Zur Strahlenchemie polymerer Röntgenresists:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | German |
| Veröffentlicht: |
1995
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| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Bonn, Univ., Diss., 1995 |
| Beschreibung: | 84 S. graph. Darst. |
Internformat
MARC
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Datensatz im Suchindex
| _version_ | 1812453719955996672 |
|---|---|
| adam_text |
INHALTSVERZEICHNIS
1 MOTIVATION UND ZIEL DER ARBEIT 2
2 EIGENSCHAFTEN DER UNTERSUCHTEN RESISTPOLYMER/ENTWICKLER-SYSTEME 8
2.1 POLY(METHYL-METHACRYLAT)/GG-ENTWICKLER. G
2.2 HOMO- UND COPOLYMERE AUS DI-LACTID UND DI-GLYCOLID. 10
3 ANALYTISCHE METHODEN ZUR AUFKLAERUNG DER STRAHLENCHEMIE POLYMERER RE-
SISTS: VORSTELLUNG UND ERGEBNISSE U
3.1 GEL-PERMEATIONS-CHROMATOGRAPHIE (GPC). 11
3.2 MASSENSPEKTROMETRIE GASFOERMIGER STRAHLENCHEMISCHER EDUKTE. 24
3.3 FOURIER-TRANSFORM INFRAROT-SPEKTROSKOPIE. 35
3.4 TITRIMETRISCHE BESTIMMUNG STRAHLENCHEMISCH GEBILDETER
CARBONSAEUREGRUPPEN 47
3.5 ELEKTRONENSPIN-RESONANZ-SPEKTROSKOPIE. 55
4 STRAHLENCHEMISCHE REAKTIONSMECHANISMEN 64
4.1 POLY(L-LACTID-CO-GLYCOLID 10%). 64
4.2 PMMA. 65
5 STUDIEN ZUM LOESUNGSVERHALTEN EINIGER RESIST/ENTWICKLER-SYSTEME 68
6 ZUSAMMENFASSUNG UND AUSBLICK 74
1
BIBLIOGRAFISCHE INFORMATIONEN
HTTP://D-NB.INFO/945156553 |
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| author | Wollersheim, Olaf |
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| illustrated | Illustrated |
| indexdate | 2024-10-09T16:16:00Z |
| institution | BVB |
| language | German |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006879188 |
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| physical | 84 S. graph. Darst. |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
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| spelling | Wollersheim, Olaf Verfasser aut Zur Strahlenchemie polymerer Röntgenresists vorgelegt von Olaf Wollersheim 1995 84 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Bonn, Univ., Diss., 1995 Strahlenchemie (DE-588)4137372-8 gnd rswk-swf Polymethylmethacrylate (DE-588)4310108-2 gnd rswk-swf Photoresist (DE-588)4174545-0 gnd rswk-swf Röntgenlithografie (DE-588)4178314-1 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Röntgenlithografie (DE-588)4178314-1 s Photoresist (DE-588)4174545-0 s Polymethylmethacrylate (DE-588)4310108-2 s Strahlenchemie (DE-588)4137372-8 s DE-604 DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006879188&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Wollersheim, Olaf Zur Strahlenchemie polymerer Röntgenresists Strahlenchemie (DE-588)4137372-8 gnd Polymethylmethacrylate (DE-588)4310108-2 gnd Photoresist (DE-588)4174545-0 gnd Röntgenlithografie (DE-588)4178314-1 gnd |
| subject_GND | (DE-588)4137372-8 (DE-588)4310108-2 (DE-588)4174545-0 (DE-588)4178314-1 (DE-588)4113937-9 |
| title | Zur Strahlenchemie polymerer Röntgenresists |
| title_auth | Zur Strahlenchemie polymerer Röntgenresists |
| title_exact_search | Zur Strahlenchemie polymerer Röntgenresists |
| title_full | Zur Strahlenchemie polymerer Röntgenresists vorgelegt von Olaf Wollersheim |
| title_fullStr | Zur Strahlenchemie polymerer Röntgenresists vorgelegt von Olaf Wollersheim |
| title_full_unstemmed | Zur Strahlenchemie polymerer Röntgenresists vorgelegt von Olaf Wollersheim |
| title_short | Zur Strahlenchemie polymerer Röntgenresists |
| title_sort | zur strahlenchemie polymerer rontgenresists |
| topic | Strahlenchemie (DE-588)4137372-8 gnd Polymethylmethacrylate (DE-588)4310108-2 gnd Photoresist (DE-588)4174545-0 gnd Röntgenlithografie (DE-588)4178314-1 gnd |
| topic_facet | Strahlenchemie Polymethylmethacrylate Photoresist Röntgenlithografie Hochschulschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006879188&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT wollersheimolaf zurstrahlenchemiepolymererrontgenresists |