Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
[Norderstedt]
Books on Demand
2001
|
| Schlagworte: | |
| Beschreibung: | Zugl.: Albany, Univ., Diss. |
| Beschreibung: | XII, 199 S. Ill., graph. Darst. |
| ISBN: | 3831142742 |
Internformat
MARC
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| 245 | 1 | 0 | |a Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study |c by Rolf U. Claessen |
| 246 | 1 | 0 | |a non-halogenated |
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Datensatz im Suchindex
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| author | Claessen, Rolf U. |
| author_facet | Claessen, Rolf U. |
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| bvnumber | BV014743179 |
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| ctrlnum | (OCoLC)76476241 (DE-599)BVBBV014743179 |
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| illustrated | Illustrated |
| indexdate | 2024-07-09T19:05:40Z |
| institution | BVB |
| isbn | 3831142742 |
| language | English |
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| physical | XII, 199 S. Ill., graph. Darst. |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | Books on Demand |
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| spelling | Claessen, Rolf U. Verfasser aut Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study by Rolf U. Claessen non-halogenated [Norderstedt] Books on Demand 2001 XII, 199 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Zugl.: Albany, Univ., Diss. CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Kupfer (DE-588)4033734-0 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content CVD-Verfahren (DE-588)4009846-1 s Kupfer (DE-588)4033734-0 s DE-604 |
| spellingShingle | Claessen, Rolf U. Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study CVD-Verfahren (DE-588)4009846-1 gnd Kupfer (DE-588)4033734-0 gnd |
| subject_GND | (DE-588)4009846-1 (DE-588)4033734-0 (DE-588)4113937-9 |
| title | Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study |
| title_alt | non-halogenated |
| title_auth | Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study |
| title_exact_search | Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study |
| title_full | Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study by Rolf U. Claessen |
| title_fullStr | Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study by Rolf U. Claessen |
| title_full_unstemmed | Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study by Rolf U. Claessen |
| title_short | Design of volatile non halogenated precursors for the chemical vapor deposition (CVD) of copper: understanding key molecular properties in a CVD process feasibility study |
| title_sort | design of volatile non halogenated precursors for the chemical vapor deposition cvd of copper understanding key molecular properties in a cvd process feasibility study |
| topic | CVD-Verfahren (DE-588)4009846-1 gnd Kupfer (DE-588)4033734-0 gnd |
| topic_facet | CVD-Verfahren Kupfer Hochschulschrift |
| work_keys_str_mv | AT claessenrolfu designofvolatilenonhalogenatedprecursorsforthechemicalvapordepositioncvdofcopperunderstandingkeymolecularpropertiesinacvdprocessfeasibilitystudy AT claessenrolfu nonhalogenated |