PVD for microelectronics: sputter deposition applied to semiconductor manufacturing
Saved in:
| Main Authors: | , |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
San Diego [u.a.]
Acad. Press
1999
|
| Series: | Thin films
26 |
| Subjects: | |
| Physical Description: | XIII, 419 S. zahlr. Ill. und graph. Darst. |
| ISBN: | 012533026X |
Staff View
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV012682386 | ||
| 003 | DE-604 | ||
| 005 | 20000209 | ||
| 007 | t | ||
| 008 | 990727s1999 ad|| |||| 00||| eng d | ||
| 020 | |a 012533026X |9 0-12-533026-X | ||
| 035 | |a (OCoLC)39275876 | ||
| 035 | |a (DE-599)BVBBV012682386 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-703 |a DE-19 |a DE-83 |a DE-11 | ||
| 050 | 0 | |a QC176.A1 | |
| 050 | 0 | |a TK7872.T55 | |
| 082 | 0 | |a 621.3815/2 |2 21 | |
| 084 | |a UP 7550 |0 (DE-625)146434: |2 rvk | ||
| 084 | |a ZM 7680 |0 (DE-625)160562: |2 rvk | ||
| 100 | 1 | |a Powell, Ronald A. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a PVD for microelectronics |b sputter deposition applied to semiconductor manufacturing |c Ronald A. Powell ; Stephen M. Rossnagel |
| 264 | 1 | |a San Diego [u.a.] |b Acad. Press |c 1999 | |
| 300 | |a XIII, 419 S. |b zahlr. Ill. und graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Thin films |v 26 | |
| 650 | 7 | |a Couches minces - Surfaces |2 ram | |
| 650 | 7 | |a Física geral |2 larpcal | |
| 650 | 7 | |a Microélectronique |2 ram | |
| 650 | 7 | |a Pulvérisation (Physique) |2 ram | |
| 650 | 4 | |a Thin film devices |x Design and construction | |
| 650 | 4 | |a Thin films | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 0 | 7 | |a PVD-Verfahren |0 (DE-588)4115673-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a PVD-Verfahren |0 (DE-588)4115673-0 |D s |
| 689 | 0 | 1 | |a Mikroelektronik |0 (DE-588)4039207-7 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Rossnagel, Stephen M. |e Verfasser |4 aut | |
| 830 | 0 | |a Thin films |v 26 |w (DE-604)BV010579552 |9 26 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-008619641 | ||
Record in the Search Index
| _version_ | 1804127343988441088 |
|---|---|
| any_adam_object | |
| author | Powell, Ronald A. Rossnagel, Stephen M. |
| author_facet | Powell, Ronald A. Rossnagel, Stephen M. |
| author_role | aut aut |
| author_sort | Powell, Ronald A. |
| author_variant | r a p ra rap s m r sm smr |
| building | Verbundindex |
| bvnumber | BV012682386 |
| callnumber-first | Q - Science |
| callnumber-label | QC176 |
| callnumber-raw | QC176.A1 TK7872.T55 |
| callnumber-search | QC176.A1 TK7872.T55 |
| callnumber-sort | QC 3176 A1 |
| callnumber-subject | QC - Physics |
| classification_rvk | UP 7550 ZM 7680 |
| ctrlnum | (OCoLC)39275876 (DE-599)BVBBV012682386 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01689nam a2200493 cb4500</leader><controlfield tag="001">BV012682386</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20000209 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">990727s1999 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">012533026X</subfield><subfield code="9">0-12-533026-X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)39275876</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV012682386</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-19</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">QC176.A1</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7872.T55</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">21</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7550</subfield><subfield code="0">(DE-625)146434:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZM 7680</subfield><subfield code="0">(DE-625)160562:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Powell, Ronald A.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">PVD for microelectronics</subfield><subfield code="b">sputter deposition applied to semiconductor manufacturing</subfield><subfield code="c">Ronald A. Powell ; Stephen M. Rossnagel</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">San Diego [u.a.]</subfield><subfield code="b">Acad. Press</subfield><subfield code="c">1999</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIII, 419 S.