Micolithography fundamentals in semiconductor devices and fabrication technology:
Saved in:
| Main Authors: | , , |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
New York [u.a.]
Dekker
1998
|
| Subjects: | |
| Physical Description: | V, 327 S. Ill., graph. Darst. |
| ISBN: | 0824799518 |
Staff View
MARC
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Record in the Search Index
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| any_adam_object | |
| author | Nonogaki, Saburo Ueno, Takumi Ito, Toshio |
| author_facet | Nonogaki, Saburo Ueno, Takumi Ito, Toshio |
| author_role | aut aut aut |
| author_sort | Nonogaki, Saburo |
| author_variant | s n sn t u tu t i ti |
| building | Verbundindex |
| bvnumber | BV023773434 |
| ctrlnum | (OCoLC)245635520 (DE-599)BVBBV023773434 |
| dewey-full | 621.38152 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38152 |
| dewey-search | 621.38152 |
| dewey-sort | 3621.38152 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV023773434 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T21:36:31Z |
| institution | BVB |
| isbn | 0824799518 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-017415666 |
| oclc_num | 245635520 |
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| owner | DE-634 |
| owner_facet | DE-634 |
| physical | V, 327 S. Ill., graph. Darst. |
| publishDate | 1998 |
| publishDateSearch | 1998 |
| publishDateSort | 1998 |
| publisher | Dekker |
| record_format | marc |
| spelling | Nonogaki, Saburo Verfasser aut Micolithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki; Takumi Ueno; Toshio Ito New York [u.a.] Dekker 1998 V, 327 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Fertigung (DE-588)4016899-2 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Röntgenlithografie (DE-588)4178314-1 gnd rswk-swf Halbleiterbauelement (DE-588)4113826-0 gnd rswk-swf Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf Halbleiterbauelement (DE-588)4113826-0 s Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Fertigung (DE-588)4016899-2 s Elektronenstrahllithografie (DE-588)4151897-4 s Lithografie Halbleitertechnologie (DE-588)4191584-7 s Röntgenlithografie (DE-588)4178314-1 s Ueno, Takumi Verfasser aut Ito, Toshio Verfasser aut |
| spellingShingle | Nonogaki, Saburo Ueno, Takumi Ito, Toshio Micolithography fundamentals in semiconductor devices and fabrication technology Fertigung (DE-588)4016899-2 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Röntgenlithografie (DE-588)4178314-1 gnd Halbleiterbauelement (DE-588)4113826-0 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| subject_GND | (DE-588)4016899-2 (DE-588)4191584-7 (DE-588)4174516-4 (DE-588)4178314-1 (DE-588)4113826-0 (DE-588)4151897-4 |
| title | Micolithography fundamentals in semiconductor devices and fabrication technology |
| title_auth | Micolithography fundamentals in semiconductor devices and fabrication technology |
| title_exact_search | Micolithography fundamentals in semiconductor devices and fabrication technology |
| title_full | Micolithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki; Takumi Ueno; Toshio Ito |
| title_fullStr | Micolithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki; Takumi Ueno; Toshio Ito |
| title_full_unstemmed | Micolithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki; Takumi Ueno; Toshio Ito |
| title_short | Micolithography fundamentals in semiconductor devices and fabrication technology |
| title_sort | micolithography fundamentals in semiconductor devices and fabrication technology |
| topic | Fertigung (DE-588)4016899-2 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Röntgenlithografie (DE-588)4178314-1 gnd Halbleiterbauelement (DE-588)4113826-0 gnd Elektronenstrahllithografie (DE-588)4151897-4 gnd |
| topic_facet | Fertigung Lithografie Halbleitertechnologie Fotolithografie Halbleitertechnologie Röntgenlithografie Halbleiterbauelement Elektronenstrahllithografie |
| work_keys_str_mv | AT nonogakisaburo micolithographyfundamentalsinsemiconductordevicesandfabricationtechnology AT uenotakumi micolithographyfundamentalsinsemiconductordevicesandfabricationtechnology AT itotoshio micolithographyfundamentalsinsemiconductordevicesandfabricationtechnology |