Simulation der lokalen Oxidation von Silizium unter Berücksichtigung viskoelastischen Verhaltens des Oxids:
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Bibliographic Details
Main Author: Schott, Klaus (Author)
Format: Book
Language:Undetermined
Published: 1991
Subjects:
Item Description:Erlangen-Nürnberg, Univ., Diss.
Physical Description:91 S. Ill., graph. Darst.

There is no print copy available.

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