Fundamentals of nanoscale film analysis:
Saved in:
| Main Authors: | , , |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
New York
Springer
2007
|
| Subjects: | |
| Online Access: | Inhaltstext Inhaltsverzeichnis |
| Item Description: | Angekündigt u.d.T.: Alford, Terry L.: Nanoscale thin film analysis |
| Physical Description: | XIV, 336 S. Ill., graph. Darst. |
| ISBN: | 0387292608 9780387292601 |
Staff View
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| adam_text | FUNDAMENTALS OF NANOSCALE FILM ANALYSIS TERRY L. ALFORD ARIZONA STATE
UNIVERSITY TEMPE, AZ, USA LEONARD C. FELDMAN VANDERBILT UNIVERSITY
NASHVILLE, TN, USA JAMES W. MAYER ARIZONA STATE UNIVERSITY TEMPE, AZ,
USA SPRINGER CONTENTS PREFACE XIII 1. ANOVERVIEW: CONCEPTS, UNITS, AND
THE BOHR ATOM 1 1.1 INTRODUCTION 1 1.2 NOMENCLATURE 2 1.3 ENERGIES,
UNITS, ANDPARTICLES 6 1.4 PARTICLE-WAVE DUALITY AND LATTICE SPACING 8
1.5 THE BOHR MODEL 9 PROBLEMS 10 2. ATOMIC COLLISIONS AND BACKSCATTERING
SPECTROMETRY 12 2.1 INTRODUCTION 12 2.2 KINEMATICS OF ELASTIC COLLISIONS
13 2.3 RUTHERFORD BACKSCATTERING SPECTROMETRY 16 2.4 SCATTERING CROSS
SECTION AND IMPACT PARAMETER 17 2.5 CENTRALFORCE SCATTERING 18 2.6
SCATTERING CROSS SECTION: TWO-BODY 21 2.7 DEVIATIONS FROM RUTHERFORD
SCATTERING AT LOW AND HIGH ENERGY 23 2.8 LOW-ENERGY ION SCATTERING 24
2.9 FORWARD RECOIL SPECTROMETRY 28 2.10 CENTER OF MASS TO LABORATORY
TRANSFORMATION 28 PROBLEMS 31 3. ENERGY LOSS OF LIGHT IONS AND
BACKSCATTERING DEPTH PROFILES 34 3.1 INTRODUCTION 34 3.2 GENERAL PICTURE
OF ENERGY LOSS AND UNITS OF ENERGY LOSS 34 3.3 ENERGY LOSS OF MEV LIGHT
IONS IN SOLIDS 35 3.4 ENERGY LOSS IN COMPOUNDS*BRAGG S RULE 40 3.5 THE
ENERGY WIDTH IN BACKSCATTERING 40 3.6 THE SHAPE OF THE BACKSCATTERING
SPECTRUM 43 3.7 DEPTH PROFILES WITH RUTHERFORD SCATTERING 45 3.8 DEPTH
RESOLUTION AND ENERGY-LOSS STRAGGLING 47 VIII CONTENTS 3.9 HYDROGEN AND
DEUTERIUM DEPTH PROFILES 50 3.10 RANGES OF HAND HE IONS 52 3.11
SPUTTERING AND LIMITS TO SENSITIVITY 54 3.12 SUMMARY OF SCATTERING
RELATIONS 55 PROBLEMS 55 4. SPUTTER DEPTH PROFILES AND SECONDARY ION
MASS SPECTROSCOPY 59 4.1 INTRODUCTION 59 4.2 SPUTTERING BY ION
BOMBARDMENT*GENERAL CONCEPTS 60 4.3 NUCLEAR ENERGY LOSS 63 4.4
SPUTTERING YIELD 67 4.5 SECONDARY ION MASS SPECTROSCOPY (SIMS) 69 4.6
SECONDARY NEUTRAL MASS SPECTROSCOPY (SNMS) 73 4.7 PREFERENTIAL
SPUTTERING AND DEPTH PROFILES 75 4.8 INTERFACE BROADENING AND ION MIXING
77 4.9 THOMAS-FERMI STATISTICAL MODEL OF THE ATOM 80 PROBLEMS 81 5. ION
CHANNELING 84 5.1 INTRODUCTION 84 5.2 CHANNELING IN SINGLE CRYSTALS 84
5.3 LATTICE LOCATION OF IMPURITIES IN CRY STALS 88 5.4 CHANNELING FLUX
DISTRIBUTIONS 89 5.5 SURFACE INTERACTION VIA A TWO-ATOM MODEL 92 5.6 THE
SURFACE PEAK 95 5.7 SUBSTRATE SHADOWING: EPITAXIAL AU ON AG( 111) 97 5.8
EPITAXIAL GROWTH 99 5.9 THIN FILM ANALYSIS 101 PROBLEMS 103 6.
