Photoresist: materials and processes
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
McGraw-Hill
1975
|
| Schlagworte: | |
| Beschreibung: | XI, 269 S. Ill. |
Internformat
MARC
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Datensatz im Suchindex
| _version_ | 1804135872712409088 |
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| adam_txt | |
| any_adam_object | |
| any_adam_object_boolean | |
| author | DeForest, William S. |
| author_facet | DeForest, William S. |
| author_role | aut |
| author_sort | DeForest, William S. |
| author_variant | w s d ws wsd |
| building | Verbundindex |
| bvnumber | BV021919914 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UP 5300 |
| ctrlnum | (OCoLC)1054407 (DE-599)BVBBV021919914 |
| dewey-full | 621.381/73 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/73 |
| dewey-search | 621.381/73 |
| dewey-sort | 3621.381 273 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| illustrated | Illustrated |
| index_date | 2024-07-02T16:05:41Z |
| indexdate | 2024-07-09T20:47:25Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015135076 |
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| physical | XI, 269 S. Ill. |
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| publishDate | 1975 |
| publishDateSearch | 1975 |
| publishDateSort | 1975 |
| publisher | McGraw-Hill |
| record_format | marc |
| spelling | DeForest, William S. Verfasser aut Photoresist materials and processes New York [u.a.] McGraw-Hill 1975 XI, 269 S. Ill. txt rdacontent n rdamedia nc rdacarrier Integrated circuits Photoresists Printed circuits Elektronik (DE-588)4014346-6 gnd rswk-swf Photoresist (DE-588)4174545-0 gnd rswk-swf Makromolekül (DE-588)4037172-4 gnd rswk-swf Polymere (DE-588)4046699-1 gnd rswk-swf Organische Verbindungen (DE-588)4043816-8 gnd rswk-swf Photowiderstand (DE-588)4136944-0 gnd rswk-swf Photoresist (DE-588)4174545-0 s DE-604 Elektronik (DE-588)4014346-6 s Organische Verbindungen (DE-588)4043816-8 s Makromolekül (DE-588)4037172-4 s Polymere (DE-588)4046699-1 s Photowiderstand (DE-588)4136944-0 s 1\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | DeForest, William S. Photoresist materials and processes Integrated circuits Photoresists Printed circuits Elektronik (DE-588)4014346-6 gnd Photoresist (DE-588)4174545-0 gnd Makromolekül (DE-588)4037172-4 gnd Polymere (DE-588)4046699-1 gnd Organische Verbindungen (DE-588)4043816-8 gnd Photowiderstand (DE-588)4136944-0 gnd |
| subject_GND | (DE-588)4014346-6 (DE-588)4174545-0 (DE-588)4037172-4 (DE-588)4046699-1 (DE-588)4043816-8 (DE-588)4136944-0 |
| title | Photoresist materials and processes |
| title_auth | Photoresist materials and processes |
| title_exact_search | Photoresist materials and processes |
| title_exact_search_txtP | Photoresist materials and processes |
| title_full | Photoresist materials and processes |
| title_fullStr | Photoresist materials and processes |
| title_full_unstemmed | Photoresist materials and processes |
| title_short | Photoresist |
| title_sort | photoresist materials and processes |
| title_sub | materials and processes |
| topic | Integrated circuits Photoresists Printed circuits Elektronik (DE-588)4014346-6 gnd Photoresist (DE-588)4174545-0 gnd Makromolekül (DE-588)4037172-4 gnd Polymere (DE-588)4046699-1 gnd Organische Verbindungen (DE-588)4043816-8 gnd Photowiderstand (DE-588)4136944-0 gnd |
| topic_facet | Integrated circuits Photoresists Printed circuits Elektronik Photoresist Makromolekül Polymere Organische Verbindungen Photowiderstand |
| work_keys_str_mv | AT deforestwilliams photoresistmaterialsandprocesses |