Capodieci, V. (2005). Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology. Mensch-&-Buch-Verl.
Chicago-Zitierstil (17. Ausg.)Capodieci, Vanessa. Molecular Beam Deposition (MBD) and Characterisation of High-k Material as Alternative Gate Oxides for MOS-technology. Berlin: Mensch-&-Buch-Verl, 2005.
MLA-Zitierstil (9. Ausg.)Capodieci, Vanessa. Molecular Beam Deposition (MBD) and Characterisation of High-k Material as Alternative Gate Oxides for MOS-technology. Mensch-&-Buch-Verl, 2005.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.