ELECTRON-ELECTRON INTERACTIONS AND THE DEPTH SENSITIVITY OF ELECTRON
SPECTROSCOPIES 105 6.1 INTRODUCTION 105 6.2 ELECTRON SPECTROSCOPIES:
ENERGY ANALYSIS 105 6.3 ESCAPE DEPTH AND DETECTED VOLUME 106 6.4
INELASTIC ELECTRON-ELECTRON COLLISIONS 109 6.5 ELECTRON IMPACT
IONIZATION CROSS SECTION 110 6.6 PLASMONS 111 6.7 THE ELECTRON MEAN FREE
PATH 113 6.8 INFLUENCE OF THIN FILM MORPHOLOGY ON ELECTRON ATTENUATION
114 6.9 RANGE OF ELECTRONS IN SOLIDS 118 6.10 ELECTRON ENERGY LOSS
SPECTROSCOPY (EELS) 120 6.11 BREMSSTRAHLUNG 124 PROBLEMS 126 CONTENTS IX
7. X-RAY DIFFRACTION 129 7.1 INTRODUCTION 129 7.2 BRAGG S LAW IN REAL
SPACE 130 7.3 COEFFICIENT OF THERMAL EXPANSION MEASUREMENTS 133 7.4
TEXTURE MEASUREMENTS IN POLYCRYSTALLINE THIN FILMS 135 7.5 STRAIN
MEASUREMENTS IN EPITAXIAL LAYERS 137 7.6 CRYSTALLINE STRUCTURE 141 7.7
ALLOWED REFLECTIONS AND RELATIVE INTENSITIES 143 PROBLEMS 149 8.
ELECTRON DIFFRACTION 152 8.1 INTRODUCTION 152 8.2 RECIPROCAL SPACE 153
8.3 LAUE EQUATIONS 157 8.4 BRAGG S LAW 158 8.5 EWALD SPHERE SYNTHESIS
159 8.6 THE ELECTRON MICROSCOPE 160 8.7 INDEXING DIFFRACTION PATTERNS
166 PROBLEMS 172 9. PHOTON ABSORPTION IN SOLIDS AND EXAFS 174 9.1
INTRODUCTION 174 9.2 THE SCHROEDINGER EQUATION 174 9.3 WAVE FUNCTIONS 176
9.4 QUANTUM NUMBERS, ELECTRON CONFIGURATION, AND NOTATION 179 9.5
TRANSITION PROBABILITY 180 9.6 PHOTOELECTRIC EFFECT*SQUARE-WELL
APPROXIMATION 181 9.7 PHOTOELECTRIC TRANSITION PROBABILITY FOR A
HYDROGENIC ATOM 184 9.8 X-RAY ABSORPTION 185 9.9 EXTENDED X-RAY
ABSORPTION FINE STRUCTURE (EXAFS) 189 9.10 TIME-DEPENDENT PERTURBATION
THEORY 192 PROBLEMS 197 10. X-RAY PHOTOELECTRON SPECTROSCOPY 199 10.1
INTRODUCTION 199 10.2 EXPERIMENTAL CONSIDERATIONS 199 10.3 KINETIC
ENERGY OF PHOTOELECTRONS 203 10.4 PHOTOELECTRON ENERGY SPECTRUM 204 10.5
BINDING ENERGY AND FINAL-STATE EFFECTS 206 10.6 BINDING ENERGY
SHIFTS*CHEMICAL SHIFTS 208 10.7 QUANTITATIVE ANALYSIS 210 PROBLEMS 211 X
