Plasma processes for semiconductor fabrication:
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Cambridge [u.a.]
Cambridge Univ. Press
1999
|
| Edition: | 1. publ. |
| Series: | Cambridge studies in semiconductor physics and microelectronic engineering
8 |
| Subjects: | |
| Physical Description: | IX, 221 S. graph. Darst. |
| ISBN: | 0521591759 |
Staff View
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV012562626 | ||
| 003 | DE-604 | ||
| 005 | 19991022 | ||
| 007 | t| | ||
| 008 | 990517s1999 xx d||| |||| 00||| eng d | ||
| 020 | |a 0521591759 |9 0-521-59175-9 | ||
| 035 | |a (OCoLC)611907349 | ||
| 035 | |a (DE-599)BVBBV012562626 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-703 |a DE-29T |a DE-355 |a DE-20 | ||
| 080 | |a 66 | ||
| 084 | |a ZM 7680 |0 (DE-625)160562: |2 rvk | ||
| 100 | 1 | |a Hitchon, William N. G. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Plasma processes for semiconductor fabrication |c W. N. G. Hitchon |
| 250 | |a 1. publ. | ||
| 264 | 1 | |a Cambridge [u.a.] |b Cambridge Univ. Press |c 1999 | |
| 300 | |a IX, 221 S. |b graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Cambridge studies in semiconductor physics and microelectronic engineering |v 8 | |
| 650 | 0 | 7 | |a Halbleiter |0 (DE-588)4022993-2 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fertigung |0 (DE-588)4016899-2 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Halbleiter |0 (DE-588)4022993-2 |D s |
| 689 | 0 | 1 | |a Fertigung |0 (DE-588)4016899-2 |D s |
| 689 | 0 | 2 | |a Plasmaätzen |0 (DE-588)4174821-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 830 | 0 | |a Cambridge studies in semiconductor physics and microelectronic engineering |v 8 |w (DE-604)BV009142123 |9 8 | |
| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-008530609 | |
Record in the Search Index
| _version_ | 1835743752104181760 |
|---|---|
| adam_text | |
| any_adam_object | |
| author | Hitchon, William N. G. |
| author_facet | Hitchon, William N. G. |
| author_role | aut |
| author_sort | Hitchon, William N. G. |
| author_variant | w n g h wng wngh |
| building | Verbundindex |
| bvnumber | BV012562626 |
| classification_rvk | ZM 7680 |
| ctrlnum | (OCoLC)611907349 (DE-599)BVBBV012562626 |
| discipline | Werkstoffwissenschaften / Fertigungstechnik |
| edition | 1. publ. |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00000nam a2200000 cb4500</leader><controlfield tag="001">BV012562626</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">19991022</controlfield><controlfield tag="007">t|</controlfield><controlfield tag="008">990517s1999 xx d||| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0521591759</subfield><subfield code="9">0-521-59175-9</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)611907349</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV012562626</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-20</subfield></datafield><datafield tag="080" ind1=" " ind2=" "><subfield code="a">66</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZM 7680</subfield><subfield code="0">(DE-625)160562:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Hitchon, William N. G.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma processes for semiconductor fabrication</subfield><subfield code="c">W. N. G. Hitchon</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">1. publ.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Cambridge [u.a.]</subfield><subfield code="b">Cambridge Univ. Press</subfield><subfield code="c">1999</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">IX, 221 S.</subfield><subfield code="b">graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Cambridge studies in semiconductor physics and microelectronic engineering</subfield><subfield code="v">8</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fertigung</subfield><subfield code="0">(DE-588)4016899-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Fertigung</subfield><subfield code="0">(DE-588)4016899-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Cambridge studies in semiconductor physics and microelectronic engineering</subfield><subfield code="v">8</subfield><subfield code="w">(DE-604)BV009142123</subfield><subfield code="9">8</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-008530609</subfield></datafield></record></collection> |
| id | DE-604.BV012562626 |
| illustrated | Illustrated |
| indexdate | 2025-06-23T18:01:07Z |
| institution | BVB |
| isbn | 0521591759 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008530609 |
| oclc_num | 611907349 |
| open_access_boolean | |
| owner | DE-703 DE-29T DE-355 DE-BY-UBR DE-20 |
| owner_facet | DE-703 DE-29T DE-355 DE-BY-UBR DE-20 |
| physical | IX, 221 S. graph. Darst. |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | Cambridge Univ. Press |
| record_format | marc |
| series | Cambridge studies in semiconductor physics and microelectronic engineering |
| series2 | Cambridge studies in semiconductor physics and microelectronic engineering |
| spelling | Hitchon, William N. G. Verfasser aut Plasma processes for semiconductor fabrication W. N. G. Hitchon 1. publ. Cambridge [u.a.] Cambridge Univ. Press 1999 IX, 221 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Cambridge studies in semiconductor physics and microelectronic engineering 8 Halbleiter (DE-588)4022993-2 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Fertigung (DE-588)4016899-2 gnd rswk-swf Halbleiter (DE-588)4022993-2 s Fertigung (DE-588)4016899-2 s Plasmaätzen (DE-588)4174821-9 s DE-604 Cambridge studies in semiconductor physics and microelectronic engineering 8 (DE-604)BV009142123 8 |
| spellingShingle | Hitchon, William N. G. Plasma processes for semiconductor fabrication Cambridge studies in semiconductor physics and microelectronic engineering Halbleiter (DE-588)4022993-2 gnd Plasmaätzen (DE-588)4174821-9 gnd Fertigung (DE-588)4016899-2 gnd |
| subject_GND | (DE-588)4022993-2 (DE-588)4174821-9 (DE-588)4016899-2 |
| title | Plasma processes for semiconductor fabrication |
| title_auth | Plasma processes for semiconductor fabrication |
| title_exact_search | Plasma processes for semiconductor fabrication |
| title_full | Plasma processes for semiconductor fabrication W. N. G. Hitchon |
| title_fullStr | Plasma processes for semiconductor fabrication W. N. G. Hitchon |
| title_full_unstemmed | Plasma processes for semiconductor fabrication W. N. G. Hitchon |
| title_short | Plasma processes for semiconductor fabrication |
| title_sort | plasma processes for semiconductor fabrication |
| topic | Halbleiter (DE-588)4022993-2 gnd Plasmaätzen (DE-588)4174821-9 gnd Fertigung (DE-588)4016899-2 gnd |
| topic_facet | Halbleiter Plasmaätzen Fertigung |
| volume_link | (DE-604)BV009142123 |
| work_keys_str_mv | AT hitchonwilliamng plasmaprocessesforsemiconductorfabrication |