Materials, technology and reliability for advanced interconnects and low-k dielectrics: symposium held April 23 - 27, 2000, San Francisco, California, U.S.A.
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Warrendale, Pa.
Materials Research Soc.
2001
|
| Schriftenreihe: | Materials Research Society symposia proceedings
612 |
| Schlagworte: | |
| Beschreibung: | Getr. Zählung Ill., graph. Darst. |
| ISBN: | 155899520X |
Internformat
MARC
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| 245 | 1 | 0 | |a Materials, technology and reliability for advanced interconnects and low-k dielectrics |b symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. |c ed. G. S. Oehrlein ... |
| 264 | 1 | |a Warrendale, Pa. |b Materials Research Soc. |c 2001 | |
| 300 | |a Getr. Zählung |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 490 | 1 | |a Materials Research Society symposia proceedings |v 612 | |
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| 650 | 4 | |a Integrated circuits |x Reliability |v Congresses | |
| 650 | 4 | |a Semiconductors |x Junctions |v Congresses | |
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| 650 | 0 | 7 | |a Halbleitergrenzfläche |0 (DE-588)4158802-2 |2 gnd |9 rswk-swf |
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Datensatz im Suchindex
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| genre_facet | Konferenzschrift 2000 San Francisco Calif. |
| id | DE-604.BV013828643 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:52:45Z |
| institution | BVB |
| isbn | 155899520X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009457506 |
| oclc_num | 45707698 |
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| physical | Getr. Zählung Ill., graph. Darst. |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | Materials Research Soc. |
| record_format | marc |
| series | Materials Research Society symposia proceedings |
| series2 | Materials Research Society symposia proceedings |
| spelling | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ... Warrendale, Pa. Materials Research Soc. 2001 Getr. Zählung Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials Research Society symposia proceedings 612 Dielectric films Congresses Integrated circuits Materials Congresses Integrated circuits Reliability Congresses Semiconductors Junctions Congresses Semiconductors Materials Congresses Halbleitergrenzfläche (DE-588)4158802-2 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 2000 San Francisco Calif. gnd-content Halbleitergrenzfläche (DE-588)4158802-2 s DE-604 Oehrlein, G. S. Sonstige oth Materials Research Society symposia proceedings 612 (DE-604)BV001899105 612 |
| spellingShingle | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. Materials Research Society symposia proceedings Dielectric films Congresses Integrated circuits Materials Congresses Integrated circuits Reliability Congresses Semiconductors Junctions Congresses Semiconductors Materials Congresses Halbleitergrenzfläche (DE-588)4158802-2 gnd |
| subject_GND | (DE-588)4158802-2 (DE-588)1071861417 |
| title | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. |
| title_auth | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. |
| title_exact_search | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. |
| title_full | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ... |
| title_fullStr | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ... |
| title_full_unstemmed | Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ... |
| title_short | Materials, technology and reliability for advanced interconnects and low-k dielectrics |
| title_sort | materials technology and reliability for advanced interconnects and low k dielectrics symposium held april 23 27 2000 san francisco california u s a |
| title_sub | symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. |
| topic | Dielectric films Congresses Integrated circuits Materials Congresses Integrated circuits Reliability Congresses Semiconductors Junctions Congresses Semiconductors Materials Congresses Halbleitergrenzfläche (DE-588)4158802-2 gnd |
| topic_facet | Dielectric films Congresses Integrated circuits Materials Congresses Integrated circuits Reliability Congresses Semiconductors Junctions Congresses Semiconductors Materials Congresses Halbleitergrenzfläche Konferenzschrift 2000 San Francisco Calif. |
| volume_link | (DE-604)BV001899105 |
| work_keys_str_mv | AT oehrleings materialstechnologyandreliabilityforadvancedinterconnectsandlowkdielectricssymposiumheldapril23272000sanfranciscocaliforniausa |