CONTENTS 11. RADIATIVE TRANSITIONS AND THE ELECTRON MICROPROBE 214 11.1
INTRODUCTION 214 11.2 NOMENCLATURE IN X-RAY SPECTROSCOPY 215 11.3 DIPOLE
SELECTION RULES 215 11.4 ELECTRON MICROPROBE 216 11.5 TRANSITION RATE
FOR SPONTANEOUS EMISSION 220 11.6 TRANSITION RATE FOR K A EMISSION IN NI
220 11.7 ELECTRON MICROPROBE: QUANTITATIVE ANALYSIS 222 11.8
PARTICLE-INDUCED X-RAY EMISSION (PIXE) 226 11.9 EVALUATION OF THE
TRANSITION PROBABILITY FOR RADIATIVE TRANSITIONS... 227 11.10
CALCULATION OF THE KSS/K A RATIO 230 PROBLEMS 231 12. NONRADIATIVE
TRANSITIONS AND AUGER ELECTRON SPECTROSCOPY 234 12.1 INTRODUCTION 234
12.2 AUGER TRANSITIONS 234 12.3 YIELD OF AUGER ELECTRONS AND
FLUORESCENCE YIELD 241 12.4 ATOMIC LEVEL WIDTH AND LIFETIMES 243 12.5
AUGER ELECTRON SPECTROSCOPY 244 12.6 QUANTITATIVE ANALYSIS 248 12.7
AUGER DEPTH PROFILES 249 PROBLEMS 252 13. NUCLEAR TECHNIQUES: ACTIVATION
ANALYSIS AND PROMPT RADIATION ANALYSIS.. 255 13.1 INTRODUCTION 255 13.2
Q VALUES AND KINETIC ENERGIES 259 13.3 RADIOACTIVE DECAY 262 13.4
RADIOACTIVE DECAY LAW 265 13.5 RADIONUCLIDE PRODUCTION 266 13.6
ACTIVATION ANALYSIS 266 13.7 PROMPT RADIATION ANALYSIS 267 PROBLEMS 274
14. SCANNING PROBE MICROSCOPY 277 14.1 INTRODUCTION 277 14.2 SCANNING
TUNNELING MICROSCOPY 279 14.3 ATOMIC FORCE MICROSCOPY 284 APPENDIX 1. KM
FOR 4 HE + AS PROJECTILE AND INTEGER TARGET MASS 291 APPENDIX 2.
RUTHERFORD SCATTERING CROSS SECTION OF THE ELEMENTS FORLMEV 4 HE+ 294
APPENDIX 3. 4 HE + STOPPING CROSS SECTIONS 296 APPENDIX 4. ELECTRON
CONFIGURATIONS AND IONIZATION POTENTIALS OF ATOMS 299 APPENDIX 5. ATOMIC
SCATTERING FACTORS 302 APPENDIX 6. ELECTRON BINDING ENERGIES 305
CONTENTS XI APPENDIX 7. X-RAY WAVELENGTHS (NM) 309 APPENDIX 8. MASS
ABSORPTION COEFFICIENT AND DENSITIES 312 APPENDIX 9. KLL AUGER ENERGIES
(EV) 316 APPENDIX 10. TABLE OF THE ELEMENTS 319 APPENDIX 11. TABLE OF
FLUORESENCE YIELDS FOR K, L, AND M SHELLS 325 APPENDIX 12. PHYSICAL
CONSTANTS, CONVERSIONS, AND USEFUL COMBINATIONS 327 APPENDIX 13.
