Thin film processes:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | Undetermined |
| Veröffentlicht: |
Orlando, Fla. [u.a.]
Acad.Pr.
1985
|
| Ausgabe: | 7.print. |
| Schlagworte: | |
| Beschreibung: | XI, 564 S. |
| ISBN: | 0127282505 |
Internformat
MARC
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| 245 | 1 | 0 | |a Thin film processes |c ed.by John L. Vossen... |
| 250 | |a 7.print. | ||
| 264 | 1 | |a Orlando, Fla. [u.a.] |b Acad.Pr. |c 1985 | |
| 300 | |a XI, 564 S. | ||
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| 337 | |b n |2 rdamedia | ||
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| 650 | 0 | 7 | |a Sputtern |0 (DE-588)4182614-0 |2 gnd |9 rswk-swf |
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| 689 | 3 | |8 3\p |5 DE-604 | |
| 700 | 1 | |a Vossen, John L. |e Sonstige |4 oth | |
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Datensatz im Suchindex
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|---|---|
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| building | Verbundindex |
| bvnumber | BV021869371 |
| classification_rvk | UP 7500 VE 7000 |
| ctrlnum | (OCoLC)633786087 (DE-599)BVBBV021869371 |
| discipline | Chemie / Pharmazie Physik |
| discipline_str_mv | Chemie / Pharmazie Physik |
| edition | 7.print. |
| format | Book |
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| id | DE-604.BV021869371 |
| illustrated | Not Illustrated |
| index_date | 2024-07-02T16:03:20Z |
| indexdate | 2024-07-09T20:46:22Z |
| institution | BVB |
| isbn | 0127282505 |
| language | Undetermined |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-015085423 |
| oclc_num | 633786087 |
| open_access_boolean | |
| owner | DE-706 |
| owner_facet | DE-706 |
| physical | XI, 564 S. |
| publishDate | 1985 |
| publishDateSearch | 1985 |
| publishDateSort | 1985 |
| publisher | Acad.Pr. |
| record_format | marc |
| spelling | Thin film processes ed.by John L. Vossen... 7.print. Orlando, Fla. [u.a.] Acad.Pr. 1985 XI, 564 S. txt rdacontent n rdamedia nc rdacarrier CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Ätzen (DE-588)4000648-7 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 s DE-604 Sputtern (DE-588)4182614-0 s 1\p DE-604 CVD-Verfahren (DE-588)4009846-1 s 2\p DE-604 Ätzen (DE-588)4000648-7 s 3\p DE-604 Vossen, John L. Sonstige oth 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Thin film processes CVD-Verfahren (DE-588)4009846-1 gnd Sputtern (DE-588)4182614-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Ätzen (DE-588)4000648-7 gnd |
| subject_GND | (DE-588)4009846-1 (DE-588)4182614-0 (DE-588)4136339-5 (DE-588)4000648-7 |
| title | Thin film processes |
| title_auth | Thin film processes |
| title_exact_search | Thin film processes |
| title_exact_search_txtP | Thin film processes |
| title_full | Thin film processes ed.by John L. Vossen... |
| title_fullStr | Thin film processes ed.by John L. Vossen... |
| title_full_unstemmed | Thin film processes ed.by John L. Vossen... |
| title_short | Thin film processes |
| title_sort | thin film processes |
| topic | CVD-Verfahren (DE-588)4009846-1 gnd Sputtern (DE-588)4182614-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd Ätzen (DE-588)4000648-7 gnd |
| topic_facet | CVD-Verfahren Sputtern Dünnschichttechnik Ätzen |
| work_keys_str_mv | AT vossenjohnl thinfilmprocesses |