 140 1. FRANK-CONDON PRINCIPLE 2. DISSOCIATION 3. DISSOCIATIVE IONIZATION 4. DISSOCIATIVE RECOMBINATION 5. DISSOCIATIVE ELECTRON ATTACHMENT 6. ELECTRON IMPACT DETACHMENT 7. VIBRATIONAL AND ROTATIONAL EXCITATION IV. HEAVY PARTICLE COLLISIONS 142 V. GAS PHASE KINETICS 143 PART B5: PLASMA DIAGNOSTICS I. OPTICAL EMISSION SPECTROSCOPY 151 1. OPTICAL EMISSION 2. SPECTROSCOPY 3. ACTINOMETRY 4. ADVANTAGES/DISADVANTAGES 5. APPLICATION: END-POINT DETECTION II. LASER INDUCED FLUORESCENCE 161 HI. LASER INTERFEROMETRY 162 IV. FULL-WAFER INTERFEROMETRY 163 V. MASS SPECTROMETRY 164 PART B6: PLASMA SURFACE KINETICS I. PLASMA CHEMISTRY 167 II. SURFACE REACTIONS 167 1. SPONTANEOUS SURFACE ETCHING 2. SPONTANEOUS DEPOSITION 3. ION SPUTTERING KINETICS 4. ION-ENHANCED CHEMICAL ETCHING HI. LOADING 777 IV. SELECTIVITY 178 V. DETAILED REACTION MODELING / 79 TABLE OF CONTENTS IX XIII. OTHER LOCAL DIAGNOSTICS 93 1. MAGNETIC PROBES 2. ENERGY ANALYZERS 3. RF CURRENT PROBE 4. PLASMA OSCILLATION PROBE I. II. PART B7: FEATURE EVOLUTION AND MODELING FUNDAMENTALS OF FEATURE EVOLUTION IN PLASMA ETCHING 183 PREDICTIVE MODELING 185 186 III. MECHANISMS OF PROFILE EVOLUTION 1. ION BOMBARDMENT DIRECTIONALITY 2. ION SCATTERING WITHIN THE FEATURE 3. DEPOSITION RATE OF PASSIVANTS 4. LINE-OF-SIGHT REDEPOSITION OF PRODUCTS 5. CHARGING OF SURFACES IN THE FEATURES IV. PROFILE SIMULATION 190 V. PLASMA DAMAGE 193 1. CONTAMINATION 2. PARTICULATES 3. GATE OXIDE DAMAGE - PHOTON 4. GATE OXIDE DAMAGE - ELECTRICAL STRESS 5. LATTICE DAMAGE 6. POST-ETCH CORROSION EPILOGUE: CURRENT PROBLEMS IN SEMICONDUCTOR PROCESSING I. FRONT-END CHALLENGES 199 1. HIGH-K DIELECTRICS 2. METAL GATES II. BACK-END CHALLENGES 201 1. COPPER METALLLIZATION 2. INTERLAYER DIELECTRICS (ILDS) 3. BARRIER MATERIALS III. PATTERNING NANOMETER FEATURES 204 1. E-BEAM 2. RESIST TRIMMING IV. DEEP REACTIVE ETCH FOR MEMS 205 V. PLASMA-INDUCED DAMAGE 206 VI. SPECIES CONTROL IN PLASMA REACTORS 207 199
any_adam_object	1
author	Chen, Francis F. 1929- Chang, Jane P.
author_GND	(DE-588)17201932X
author_facet	Chen, Francis F. 1929- Chang, Jane P.
author_role	aut aut
author_sort	Chen, Francis F. 1929-
author_variant	f f c ff ffc j p c jp jpc
building	Verbundindex
bvnumber	BV024502849
classification_rvk	UR 8000
ctrlnum	(OCoLC)845543187 (DE-599)BVBBV024502849
dewey-full	621.044
dewey-hundreds	600 - Technology (Applied sciences)
dewey-ones	621 - Applied physics
dewey-raw	621.044
dewey-search	621.044
dewey-sort	3621.044
dewey-tens	620 - Engineering and allied operations
discipline	Physik Werkstoffwissenschaften / Fertigungstechnik
format	Book
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01562nam a22003971c 4500</leader><controlfield tag="001">BV024502849</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20180516 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">090924s2003 ad\|\| \|\|\|\| 00\|\|\| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0306474972</subfield><subfield code="9">0-306-47497-2</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780306474972</subfield><subfield code="9">978-0-306-47497-2</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)845543187</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV024502849</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-83</subfield><subfield code="a">DE-11</subfield><subfield code="a">DE-384</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.044</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UR 8000</subfield><subfield code="0">(DE-625)146642:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Chen, Francis F.