Characterization of optical materials:
Saved in:
| Format: | Book |
|---|---|
| Language: | English |
| Published: |
Boston u.a.
Butterworth-Heinemann u.a.
1993
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| Series: | Materials characterization series
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| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Physical Description: | XII, 211 S. Ill., graph. Darst. |
| ISBN: | 0750692987 |
Staff View
MARC
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| 245 | 1 | 0 | |a Characterization of optical materials |c ed. Gregory J. Exarhos ... |
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| 300 | |a XII, 211 S. |b Ill., graph. Darst. | ||
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Record in the Search Index
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|---|---|
| adam_text | CHARACTERIZATION OF OPTICAL MATERIALS EDITOR GREGORY J. EXARHOS MANAGING
EDITOR LEE E. FITZPATRICK * #Y BUTTERWORTH-HEINEMANN BOSTON LONDON
OXFORD SINGAPORE SYDNEY TORONTO WELLINGTON MANNING GREENWICH CONTENTS
PREFACE TO SERIES IX PREFACE X CONTRIBUTORS XII INTRODUCTION I PART I:
INFLUENCE OF SURFACE MORPHOLOGY AND MICROSTRUCTURE ON OPTICAL RESPONSE
CHARACTERIZATION OF SURFACE ROUGHNESS 1.1 INTRODUCTION 9 1.2 WHAT
SURFACE ROUGHNESS IS IO 1.3 HOW SURFACE ROUGHNESS AFFECTS OPTICAL
MEASUREMENTS 14 1.4 HOW SURFACE ROUGHNESS AND SCATTERING ARE MEASURED 14
1.5 CHARACTERIZATION OF SELECTED SURFACES 20 1.6 FUTURE DIRECTIONS 23
CHARACTERIZATION OF THE NEAR-SURFACE REGION USING POLARIZATION-SENSITIVE
OPTICAL TECHNIQUES 2.1 INTRODUCTION 27 2.2 EUIPSOMETRY 29 EXPERIMENTAL
IMPLEMENTATIONS OF EUIPSOMETRY 29. ANALYSIS OF EUIPSOMETRY DATA 32 2.3
MICROSTRUCTURAL DETERMINATIONS FROM EUIPSOMETRY DATA 34 TEMPERATURE
DEPENDENCE OF THE OPTICAL PROPERTIES OF SILICON 34, DETERMINATION OF THE
OPTICAL FUNCTIONS OF GLASSES USING SE 35 SPECTROSCOPIC EUIPSOMETRY
STUDIES OF SI0 2 /SI YJ, SPECTROSCOPIC EUIPSOMETRY FOR COMPLICATED FILM
STRUCTURES 38, TIME-RESOLVED EUIPSOMETRY 40, SINGLE-WAVELENGTH REAL-TIME
MONITORING OF FILM GROWTH 41, MULTIPLE-WAVELENGTH REAL-TIME MONITORING
OF FILM GROWTH 42, INFRARED EUIPSOMETRY STUDIES OF FUM GROWTH 44 V THE
COMPOSITION, STOICHIOMETRY, AND RELATED MICROSTRUCTURE OF OPTICAL
MATERIALS 3.1 INTRODUCTION 49 3.2 ASPECTS OF RAMAN SCATTERING 50 3.3
III-V SEMICONDUCTOR SYSTEMS 51 3.4 GROUP IV MATERIALS 56 3.5 AMORPHOUS
AND MICROCRYSTALLINE SEMICONDUCTORS 59 CHALCOGENIDE GLASSES 60, GROUP IV
MICROCRYSTALLINE SEMI- CONDUCTORS 63 3.6 SUMMARY 66 DIAMOND AS AN
OPTICAL MATERIAL 4.1 INTRODUCTION 71 4.2 DEPOSITION METHODS 72 - 4.3
OPTICAL PROPERTIES OF CVD DIAMOND 74 4.4 DEFECTS IN CVD DIAMOND 76 4.5