ACRONYMS 328 INDEX 330 /
|
| adam_txt |
FUNDAMENTALS OF NANOSCALE FILM ANALYSIS TERRY L. ALFORD ARIZONA STATE
UNIVERSITY TEMPE, AZ, USA LEONARD C. FELDMAN VANDERBILT UNIVERSITY
NASHVILLE, TN, USA JAMES W. MAYER ARIZONA STATE UNIVERSITY TEMPE, AZ,
USA SPRINGER CONTENTS PREFACE XIII 1. ANOVERVIEW: CONCEPTS, UNITS, AND
THE BOHR ATOM 1 1.1 INTRODUCTION 1 1.2 NOMENCLATURE 2 1.3 ENERGIES,
UNITS, ANDPARTICLES 6 1.4 PARTICLE-WAVE DUALITY AND LATTICE SPACING 8
1.5 THE BOHR MODEL 9 PROBLEMS 10 2. ATOMIC COLLISIONS AND BACKSCATTERING
SPECTROMETRY 12 2.1 INTRODUCTION 12 2.2 KINEMATICS OF ELASTIC COLLISIONS
13 2.3 RUTHERFORD BACKSCATTERING SPECTROMETRY 16 2.4 SCATTERING CROSS
SECTION AND IMPACT PARAMETER 17 2.5 CENTRALFORCE SCATTERING 18 2.6
SCATTERING CROSS SECTION: TWO-BODY 21 2.7 DEVIATIONS FROM RUTHERFORD
SCATTERING AT LOW AND HIGH ENERGY 23 2.8 LOW-ENERGY ION SCATTERING 24
2.9 FORWARD RECOIL SPECTROMETRY 28 2.10 CENTER OF MASS TO LABORATORY
TRANSFORMATION 28 PROBLEMS 31 3. ENERGY LOSS OF LIGHT IONS AND
BACKSCATTERING DEPTH PROFILES 34 3.1 INTRODUCTION 34 3.2 GENERAL PICTURE
OF ENERGY LOSS AND UNITS OF ENERGY LOSS 34 3.3 ENERGY LOSS OF MEV LIGHT
IONS IN SOLIDS 35 3.4 ENERGY LOSS IN COMPOUNDS*BRAGG'S RULE 40 3.5 THE
ENERGY WIDTH IN BACKSCATTERING 40 3.6 THE SHAPE OF THE BACKSCATTERING
SPECTRUM 43 3.7 DEPTH PROFILES WITH RUTHERFORD SCATTERING 45 3.8 DEPTH
RESOLUTION AND ENERGY-LOSS STRAGGLING 47 VIII CONTENTS 3.9 HYDROGEN AND
DEUTERIUM DEPTH PROFILES 50 3.10 RANGES OF HAND HE IONS 52 3.11
SPUTTERING AND LIMITS TO SENSITIVITY 54 3.12 SUMMARY OF SCATTERING
RELATIONS 55 PROBLEMS 55 4. SPUTTER DEPTH PROFILES AND SECONDARY ION
MASS SPECTROSCOPY 59 4.1 INTRODUCTION 59 4.2 SPUTTERING BY ION
BOMBARDMENT*GENERAL CONCEPTS 60 4.3 NUCLEAR ENERGY LOSS 63 4.4
SPUTTERING YIELD 67 4.5 SECONDARY ION MASS SPECTROSCOPY (SIMS) 69 4.6
SECONDARY NEUTRAL MASS SPECTROSCOPY (SNMS) 73 4.7 PREFERENTIAL
SPUTTERING AND DEPTH PROFILES 75 4.8 INTERFACE BROADENING AND ION MIXING
77 4.9 THOMAS-FERMI STATISTICAL MODEL OF THE ATOM 80 PROBLEMS 81 5. ION
CHANNELING 84 5.1 INTRODUCTION 84 5.2 CHANNELING IN SINGLE CRYSTALS 84
5.3 LATTICE LOCATION OF IMPURITIES IN CRY STALS 88 5.4 CHANNELING FLUX
DISTRIBUTIONS 89 5.5 SURFACE INTERACTION VIA A TWO-ATOM MODEL 92 5.6 THE
SURFACE PEAK 95 5.7 SUBSTRATE SHADOWING: EPITAXIAL AU ON AG( 111) 97 5.8
EPITAXIAL GROWTH 99 5.9 THIN FILM ANALYSIS 101 PROBLEMS 103 6.