</subfield><subfield code="d">1929-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)17201932X</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Lecture notes on principles of plasma processing</subfield><subfield code="c">Francis F. Chen and Jane P. Chang</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="b">Springer</subfield><subfield code="c">2003</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">IX, 208 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield><subfield code="e">1 CD-ROM</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Hier auch später erschienene, unveränderte Nachdrucke (ohne CD-ROM)</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmaphysik</subfield><subfield code="0">(DE-588)4046259-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmaphysik</subfield><subfield code="0">(DE-588)4046259-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chang, Jane P.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">GBV Datenaustausch</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=018477504&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-018477504</subfield></datafield></record></collection>
id	DE-604.BV024502849
illustrated	Illustrated
indexdate	2024-07-09T22:00:57Z
institution	BVB
isbn	0306474972 9780306474972
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-018477504
oclc_num	845543187
open_access_boolean
owner	DE-83 DE-11 DE-384
owner_facet	DE-83 DE-11 DE-384
physical	IX, 208 S. Ill., graph. Darst. 1 CD-ROM
publishDate	2003
publishDateSearch	2003
publishDateSort	2003
publisher	Springer
record_format	marc
spelling	Chen, Francis F. 1929- Verfasser (DE-588)17201932X aut Lecture notes on principles of plasma processing Francis F. Chen and Jane P. Chang New York Springer 2003 IX, 208 S. Ill., graph. Darst. 1 CD-ROM txt rdacontent n rdamedia nc rdacarrier Hier auch später erschienene, unveränderte Nachdrucke (ohne CD-ROM) Plasmaphysik (DE-588)4046259-6 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Plasmaphysik (DE-588)4046259-6 s DE-604 Plasmatechnik (DE-588)4140353-8 s Chang, Jane P. Verfasser aut GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=018477504&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis
spellingShingle	Chen, Francis F. 1929- Chang, Jane P. Lecture notes on principles of plasma processing Plasmaphysik (DE-588)4046259-6 gnd Plasmatechnik (DE-588)4140353-8 gnd
subject_GND	(DE-588)4046259-6 (DE-588)4140353-8
title	Lecture notes on principles of plasma processing
title_auth	Lecture notes on principles of plasma processing
title_exact_search	Lecture notes on principles of plasma processing
title_full	Lecture notes on principles of plasma processing Francis F. Chen and Jane P. Chang
title_fullStr	Lecture notes on principles of plasma processing Francis F. Chen and Jane P. Chang
title_full_unstemmed	Lecture notes on principles of plasma processing Francis F. Chen and Jane P. Chang
title_short	Lecture notes on principles of plasma processing
title_sort	lecture notes on principles of plasma processing
topic	Plasmaphysik (DE-588)4046259-6 gnd Plasmatechnik (DE-588)4140353-8 gnd
topic_facet	Plasmaphysik Plasmatechnik
url	http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=018477504&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA
work_keys_str_mv	AT chenfrancisf lecturenotesonprinciplesofplasmaprocessing AT changjanep lecturenotesonprinciplesofplasmaprocessing

Holdings

There is no print copy available.

Interlibrary loan Place Request Caution: Not in THWS collection! Indexes

MARC

Record in the Search Index

There is no print copy available.

Similar Items