Dusty plasmas: physics, chemistry and technological impacts in plasma processing
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Chichester [u.a.]
Wiley
1999
|
| Schlagworte: | |
| Beschreibung: | VIII, 408 S. Ill. |
| ISBN: | 0471973866 |
Internformat
MARC
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| 245 | 1 | 0 | |a Dusty plasmas |b physics, chemistry and technological impacts in plasma processing |c ed. by André Bouchoule |
| 264 | 1 | |a Chichester [u.a.] |b Wiley |c 1999 | |
| 300 | |a VIII, 408 S. |b Ill. | ||
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| 650 | 4 | |a Dusty plasmas | |
| 650 | 4 | |a Plasma (Ionized gases) |x Industrial applications | |
| 650 | 4 | |a Plasma chemistry | |
| 650 | 4 | |a Plasma engineering | |
| 650 | 4 | |a Plasma-enhanced chemical vapor deposition | |
| 650 | 0 | 7 | |a Plasmatechnik |0 (DE-588)4140353-8 |2 gnd |9 rswk-swf |
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Datensatz im Suchindex
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| id | DE-604.BV012719598 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:32:29Z |
| institution | BVB |
| isbn | 0471973866 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008647013 |
| oclc_num | 40339717 |
| open_access_boolean | |
| owner | DE-703 DE-11 |
| owner_facet | DE-703 DE-11 |
| physical | VIII, 408 S. Ill. |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | Wiley |
| record_format | marc |
| spelling | Dusty plasmas physics, chemistry and technological impacts in plasma processing ed. by André Bouchoule Chichester [u.a.] Wiley 1999 VIII, 408 S. Ill. txt rdacontent n rdamedia nc rdacarrier Dusty plasmas Plasma (Ionized gases) Industrial applications Plasma chemistry Plasma engineering Plasma-enhanced chemical vapor deposition Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Plasmaphysik (DE-588)4046259-6 gnd rswk-swf Plasmaphysik (DE-588)4046259-6 s DE-604 Plasmatechnik (DE-588)4140353-8 s Bouchoule, André Sonstige oth |
| spellingShingle | Dusty plasmas physics, chemistry and technological impacts in plasma processing Dusty plasmas Plasma (Ionized gases) Industrial applications Plasma chemistry Plasma engineering Plasma-enhanced chemical vapor deposition Plasmatechnik (DE-588)4140353-8 gnd Plasmaphysik (DE-588)4046259-6 gnd |
| subject_GND | (DE-588)4140353-8 (DE-588)4046259-6 |
| title | Dusty plasmas physics, chemistry and technological impacts in plasma processing |
| title_auth | Dusty plasmas physics, chemistry and technological impacts in plasma processing |
| title_exact_search | Dusty plasmas physics, chemistry and technological impacts in plasma processing |
| title_full | Dusty plasmas physics, chemistry and technological impacts in plasma processing ed. by André Bouchoule |
| title_fullStr | Dusty plasmas physics, chemistry and technological impacts in plasma processing ed. by André Bouchoule |
| title_full_unstemmed | Dusty plasmas physics, chemistry and technological impacts in plasma processing ed. by André Bouchoule |
| title_short | Dusty plasmas |
| title_sort | dusty plasmas physics chemistry and technological impacts in plasma processing |
| title_sub | physics, chemistry and technological impacts in plasma processing |
| topic | Dusty plasmas Plasma (Ionized gases) Industrial applications Plasma chemistry Plasma engineering Plasma-enhanced chemical vapor deposition Plasmatechnik (DE-588)4140353-8 gnd Plasmaphysik (DE-588)4046259-6 gnd |
| topic_facet | Dusty plasmas Plasma (Ionized gases) Industrial applications Plasma chemistry Plasma engineering Plasma-enhanced chemical vapor deposition Plasmatechnik Plasmaphysik |
| work_keys_str_mv | AT bouchouleandre dustyplasmasphysicschemistryandtechnologicalimpactsinplasmaprocessing |