Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Abschlussarbeit Buch |
| Sprache: | German |
| Veröffentlicht: |
Aachen
Shaker
2002
|
| Schriftenreihe: | Berichte aus der Halbleitertechnik
|
| Schlagworte: | |
| Beschreibung: | III, 111 S. Ill., graph. Darst. |
| ISBN: | 3826597915 |
Internformat
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Datensatz im Suchindex
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| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| author | Graßl, Andreas |
| author_facet | Graßl, Andreas |
| author_role | aut |
| author_sort | Graßl, Andreas |
| author_variant | a g ag |
| building | Verbundindex |
| bvnumber | BV021964317 |
| ctrlnum | (OCoLC)76364736 (DE-599)BVBBV021964317 |
| format | Thesis Book |
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| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV021964317 |
| illustrated | Illustrated |
| index_date | 2024-07-02T16:08:45Z |
| indexdate | 2024-07-09T20:48:22Z |
| institution | BVB |
| isbn | 3826597915 |
| language | German |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015179467 |
| oclc_num | 76364736 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | III, 111 S. Ill., graph. Darst. |
| publishDate | 2002 |
| publishDateSearch | 2002 |
| publishDateSort | 2002 |
| publisher | Shaker |
| record_format | marc |
| series2 | Berichte aus der Halbleitertechnik |
| spelling | Graßl, Andreas Verfasser aut Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool Andreas Graßl Aachen Shaker 2002 III, 111 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Berichte aus der Halbleitertechnik Zugl.: Neubiberg, Univ. der Bundeswehr München, Diss., 2001 Silicium (DE-588)4077445-4 gnd rswk-swf Chip (DE-588)4197163-2 gnd rswk-swf Siliciumnitrid (DE-588)4127841-0 gnd rswk-swf Polykristall (DE-588)4188261-1 gnd rswk-swf MOS-FET (DE-588)4207266-9 gnd rswk-swf Gate Elektronik (DE-588)4269385-8 gnd rswk-swf Fertigung (DE-588)4016899-2 gnd rswk-swf Systemintegration (DE-588)4464875-3 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Gate Elektronik (DE-588)4269385-8 s DE-604 Systemintegration (DE-588)4464875-3 s MOS-FET (DE-588)4207266-9 s CVD-Verfahren (DE-588)4009846-1 s Dünne Schicht (DE-588)4136925-7 s Silicium (DE-588)4077445-4 s Polykristall (DE-588)4188261-1 s 1\p DE-604 Siliciumnitrid (DE-588)4127841-0 s 2\p DE-604 Chip (DE-588)4197163-2 s Fertigung (DE-588)4016899-2 s 3\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Graßl, Andreas Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool Silicium (DE-588)4077445-4 gnd Chip (DE-588)4197163-2 gnd Siliciumnitrid (DE-588)4127841-0 gnd Polykristall (DE-588)4188261-1 gnd MOS-FET (DE-588)4207266-9 gnd Gate Elektronik (DE-588)4269385-8 gnd Fertigung (DE-588)4016899-2 gnd Systemintegration (DE-588)4464875-3 gnd Dünne Schicht (DE-588)4136925-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4077445-4 (DE-588)4197163-2 (DE-588)4127841-0 (DE-588)4188261-1 (DE-588)4207266-9 (DE-588)4269385-8 (DE-588)4016899-2 (DE-588)4464875-3 (DE-588)4136925-7 (DE-588)4009846-1 (DE-588)4113937-9 |
| title | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool |
| title_auth | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool |
| title_exact_search | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool |
| title_exact_search_txtP | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool |
| title_full | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool Andreas Graßl |
| title_fullStr | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool Andreas Graßl |
| title_full_unstemmed | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool Andreas Graßl |
| title_short | Chemical Vapour Deposition ( CVD ) für zukünftige Technologien in einem Cluster-Tool |
| title_sort | chemical vapour deposition cvd fur zukunftige technologien in einem cluster tool |
| topic | Silicium (DE-588)4077445-4 gnd Chip (DE-588)4197163-2 gnd Siliciumnitrid (DE-588)4127841-0 gnd Polykristall (DE-588)4188261-1 gnd MOS-FET (DE-588)4207266-9 gnd Gate Elektronik (DE-588)4269385-8 gnd Fertigung (DE-588)4016899-2 gnd Systemintegration (DE-588)4464875-3 gnd Dünne Schicht (DE-588)4136925-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | Silicium Chip Siliciumnitrid Polykristall MOS-FET Gate Elektronik Fertigung Systemintegration Dünne Schicht CVD-Verfahren Hochschulschrift |
| work_keys_str_mv | AT graßlandreas chemicalvapourdepositioncvdfurzukunftigetechnologienineinemclustertool |