Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Berlin
Mensch-&-Buch-Verl.
2005
|
| Schlagworte: | |
| Beschreibung: | Zugl.: Neubiberg, Univ. der Bundeswehr München, Diss., 2005 |
| Beschreibung: | 116 S. Ill., graph. Darst. |
| ISBN: | 3866640676 9783866640672 |
Internformat
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| 100 | 1 | |a Capodieci, Vanessa |e Verfasser |0 (DE-588)131825763 |4 aut | |
| 245 | 1 | 0 | |a Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology |c von Vanessa Capodieci |
| 264 | 1 | |a Berlin |b Mensch-&-Buch-Verl. |c 2005 | |
| 300 | |a 116 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Zugl.: Neubiberg, Univ. der Bundeswehr München, Diss., 2005 | ||
| 650 | 0 | 7 | |a Praseodymoxide |0 (DE-588)4740848-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Molekularstrahlepitaxie |0 (DE-588)4170399-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Lanthanoxid |0 (DE-588)4441515-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Aluminiumoxide |0 (DE-588)4001590-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Gate-Oxid |0 (DE-588)4269383-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dielektrische Schicht |0 (DE-588)4194257-7 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a Dielektrische Schicht |0 (DE-588)4194257-7 |D s |
| 689 | 0 | 1 | |a Gate-Oxid |0 (DE-588)4269383-4 |D s |
| 689 | 0 | 2 | |a Aluminiumoxide |0 (DE-588)4001590-7 |D s |
| 689 | 0 | 3 | |a Praseodymoxide |0 (DE-588)4740848-0 |D s |
| 689 | 0 | 4 | |a Lanthanoxid |0 (DE-588)4441515-1 |D s |
| 689 | 0 | 5 | |a Molekularstrahlepitaxie |0 (DE-588)4170399-6 |D s |
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Datensatz im Suchindex
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| author | Capodieci, Vanessa |
| author_GND | (DE-588)131825763 |
| author_facet | Capodieci, Vanessa |
| author_role | aut |
| author_sort | Capodieci, Vanessa |
| author_variant | v c vc |
| building | Verbundindex |
| bvnumber | BV021996216 |
| ctrlnum | (OCoLC)181571598 (DE-599)BVBBV021996216 |
| format | Book |
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| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV021996216 |
| illustrated | Illustrated |
| index_date | 2024-07-02T16:10:50Z |
| indexdate | 2024-07-09T20:48:58Z |
| institution | BVB |
| isbn | 3866640676 9783866640672 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015210901 |
| oclc_num | 181571598 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | 116 S. Ill., graph. Darst. |
| publishDate | 2005 |
| publishDateSearch | 2005 |
| publishDateSort | 2005 |
| publisher | Mensch-&-Buch-Verl. |
| record_format | marc |
| spelling | Capodieci, Vanessa Verfasser (DE-588)131825763 aut Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology von Vanessa Capodieci Berlin Mensch-&-Buch-Verl. 2005 116 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Zugl.: Neubiberg, Univ. der Bundeswehr München, Diss., 2005 Praseodymoxide (DE-588)4740848-0 gnd rswk-swf Molekularstrahlepitaxie (DE-588)4170399-6 gnd rswk-swf Lanthanoxid (DE-588)4441515-1 gnd rswk-swf Aluminiumoxide (DE-588)4001590-7 gnd rswk-swf Gate-Oxid (DE-588)4269383-4 gnd rswk-swf Dielektrische Schicht (DE-588)4194257-7 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Dielektrische Schicht (DE-588)4194257-7 s Gate-Oxid (DE-588)4269383-4 s Aluminiumoxide (DE-588)4001590-7 s Praseodymoxide (DE-588)4740848-0 s Lanthanoxid (DE-588)4441515-1 s Molekularstrahlepitaxie (DE-588)4170399-6 s DE-604 |
| spellingShingle | Capodieci, Vanessa Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology Praseodymoxide (DE-588)4740848-0 gnd Molekularstrahlepitaxie (DE-588)4170399-6 gnd Lanthanoxid (DE-588)4441515-1 gnd Aluminiumoxide (DE-588)4001590-7 gnd Gate-Oxid (DE-588)4269383-4 gnd Dielektrische Schicht (DE-588)4194257-7 gnd |
| subject_GND | (DE-588)4740848-0 (DE-588)4170399-6 (DE-588)4441515-1 (DE-588)4001590-7 (DE-588)4269383-4 (DE-588)4194257-7 (DE-588)4113937-9 |
| title | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology |
| title_auth | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology |
| title_exact_search | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology |
| title_exact_search_txtP | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology |
| title_full | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology von Vanessa Capodieci |
| title_fullStr | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology von Vanessa Capodieci |
| title_full_unstemmed | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology von Vanessa Capodieci |
| title_short | Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology |
| title_sort | molecular beam deposition mbd and characterisation of high k material as alternative gate oxides for mos technology |
| topic | Praseodymoxide (DE-588)4740848-0 gnd Molekularstrahlepitaxie (DE-588)4170399-6 gnd Lanthanoxid (DE-588)4441515-1 gnd Aluminiumoxide (DE-588)4001590-7 gnd Gate-Oxid (DE-588)4269383-4 gnd Dielektrische Schicht (DE-588)4194257-7 gnd |
| topic_facet | Praseodymoxide Molekularstrahlepitaxie Lanthanoxid Aluminiumoxide Gate-Oxid Dielektrische Schicht Hochschulschrift |
| work_keys_str_mv | AT capodiecivanessa molecularbeamdepositionmbdandcharacterisationofhighkmaterialasalternativegateoxidesformostechnology |