Plasma processing of semiconductors:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Dordrecht [u.a.]
Kluwer Acad. Publ.
1997
|
| Schriftenreihe: | NATO: [Nato ASI series / E]
336 |
| Schlagworte: | |
| Beschreibung: | X, 613 Ill., graph. Darst. |
| ISBN: | 0792345673 |
Internformat
MARC
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| 245 | 1 | 0 | |a Plasma processing of semiconductors |c ed. by P. F. Williams |
| 264 | 1 | |a Dordrecht [u.a.] |b Kluwer Acad. Publ. |c 1997 | |
| 300 | |a X, 613 |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a NATO: [Nato ASI series / E] |v 336 | |
| 650 | 7 | |a Plasmas (gaz ionisés) - Congrès |2 ram | |
| 650 | 7 | |a Semiconducteurs - Congrès |2 ram | |
| 650 | 7 | |a Technique des plasmas - Congrès |2 ram | |
| 650 | 4 | |a Plasma chemistry |x Industrial applications | |
| 650 | 4 | |a Plasma engineering | |
| 650 | 4 | |a Plasma etching |x Industrial applications | |
| 650 | 4 | |a Semiconductors |x Etching | |
| 650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
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| 700 | 1 | |a Williams, P. F. |e Sonstige |4 oth | |
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Datensatz im Suchindex
| _version_ | 1804126109008134144 |
|---|---|
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| building | Verbundindex |
| bvnumber | BV011582317 |
| callnumber-first | T - Technology |
| callnumber-label | TA2020 |
| callnumber-raw | TA2020 |
| callnumber-search | TA2020 |
| callnumber-sort | TA 42020 |
| callnumber-subject | TA - General and Civil Engineering |
| classification_rvk | UP 7570 |
| ctrlnum | (OCoLC)36746516 (DE-599)BVBBV011582317 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| genre | (DE-588)1071861417 Konferenzschrift 1996 Bonas gnd-content |
| genre_facet | Konferenzschrift 1996 Bonas |
| id | DE-604.BV011582317 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:12:13Z |
| institution | BVB |
| isbn | 0792345673 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007800076 |
| oclc_num | 36746516 |
| open_access_boolean | |
| owner | DE-703 DE-1050 DE-83 |
| owner_facet | DE-703 DE-1050 DE-83 |
| physical | X, 613 Ill., graph. Darst. |
| publishDate | 1997 |
| publishDateSearch | 1997 |
| publishDateSort | 1997 |
| publisher | Kluwer Acad. Publ. |
| record_format | marc |
| series2 | NATO: [Nato ASI series / E] |
| spelling | Plasma processing of semiconductors ed. by P. F. Williams Dordrecht [u.a.] Kluwer Acad. Publ. 1997 X, 613 Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier NATO: [Nato ASI series / E] 336 Plasmas (gaz ionisés) - Congrès ram Semiconducteurs - Congrès ram Technique des plasmas - Congrès ram Plasma chemistry Industrial applications Plasma engineering Plasma etching Industrial applications Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1996 Bonas gnd-content Halbleiter (DE-588)4022993-2 s Plasmaätzen (DE-588)4174821-9 s DE-604 Williams, P. F. Sonstige oth E] NATO: [Nato ASI series 336 (DE-604)BV000007015 336 |
| spellingShingle | Plasma processing of semiconductors Plasmas (gaz ionisés) - Congrès ram Semiconducteurs - Congrès ram Technique des plasmas - Congrès ram Plasma chemistry Industrial applications Plasma engineering Plasma etching Industrial applications Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiter (DE-588)4022993-2 gnd |
| subject_GND | (DE-588)4174821-9 (DE-588)4022993-2 (DE-588)1071861417 |
| title | Plasma processing of semiconductors |
| title_auth | Plasma processing of semiconductors |
| title_exact_search | Plasma processing of semiconductors |
| title_full | Plasma processing of semiconductors ed. by P. F. Williams |
| title_fullStr | Plasma processing of semiconductors ed. by P. F. Williams |
| title_full_unstemmed | Plasma processing of semiconductors ed. by P. F. Williams |
| title_short | Plasma processing of semiconductors |
| title_sort | plasma processing of semiconductors |
| topic | Plasmas (gaz ionisés) - Congrès ram Semiconducteurs - Congrès ram Technique des plasmas - Congrès ram Plasma chemistry Industrial applications Plasma engineering Plasma etching Industrial applications Semiconductors Etching Plasmaätzen (DE-588)4174821-9 gnd Halbleiter (DE-588)4022993-2 gnd |
| topic_facet | Plasmas (gaz ionisés) - Congrès Semiconducteurs - Congrès Technique des plasmas - Congrès Plasma chemistry Industrial applications Plasma engineering Plasma etching Industrial applications Semiconductors Etching Plasmaätzen Halbleiter Konferenzschrift 1996 Bonas |
| volume_link | (DE-604)BV000007015 |
| work_keys_str_mv | AT williamspf plasmaprocessingofsemiconductors |