</subfield><subfield code="b">zahlr. Ill. und graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Thin films</subfield><subfield code="v">26</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Couches minces - Surfaces</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Física geral</subfield><subfield code="2">larpcal</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Microélectronique</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Pulvérisation (Physique)</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin film devices</subfield><subfield code="x">Design and construction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vapor-plating</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">PVD-Verfahren</subfield><subfield code="0">(DE-588)4115673-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Mikroelektronik</subfield><subfield code="0">(DE-588)4039207-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Rossnagel, Stephen M.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Thin films</subfield><subfield code="v">26</subfield><subfield code="w">(DE-604)BV010579552</subfield><subfield code="9">26</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-008619641</subfield></datafield></record></collection> |
| id | DE-604.BV012682386 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:31:51Z |
| institution | BVB |
| isbn | 012533026X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008619641 |
| oclc_num | 39275876 |
| open_access_boolean | |
| owner | DE-703 DE-19 DE-BY-UBM DE-83 DE-11 |
| owner_facet | DE-703 DE-19 DE-BY-UBM DE-83 DE-11 |
| physical | XIII, 419 S. zahlr. Ill. und graph. Darst. |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | Acad. Press |
| record_format | marc |
| series | Thin films |
| series2 | Thin films |
| spelling | Powell, Ronald A. Verfasser aut PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell ; Stephen M. Rossnagel San Diego [u.a.] Acad. Press 1999 XIII, 419 S. zahlr. Ill. und graph. Darst. txt rdacontent n rdamedia nc rdacarrier Thin films 26 Couches minces - Surfaces ram Física geral larpcal Microélectronique ram Pulvérisation (Physique) ram Thin film devices Design and construction Thin films Vapor-plating PVD-Verfahren (DE-588)4115673-0 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf PVD-Verfahren (DE-588)4115673-0 s Mikroelektronik (DE-588)4039207-7 s DE-604 Rossnagel, Stephen M. Verfasser aut Thin films 26 (DE-604)BV010579552 26 |
| spellingShingle | Powell, Ronald A. Rossnagel, Stephen M. PVD for microelectronics sputter deposition applied to semiconductor manufacturing Thin films Couches minces - Surfaces ram Física geral larpcal Microélectronique ram Pulvérisation (Physique) ram Thin film devices Design and construction Thin films Vapor-plating PVD-Verfahren (DE-588)4115673-0 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| subject_GND | (DE-588)4115673-0 (DE-588)4039207-7 |
| title | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_auth | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_exact_search | PVD for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_full | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell ; Stephen M. Rossnagel |
| title_fullStr | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell ; Stephen M. Rossnagel |
| title_full_unstemmed | PVD for microelectronics sputter deposition applied to semiconductor manufacturing Ronald A. Powell ; Stephen M. Rossnagel |
| title_short | PVD for microelectronics |
| title_sort | pvd for microelectronics sputter deposition applied to semiconductor manufacturing |
| title_sub | sputter deposition applied to semiconductor manufacturing |
| topic | Couches minces - Surfaces ram Física geral larpcal Microélectronique ram Pulvérisation (Physique) ram Thin film devices Design and construction Thin films Vapor-plating PVD-Verfahren (DE-588)4115673-0 gnd Mikroelektronik (DE-588)4039207-7 gnd |
| topic_facet | Couches minces - Surfaces Física geral Microélectronique Pulvérisation (Physique) Thin film devices Design and construction Thin films Vapor-plating PVD-Verfahren Mikroelektronik |
| volume_link | (DE-604)BV010579552 |
| work_keys_str_mv | AT powellronalda pvdformicroelectronicssputterdepositionappliedtosemiconductormanufacturing AT rossnagelstephenm pvdformicroelectronicssputterdepositionappliedtosemiconductormanufacturing |