ELECTRON-ELECTRON INTERACTIONS AND THE DEPTH SENSITIVITY OF ELECTRON
SPECTROSCOPIES 105 6.1 INTRODUCTION 105 6.2 ELECTRON SPECTROSCOPIES:
ENERGY ANALYSIS 105 6.3 ESCAPE DEPTH AND DETECTED VOLUME 106 6.4
INELASTIC ELECTRON-ELECTRON COLLISIONS 109 6.5 ELECTRON IMPACT
IONIZATION CROSS SECTION 110 6.6 PLASMONS 111 6.7 THE ELECTRON MEAN FREE
PATH 113 6.8 INFLUENCE OF THIN FILM MORPHOLOGY ON ELECTRON ATTENUATION
114 6.9 RANGE OF ELECTRONS IN SOLIDS 118 6.10 ELECTRON ENERGY LOSS
SPECTROSCOPY (EELS) 120 6.11 BREMSSTRAHLUNG 124 PROBLEMS 126 CONTENTS IX
7. X-RAY DIFFRACTION 129 7.1 INTRODUCTION 129 7.2 BRAGG'S LAW IN REAL
SPACE 130 7.3 COEFFICIENT OF THERMAL EXPANSION MEASUREMENTS 133 7.4
TEXTURE MEASUREMENTS IN POLYCRYSTALLINE THIN FILMS 135 7.5 STRAIN
MEASUREMENTS IN EPITAXIAL LAYERS 137 7.6 CRYSTALLINE STRUCTURE 141 7.7
ALLOWED REFLECTIONS AND RELATIVE INTENSITIES 143 PROBLEMS 149 8.
ELECTRON DIFFRACTION 152 8.1 INTRODUCTION 152 8.2 RECIPROCAL SPACE 153
8.3 LAUE EQUATIONS 157 8.4 BRAGG'S LAW 158 8.5 EWALD SPHERE SYNTHESIS
159 8.6 THE ELECTRON MICROSCOPE 160 8.7 INDEXING DIFFRACTION PATTERNS
166 PROBLEMS 172 9. PHOTON ABSORPTION IN SOLIDS AND EXAFS 174 9.1
INTRODUCTION 174 9.2 THE SCHROEDINGER EQUATION 174 9.3 WAVE FUNCTIONS 176
9.4 QUANTUM NUMBERS, ELECTRON CONFIGURATION, AND NOTATION 179 9.5
TRANSITION PROBABILITY 180 9.6 PHOTOELECTRIC EFFECT*SQUARE-WELL
APPROXIMATION 181 9.7 PHOTOELECTRIC TRANSITION PROBABILITY FOR A
HYDROGENIC ATOM 184 9.8 X-RAY ABSORPTION 185 9.9 EXTENDED X-RAY
ABSORPTION FINE STRUCTURE (EXAFS) 189 9.10 TIME-DEPENDENT PERTURBATION
THEORY 192 PROBLEMS 197 10. X-RAY PHOTOELECTRON SPECTROSCOPY 199 10.1
INTRODUCTION 199 10.2 EXPERIMENTAL CONSIDERATIONS 199 10.3 KINETIC
ENERGY OF PHOTOELECTRONS 203 10.4 PHOTOELECTRON ENERGY SPECTRUM 204 10.5
BINDING ENERGY AND FINAL-STATE EFFECTS 206 10.6 BINDING ENERGY
SHIFTS*CHEMICAL SHIFTS 208 10.7 QUANTITATIVE ANALYSIS 210 PROBLEMS 211 X
