Ultra clean processing of silicon surfaces: proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998
Gespeichert in:
| Format: | Tagungsbericht Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Uetikon-Zürich
Scitec Publ.
1999
|
| Schriftenreihe: | Diffusion and defect data
B, Solid state phenomena ; 65/66 |
| Schlagworte: | |
| Beschreibung: | XIV, 301 S. Ill., graph. Darst. |
| ISBN: | 3908450403 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV012419659 | ||
| 003 | DE-604 | ||
| 005 | 20110726 | ||
| 007 | t | ||
| 008 | 990223s1999 ad|| |||| 10||| eng d | ||
| 020 | |a 3908450403 |9 3-908450-40-3 | ||
| 035 | |a (OCoLC)246169610 | ||
| 035 | |a (DE-599)BVBBV012419659 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-29T |a DE-703 |a DE-898 |a DE-706 | ||
| 084 | |a UP 7570 |0 (DE-625)146436: |2 rvk | ||
| 084 | |a ZN 4150 |0 (DE-625)157360: |2 rvk | ||
| 245 | 1 | 0 | |a Ultra clean processing of silicon surfaces |b proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 |c ed.: Marc Heyns ... |
| 264 | 1 | |a Uetikon-Zürich |b Scitec Publ. |c 1999 | |
| 300 | |a XIV, 301 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Diffusion and defect data : B, Solid state phenomena |v 65/66 | |
| 650 | 0 | 7 | |a Halbleiter |0 (DE-588)4022993-2 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Silicium |0 (DE-588)4077445-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Oberfläche |0 (DE-588)4042907-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Reinraumtechnik |0 (DE-588)4177592-2 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Oberflächenreinigung |0 (DE-588)4204243-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1998 |z Ostende |2 gnd-content | |
| 689 | 0 | 0 | |a Silicium |0 (DE-588)4077445-4 |D s |
| 689 | 0 | 1 | |a Oberfläche |0 (DE-588)4042907-6 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Halbleiter |0 (DE-588)4022993-2 |D s |
| 689 | 1 | 1 | |a Silicium |0 (DE-588)4077445-4 |D s |
| 689 | 1 | 2 | |a Reinraumtechnik |0 (DE-588)4177592-2 |D s |
| 689 | 1 | 3 | |a Oberflächenreinigung |0 (DE-588)4204243-4 |D s |
| 689 | 1 | |5 DE-604 | |
| 700 | 1 | |a Heyns, Marc |e Sonstige |4 oth | |
| 711 | 2 | |a International Symposium on Ultra Clean Processing of Silicon Surfaces |n 4 |d 1998 |c Ostende |j Sonstige |0 (DE-588)1901688-8 |4 oth | |
| 830 | 0 | |a Diffusion and defect data |v B, Solid state phenomena ; 65/66 |w (DE-604)BV021637351 |9 65/66 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-008427207 | ||
Datensatz im Suchindex
| _version_ | 1804127056543350784 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV012419659 |
| classification_rvk | UP 7570 ZN 4150 |
| ctrlnum | (OCoLC)246169610 (DE-599)BVBBV012419659 |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Conference Proceeding Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02073nam a2200481 cb4500</leader><controlfield tag="001">BV012419659</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20110726 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">990223s1999 ad|| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">3908450403</subfield><subfield code="9">3-908450-40-3</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)246169610</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV012419659</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-29T</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-898</subfield><subfield code="a">DE-706</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7570</subfield><subfield code="0">(DE-625)146436:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4150</subfield><subfield code="0">(DE-625)157360:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Ultra clean processing of silicon surfaces</subfield><subfield code="b">proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998</subfield><subfield code="c">ed.: Marc Heyns ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Uetikon-Zürich</subfield><subfield code="b">Scitec Publ.</subfield><subfield code="c">1999</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIV, 301 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Diffusion and defect data : B, Solid state phenomena</subfield><subfield code="v">65/66</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Oberfläche</subfield><subfield code="0">(DE-588)4042907-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Reinraumtechnik</subfield><subfield code="0">(DE-588)4177592-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Oberflächenreinigung</subfield><subfield code="0">(DE-588)4204243-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1998</subfield><subfield code="z">Ostende</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Oberfläche</subfield><subfield code="0">(DE-588)4042907-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Halbleiter</subfield><subfield