POLISHING CVD DIAMOND 79 4.6 X-RAY WINDOW 80 4.7 SUMMARY 81 PART II:
STABILITY AND MODIFICATION OF FILM AND SURFACE OPTICAL PROPERTIES
MULTILAYER OPTICAL COATINGS 5.1 INTRODUCTION 87 5.2 SINGLE-LAYER OPTICAL
COATINGS 89 OPTICAL CONSTANTS 9 COMPOSITION MEASUREMENT TECHNIQUES 91
5.3 MULTILAYER OPTICAL COATINGS 106 COMPOSITIONAL ANALYSIS 107, SURFACE
ANALYTICAL TECHNIQUES 108, MICROSTRUCTURAL ANALYSIS OF MULTILAYER
OPTICAL COATINGS 109 5.4 STABILITY OF MULTILAYER OPTICAL COATINGS IN 5.5
FUTURE COMPOSITIONAL AND MICROSTRUCTURAL ANALYTICAL TECHNIQUES 113
CHARACTERIZATION AND CONTROL OF STRESS IN OPTICAL FILMS 6.1 INTRODUCTION
117 6.2 ORIGINS OF STRESS 119 VI CONTENTS 6.3 TECHNIQUES FOR MODIFYING
OR CONTROLLING FILM STRESS 124 EFFECT OF DEPOSITION PARAMETERS 124,
EFFECT OF ION-ASSISTED DEPOSITION 127, EFFECT OF IMPURITIES 127, EFFECT
OF POST DEPOSITION ANNEALING 128 6.4 STRESS MEASUREMENT TECHNIQUES 130
SUBSTRATE DEFORMATION 130, X-RAY DIFFRACTION (XRD) 133, RAMAN
SPECTROSCOPY 134 6.5 FUTURE DIRECTIONS 136 SURFACE MODIFICATION OF
OPTICAL MATERIALS 7.1 INTRODUCTION 141 7.2 FUNDAMENTAL PROCESSES 142
ION-SOLID INTERACTIONS 142, DEFECT PRODUCTION, REARRANGEMENT, AND
RETENTION 143 7.3 ION IMPLANTATION OF SOME OPTICAL MATERIALS 145 GLASSES
AND AMORPHOUS SILICA 145, **-QUARTZ (SI0 2 ) 147, HALIDES 148, SAPPHIRE
(A-AL 2 0 3 ) 149, LINB0 3 152, PREPARATION OF OPTICAL COMPONENTS BY ION
IMPLANTATION 153 LASER-INDUCED DAMAGE TO OPTICAL MATERIALS 8.1
INTRODUCTION 157 8.2 LASER DAMAGE DEFINITION AND STATISTICS 158 DEFINING
DAMAGE 158, COLLECTING DAMAGE STATISTICAL DATA 159» TYPES OF DAMAGE
PROBABILITY DISTRIBUTIONS 160, IDENTIFICATION OF PRE-DAMAGE SITES 160,
CHANGING THE DAMAGE THRESHOLD L6L 8.3 IN SITU DIAGNOSTICS 165
PHOTOTHERMAL TECHNIQUES 165, PARTICLE EMISSION 168 8.4 POSTMORTEM
DIAGNOSTICS 170 SURFACE CHARGE STATE 170, SURFACE PHASE AND STRUCTURE
ANALYSIS 171 8.5 FUTURE DIRECTIONS 174 APPENDIX: TECHNIQUE SUMMARIES 1
AUGER ELECTRON SPECTROSCOPY (AES) 181 2 CATHODOLUMINESCENCE (CL) 182 3
ELECTRON ENERGY-LOSS SPECTROSCOPY IN THE TRANSMISSION ELECTRON
MICROSCOPE (EELS) 183 4 ENERGY-DISPERSIVE X-RAY SPECTROSCOPY (EDS) 184 5
FOURIER TRANSFORM INFRARED SPECTROSCOPY (FTIR) 185 6 LIGHT MICROSCOPY
186 CONTENTS VII 7 MODULATION SPECTROSCOPY 187 8 NUCLEAR REACTION
ANALYSIS (NRA) 188 9 OPTICAL SCATTEROMETRY 189 10 PHOTOLUMINESCENCE (PL)
190 11 PHOTOTHERMAL DISPLACEMENT TECHNIQUE 191 12 RAMAN SPECTROSCOPY 193
13 RUTHERFORD BACKSCATTERING SPECTROMETRY (RBS) 194 14 SCANNING ELECTRON
MICROSCOPY (SEM) 195 15 SCANNING TRANSMISSION ELECTRON MICROSCOPY (STEM)
196 16 SCANNING TUNNELING MICROSCOPY AND SCANNING FORCE MICROSCOPY (STM
AND SFM) 197 17 STATIC SECONDARY ION MASS SPECTROMETRY (STATIC SIMS) 198
