(1993). Surface chemical cleaning and passivation for semiconductor processing: Symposium held April 13-15, 1993, San Francisco, California, USA. Materials Research Society.
Chicago Style (17th ed.) CitationSurface Chemical Cleaning and Passivation for Semiconductor Processing: Symposium Held April 13-15, 1993, San Francisco, California, USA. Pittsburgh: Materials Research Society, 1993.
MLA (9th ed.) CitationSurface Chemical Cleaning and Passivation for Semiconductor Processing: Symposium Held April 13-15, 1993, San Francisco, California, USA. Materials Research Society, 1993.
Warning: These citations may not always be 100% accurate.