CONTENTS 11. RADIATIVE TRANSITIONS AND THE ELECTRON MICROPROBE 214 11.1
INTRODUCTION 214 11.2 NOMENCLATURE IN X-RAY SPECTROSCOPY 215 11.3 DIPOLE
SELECTION RULES 215 11.4 ELECTRON MICROPROBE 216 11.5 TRANSITION RATE
FOR SPONTANEOUS EMISSION 220 11.6 TRANSITION RATE FOR K A EMISSION IN NI
220 11.7 ELECTRON MICROPROBE: QUANTITATIVE ANALYSIS 222 11.8
PARTICLE-INDUCED X-RAY EMISSION (PIXE) 226 11.9 EVALUATION OF THE
TRANSITION PROBABILITY FOR RADIATIVE TRANSITIONS. 227 11.10
CALCULATION OF THE KSS/K A RATIO 230 PROBLEMS 231 12. NONRADIATIVE
TRANSITIONS AND AUGER ELECTRON SPECTROSCOPY 234 12.1 INTRODUCTION 234
12.2 AUGER TRANSITIONS 234 12.3 YIELD OF AUGER ELECTRONS AND
FLUORESCENCE YIELD 241 12.4 ATOMIC LEVEL WIDTH AND LIFETIMES 243 12.5
AUGER ELECTRON SPECTROSCOPY 244 12.6 QUANTITATIVE ANALYSIS 248 12.7
AUGER DEPTH PROFILES 249 PROBLEMS 252 13. NUCLEAR TECHNIQUES: ACTIVATION
ANALYSIS AND PROMPT RADIATION ANALYSIS. 255 13.1 INTRODUCTION 255 13.2
Q VALUES AND KINETIC ENERGIES 259 13.3 RADIOACTIVE DECAY 262 13.4
RADIOACTIVE DECAY LAW 265 13.5 RADIONUCLIDE PRODUCTION 266 13.6
ACTIVATION ANALYSIS 266 13.7 PROMPT RADIATION ANALYSIS 267 PROBLEMS 274
14. SCANNING PROBE MICROSCOPY 277 14.1 INTRODUCTION 277 14.2 SCANNING
TUNNELING MICROSCOPY 279 14.3 ATOMIC FORCE MICROSCOPY 284 APPENDIX 1. KM
FOR 4 HE + AS PROJECTILE AND INTEGER TARGET MASS 291 APPENDIX 2.
RUTHERFORD SCATTERING CROSS SECTION OF THE ELEMENTS FORLMEV 4 HE+ 294
APPENDIX 3. 4 HE + STOPPING CROSS SECTIONS 296 APPENDIX 4. ELECTRON
CONFIGURATIONS AND IONIZATION POTENTIALS OF ATOMS 299 APPENDIX 5. ATOMIC
SCATTERING FACTORS 302 APPENDIX 6. ELECTRON BINDING ENERGIES 305
CONTENTS XI APPENDIX 7. X-RAY WAVELENGTHS (NM) 309 APPENDIX 8. MASS
ABSORPTION COEFFICIENT AND DENSITIES 312 APPENDIX 9. KLL AUGER ENERGIES
(EV) 316 APPENDIX 10. TABLE OF THE ELEMENTS 319 APPENDIX 11. TABLE OF
FLUORESENCE YIELDS FOR K, L, AND M SHELLS 325 APPENDIX 12. PHYSICAL
CONSTANTS, CONVERSIONS, AND USEFUL COMBINATIONS 327 APPENDIX 13.