18 SURFACE ROUGHNESS: MEASUREMENT, FORMATION BY SPUTTERING, IMPACT ON
DEPTH PROFILING 199 19 TOTAL INTERNAL REFLECTION MICROSCOPY 200 20
TRANSMISSION ELECTRON MICROSCOPY (***) 202 21 VARIABLE-ANGLE
SPECTROSCOPIC ELLIPSOMETRY (VASE) 203 22 X-RAY DIFFRACTION (XRD) 204 23
X-RAY FLUORESCENCE (XRF) 205 24 X-RAY PHOTOELECTRON SPECTROSCOPY (XPS)
206 INDEX 207 VIII CONTENTS
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| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| institution | BVB |
| isbn | 0750692987 |
| language | English |
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| physical | XII, 211 S. Ill., graph. Darst. |
| publishDate | 1993 |
| publishDateSearch | 1993 |
| publishDateSort | 1993 |
| publisher | Butterworth-Heinemann u.a. |
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| series2 | Materials characterization series |
| spelling | Characterization of optical materials ed. Gregory J. Exarhos ... Boston u.a. Butterworth-Heinemann u.a. 1993 XII, 211 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials characterization series Materiaalonderzoek gtt Optische eigenschappen gtt Optical materials Optical materials Surfaces Optische Eigenschaft (DE-588)4123887-4 gnd rswk-swf Optischer Werkstoff (DE-588)4172680-7 gnd rswk-swf Optischer Werkstoff (DE-588)4172680-7 s Optische Eigenschaft (DE-588)4123887-4 s DE-604 Exarhos, Gregory J. Sonstige oth GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006355508&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Characterization of optical materials Materiaalonderzoek gtt Optische eigenschappen gtt Optical materials Optical materials Surfaces Optische Eigenschaft (DE-588)4123887-4 gnd Optischer Werkstoff (DE-588)4172680-7 gnd |
| subject_GND | (DE-588)4123887-4 (DE-588)4172680-7 |
| title | Characterization of optical materials |
| title_auth | Characterization of optical materials |
| title_exact_search | Characterization of optical materials |
| title_full | Characterization of optical materials ed. Gregory J. Exarhos ... |
| title_fullStr | Characterization of optical materials ed. Gregory J. Exarhos ... |
| title_full_unstemmed | Characterization of optical materials ed. Gregory J. Exarhos ... |
| title_short | Characterization of optical materials |
| title_sort | characterization of optical materials |
| topic | Materiaalonderzoek gtt Optische eigenschappen gtt Optical materials Optical materials Surfaces Optische Eigenschaft (DE-588)4123887-4 gnd Optischer Werkstoff (DE-588)4172680-7 gnd |
| topic_facet | Materiaalonderzoek Optische eigenschappen Optical materials Optical materials Surfaces Optische Eigenschaft Optischer Werkstoff |
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