Resolution enhancement techniques in optical lithography:
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...
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| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash.
SPIE Press
2001
|
| Series: | Tutorial texts in optical engineering
47 |
| Subjects: | |
| Summary: | Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers. |
| Physical Description: | XVII, 214 S. Ill., graph. Darst. |
| ISBN: | 0819439959 |
Staff View
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| illustrated | Illustrated |
| indexdate | 2024-09-06T00:13:26Z |
| institution | BVB |
| isbn | 0819439959 |
| language | English |
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| physical | XVII, 214 S. Ill., graph. Darst. |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | SPIE Press |
| record_format | marc |
| series | Tutorial texts in optical engineering |
| series2 | Tutorial texts in optical engineering |
| spelling | Wong, Alfred Kwok-Kit Verfasser aut Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong Bellingham, Wash. SPIE Press 2001 XVII, 214 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Tutorial texts in optical engineering 47 Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers. Circuits imprimés - Conception et construction ram Microlithographie ram Integrated circuits Design and construction Microlithography Integrierte Schaltung (DE-588)4027242-4 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Integrierte Schaltung (DE-588)4027242-4 s DE-604 Tutorial texts in optical engineering 47 (DE-604)BV005345161 47 |
| spellingShingle | Wong, Alfred Kwok-Kit Resolution enhancement techniques in optical lithography Tutorial texts in optical engineering Circuits imprimés - Conception et construction ram Microlithographie ram Integrated circuits Design and construction Microlithography Integrierte Schaltung (DE-588)4027242-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4027242-4 (DE-588)4191584-7 |
| title | Resolution enhancement techniques in optical lithography |
| title_auth | Resolution enhancement techniques in optical lithography |
| title_exact_search | Resolution enhancement techniques in optical lithography |
| title_full | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_fullStr | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_full_unstemmed | Resolution enhancement techniques in optical lithography Alfred Kwok-Kit Wong |
| title_short | Resolution enhancement techniques in optical lithography |
| title_sort | resolution enhancement techniques in optical lithography |
| topic | Circuits imprimés - Conception et construction ram Microlithographie ram Integrated circuits Design and construction Microlithography Integrierte Schaltung (DE-588)4027242-4 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Circuits imprimés - Conception et construction Microlithographie Integrated circuits Design and construction Microlithography Integrierte Schaltung Lithografie Halbleitertechnologie |
| volume_link | (DE-604)BV005345161 |
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