(2000). Microlithographic techniques in integrated circuit fabrication II: 28 - 30 November 2000, Singapore. SPIE.
Chicago Style (17th ed.) CitationMicrolithographic Techniques in Integrated Circuit Fabrication II: 28 - 30 November 2000, Singapore. Bellingham, Wash., USA: SPIE, 2000.
MLA (9th ed.) CitationMicrolithographic Techniques in Integrated Circuit Fabrication II: 28 - 30 November 2000, Singapore. SPIE, 2000.
Warning: These citations may not always be 100% accurate.