Field guide to optical lithography:
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photore...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE Press
2006
|
| Schriftenreihe: | SPIE field guides
6 |
| Schlagworte: | |
| Zusammenfassung: | The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry. |
| Beschreibung: | XII, 122 S. Ill., graph. Darst. |
| ISBN: | 0819462071 |
Internformat
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| 300 | |a XII, 122 S. |b Ill., graph. Darst. | ||
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| 490 | 1 | |a SPIE field guides |v 6 | |
| 520 | 3 | |a The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry. | |
| 650 | 4 | |a Integrated circuits |x Design and construction | |
| 650 | 4 | |a Microlithography | |
| 650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
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Datensatz im Suchindex
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| dewey-search | 621.3815/31 |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV022380998 |
| illustrated | Illustrated |
| index_date | 2024-07-02T17:11:17Z |
| indexdate | 2024-07-09T20:56:23Z |
| institution | BVB |
| isbn | 0819462071 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015589987 |
| oclc_num | 62493268 |
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| owner_facet | DE-1043 DE-29T |
| physical | XII, 122 S. Ill., graph. Darst. |
| publishDate | 2006 |
| publishDateSearch | 2006 |
| publishDateSort | 2006 |
| publisher | SPIE Press |
| record_format | marc |
| series | SPIE field guides |
| series2 | SPIE field guides |
| spelling | Mack, Chris A. Verfasser aut Field guide to optical lithography Chris A. Mack Bellingham, Wash. SPIE Press 2006 XII, 122 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier SPIE field guides 6 The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry. Integrated circuits Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 SPIE field guides 6 (DE-604)BV017946499 6 |
| spellingShingle | Mack, Chris A. Field guide to optical lithography SPIE field guides Integrated circuits Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 |
| title | Field guide to optical lithography |
| title_auth | Field guide to optical lithography |
| title_exact_search | Field guide to optical lithography |
| title_exact_search_txtP | Field guide to optical lithography |
| title_full | Field guide to optical lithography Chris A. Mack |
| title_fullStr | Field guide to optical lithography Chris A. Mack |
| title_full_unstemmed | Field guide to optical lithography Chris A. Mack |
| title_short | Field guide to optical lithography |
| title_sort | field guide to optical lithography |
| topic | Integrated circuits Design and construction Microlithography Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Integrated circuits Design and construction Microlithography Fotolithografie Halbleitertechnologie |
| volume_link | (DE-604)BV017946499 |
| work_keys_str_mv | AT mackchrisa fieldguidetoopticallithography |