code="0">(DE-588)4022993-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="2"><subfield code="a">Reinraumtechnik</subfield><subfield code="0">(DE-588)4177592-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="3"><subfield code="a">Oberflächenreinigung</subfield><subfield code="0">(DE-588)4204243-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Heyns, Marc</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="711" ind1="2" ind2=" "><subfield code="a">International Symposium on Ultra Clean Processing of Silicon Surfaces</subfield><subfield code="n">4</subfield><subfield code="d">1998</subfield><subfield code="c">Ostende</subfield><subfield code="j">Sonstige</subfield><subfield code="0">(DE-588)1901688-8</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Diffusion and defect data</subfield><subfield code="v">B, Solid state phenomena ; 65/66</subfield><subfield code="w">(DE-604)BV021637351</subfield><subfield code="9">65/66</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-008427207</subfield></datafield></record></collection> |
| genre | (DE-588)1071861417 Konferenzschrift 1998 Ostende gnd-content |
| genre_facet | Konferenzschrift 1998 Ostende |
| id | DE-604.BV012419659 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:27:17Z |
| institution | BVB |
| institution_GND | (DE-588)1901688-8 |
| isbn | 3908450403 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008427207 |
| oclc_num | 246169610 |
| open_access_boolean | |
| owner | DE-29T DE-703 DE-898 DE-BY-UBR DE-706 |
| owner_facet | DE-29T DE-703 DE-898 DE-BY-UBR DE-706 |
| physical | XIV, 301 S. Ill., graph. Darst. |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | Scitec Publ. |
| record_format | marc |
| series | Diffusion and defect data |
| series2 | Diffusion and defect data : B, Solid state phenomena |
| spelling | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 ed.: Marc Heyns ... Uetikon-Zürich Scitec Publ. 1999 XIV, 301 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Diffusion and defect data : B, Solid state phenomena 65/66 Halbleiter (DE-588)4022993-2 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf Oberfläche (DE-588)4042907-6 gnd rswk-swf Reinraumtechnik (DE-588)4177592-2 gnd rswk-swf Oberflächenreinigung (DE-588)4204243-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1998 Ostende gnd-content Silicium (DE-588)4077445-4 s Oberfläche (DE-588)4042907-6 s DE-604 Halbleiter (DE-588)4022993-2 s Reinraumtechnik (DE-588)4177592-2 s Oberflächenreinigung (DE-588)4204243-4 s Heyns, Marc Sonstige oth International Symposium on Ultra Clean Processing of Silicon Surfaces 4 1998 Ostende Sonstige (DE-588)1901688-8 oth Diffusion and defect data B, Solid state phenomena ; 65/66 (DE-604)BV021637351 65/66 |
| spellingShingle | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 Diffusion and defect data Halbleiter (DE-588)4022993-2 gnd Silicium (DE-588)4077445-4 gnd Oberfläche (DE-588)4042907-6 gnd Reinraumtechnik (DE-588)4177592-2 gnd Oberflächenreinigung (DE-588)4204243-4 gnd |
| subject_GND | (DE-588)4022993-2 (DE-588)4077445-4 (DE-588)4042907-6 (DE-588)4177592-2 (DE-588)4204243-4 (DE-588)1071861417 |
| title | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 |
| title_auth | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 |
| title_exact_search | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 |
| title_full | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 ed.: Marc Heyns ... |
| title_fullStr | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 ed.: Marc Heyns ... |
| title_full_unstemmed | Ultra clean processing of silicon surfaces proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 ed.: Marc Heyns ... |
| title_short | Ultra clean processing of silicon surfaces |
| title_sort | ultra clean processing of silicon surfaces proceedings of the fourth international symposium on ultra clean processing of silicon surfaces ucpss 98 held in ostend belgium september 21 23 1998 |
| title_sub | proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 21 - 23, 1998 |
| topic | Halbleiter (DE-588)4022993-2 gnd Silicium (DE-588)4077445-4 gnd Oberfläche (DE-588)4042907-6 gnd Reinraumtechnik (DE-588)4177592-2 gnd Oberflächenreinigung (DE-588)4204243-4 gnd |
| topic_facet | Halbleiter Silicium Oberfläche Reinraumtechnik Oberflächenreinigung Konferenzschrift 1998 Ostende |
| volume_link | (DE-604)BV021637351 |
| work_keys_str_mv | AT heynsmarc ultracleanprocessingofsiliconsurfacesproceedingsofthefourthinternationalsymposiumonultracleanprocessingofsiliconsurfacesucpss98heldinostendbelgiumseptember21231998 AT internationalsymposiumonultracleanprocessingofsiliconsurfacesostende ultracleanprocessingofsiliconsurfacesproceedingsofthefourthinternationalsymposiumonultracleanprocessingofsiliconsurfacesucpss98heldinostendbelgiumseptember21231998 |