Reliability, yield, and stress burn-in: a unified approach for microelectronics systems manufacturing & software development
Saved in:
Bibliographic Details
Main Authors: Kuo, Way (Author), Chien, Wei-Ting Kary (Author), Kim, Taeho (Author)
Format: Book
Language:English
Published: Boston [u.a.] Kluwer 1998
Subjects:
Physical Description:XXVI, 394 S. graph. Darst.
ISBN:0792381076

There is no print copy available.

Interlibrary loan Place Request Caution: Not in THWS collection!