ACRONYMS 328 INDEX 330 / |
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| author | Alford, Terry L. Feldman, Leonard C. Mayer, James W. 1930-2013 |
| author_GND | (DE-588)121494349 |
| author_facet | Alford, Terry L. Feldman, Leonard C. Mayer, James W. 1930-2013 |
| author_role | aut aut aut |
| author_sort | Alford, Terry L. |
| author_variant | t l a tl tla l c f lc lcf j w m jw jwm |
| building | Verbundindex |
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| callnumber-search | QC176.83 |
| callnumber-sort | QC 3176.83 |
| callnumber-subject | QC - Physics |
| classification_rvk | UP 7500 |
| ctrlnum | (OCoLC)124465046 (DE-599)BVBBV021618625 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Mathematik Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Physik Mathematik Elektrotechnik / Elektronik / Nachrichtentechnik |
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| id | DE-604.BV021618625 |
| illustrated | Illustrated |
| index_date | 2024-07-02T14:52:55Z |
| indexdate | 2024-07-09T20:40:02Z |
| institution | BVB |
| isbn | 0387292608 9780387292601 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-014833722 |
| oclc_num | 124465046 |
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| owner | DE-20 DE-703 DE-384 |
| owner_facet | DE-20 DE-703 DE-384 |
| physical | XIV, 336 S. Ill., graph. Darst. |
| publishDate | 2007 |
| publishDateSearch | 2007 |
| publishDateSort | 2007 |
| publisher | Springer |
| record_format | marc |
| spelling | Alford, Terry L. Verfasser aut Fundamentals of nanoscale film analysis Terry L. Alford ; Leonard C. Feldman ; James W. Mayer Nanoscale thin film analysis New York Springer 2007 XIV, 336 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Angekündigt u.d.T.: Alford, Terry L.: Nanoscale thin film analysis Couches minces Materiales nanoestructurados Nanomatériaux Películas delgadas Nanostructured materials Thin films Photonenstrahlung (DE-588)4126328-5 gnd rswk-swf Teilchenstrahlung (DE-588)4680408-0 gnd rswk-swf Materialcharakterisierung (DE-588)4720368-7 gnd rswk-swf Nanometerbereich (DE-588)4327473-0 gnd rswk-swf Festkörperoberfläche (DE-588)4127823-9 gnd rswk-swf Festkörperoberfläche (DE-588)4127823-9 s Materialcharakterisierung (DE-588)4720368-7 s Photonenstrahlung (DE-588)4126328-5 s Teilchenstrahlung (DE-588)4680408-0 s Nanometerbereich (DE-588)4327473-0 s DE-604 Feldman, Leonard C. Verfasser aut Mayer, James W. 1930-2013 Verfasser (DE-588)121494349 aut text/html http://deposit.dnb.de/cgi-bin/dokserv?id=2739587&prov=M&dok_var=1&dok_ext=htm Inhaltstext GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014833722&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Alford, Terry L. Feldman, Leonard C. Mayer, James W. 1930-2013 Fundamentals of nanoscale film analysis Couches minces Materiales nanoestructurados Nanomatériaux Películas delgadas Nanostructured materials Thin films Photonenstrahlung (DE-588)4126328-5 gnd Teilchenstrahlung (DE-588)4680408-0 gnd Materialcharakterisierung (DE-588)4720368-7 gnd Nanometerbereich (DE-588)4327473-0 gnd Festkörperoberfläche (DE-588)4127823-9 gnd |
| subject_GND | (DE-588)4126328-5 (DE-588)4680408-0 (DE-588)4720368-7 (DE-588)4327473-0 (DE-588)4127823-9 |
| title | Fundamentals of nanoscale film analysis |
| title_alt | Nanoscale thin film analysis |
| title_auth | Fundamentals of nanoscale film analysis |
| title_exact_search | Fundamentals of nanoscale film analysis |
| title_exact_search_txtP | Fundamentals of nanoscale film analysis |
| title_full | Fundamentals of nanoscale film analysis Terry L. Alford ; Leonard C. Feldman ; James W. Mayer |
| title_fullStr | Fundamentals of nanoscale film analysis Terry L. Alford ; Leonard C. Feldman ; James W. Mayer |
| title_full_unstemmed | Fundamentals of nanoscale film analysis Terry L. Alford ; Leonard C. Feldman ; James W. Mayer |
| title_short | Fundamentals of nanoscale film analysis |
| title_sort | fundamentals of nanoscale film analysis |
| topic | Couches minces Materiales nanoestructurados Nanomatériaux Películas delgadas Nanostructured materials Thin films Photonenstrahlung (DE-588)4126328-5 gnd Teilchenstrahlung (DE-588)4680408-0 gnd Materialcharakterisierung (DE-588)4720368-7 gnd Nanometerbereich (DE-588)4327473-0 gnd Festkörperoberfläche (DE-588)4127823-9 gnd |
| topic_facet | Couches minces Materiales nanoestructurados Nanomatériaux Películas delgadas Nanostructured materials Thin films Photonenstrahlung Teilchenstrahlung Materialcharakterisierung Nanometerbereich Festkörperoberfläche |
| url | http://deposit.dnb.de/cgi-bin/dokserv?id=2739587&prov=M&dok_var=1&dok_ext=htm http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014833722&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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