Rapid thermal and related processing techniques: 2 - 3 October 1990, Santa Clara, California
Saved in:
| Format: | Book |
|---|---|
| Language: | English |
| Published: |
Bellingham, Washington, USA
SPIE
1991
|
| Series: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
1393 |
| Subjects: | |
| Online Access: | Inhaltsverzeichnis |
| Item Description: | Literaturangaben |
| Physical Description: | IX, 422 S. Ill., graph. Darst. |
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MARC
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| 245 | 1 | 0 | |a Rapid thermal and related processing techniques |b 2 - 3 October 1990, Santa Clara, California |c Rajendra Singh ... chairs/eds. |
| 264 | 1 | |a Bellingham, Washington, USA |b SPIE |c 1991 | |
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| 490 | 1 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 1393 | |
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Rapid thermal processing |v Congresses | |
| 650 | 4 | |a Semiconductor doping |v Congresses | |
| 650 | 4 | |a Semiconductors |x Heat treatment |v Congresses | |
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Record in the Search Index
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|---|---|
| adam_text | RAPID
THERMAL
AND RELATED PROCESSING TECHNIQUES
Volume
1393
CONTENTS
Conference Committee
................................................................
vii
Introduction
..........................................................................ix
PLENARY PAPERS
ШЗ
-PLOł
From VLSI to ULSb the subhalf micron challenge
P. K. Chatterjee, Texas Instruments
Inc
....................................................2
1393-PL02
Precompetitíve
cooperative research: the culture of the
*908
W.
С.
Holton,
Semiconductor
Research
Corp
.............................................27
SESSION
1
MULTIPROCESSING
1393-01
Economic impact of single-wafer multiprocessors (Invited Paper)
S. C
Wood,
К. С
Saraswat, J. M. Harrison, Stanford Univ
..................................36
1393-02
Multichamber rapid thermal processing (Invited Paper)
P. J.
Rosser,
P. Moynagh, K. B. Affolter, STC Technology Ltd. (UK)
..........................49
1393-03
Rapid thermal processing in the manufacturing technology of contacts to InP-hased
photonic devices (Invited Paper)
A. Katz, AT&T Bell Labs
..............................................................67
1393-04
Integrated rapid isothermal processing (Invited Paper)
R. Singh, Clemson Univ.; S. Sinha, R. P. Thakur,
N.
J. Hsu, Univ. of Oklahoma
.................78
1393-05
Low-temperature in-situ dry cleaning process for epitaxial layer multiprocessing
M. M. Moslehi, Texas Instruments
Inc
....................................................90
1393-06
Single-wafer integrated processing as a manufacturing tool using rapid thermal
chemical vapor deposition technology
A. Kermani, RAPRO Technology,
Inc
...................................................109
SESSION
2
DIELECTRICS, SILICIDES, DOPING, AND PROCESS-INDUCED DEFECTS
1393-07
Performance and reliability of ultrathin reoxidized nitrided oxides fabricated
by rapid thermal processing (Invited Paper)
A. B. jfoshi, G. Q.
Lo,
D.
К.
Shih,
D.
Kwong, Univ. of Texas/Austin
.........................122
1393-10
High-temperature degradation-free rapid mermal annealing of GaAs
and InP (Invited Paper)
S. J. Pearton, A. Katz, M. Geva, AT&T Bell Labs
..........................................150
1393-37
High-doee boron implantation and RTP anneal of polysilicon films for shallow
junction diffusion eourceg and interconnects
B. Raicu, Integrated Technology Associates; W. A. Keenan, Prometrix Corp.;
M. L
Current,
Applied Materials, Inc.; D.
Mordo,
A.G. Associates; R. Brennan, Solecon Labs.,
Inc
.............161
1393-13
Rapid thermal annealing of the through-TagS^ film implantation on GaAs
F. Huang, W. S. Chen, National Tsing-Hua Univ. (Taiwan); j. M. Hsu,
National Central Univ. (Taiwan)
........................................................172
1393-14
Anomalous diffusion phenomena in two-step rapid thermal diffusion of phosphorus
B. Cho,
С
Kim, Korea Advanced Institute of Science and Technology (Korea)
..................180
(continued)
RAPID
THERMAL
AND RELATED PROCESSING TECHNIQUES
Volume
1393
1393-15
Investigation of rapid thermal process-induced defects in ion-implanted
Czochralski silicon
C. В.
Yarling, Process Products Corp.; S.
Hahn,
Siitec Silicon; D. T.
Hódul, Varian
Research
Ctr.; H.
Suga,
Mitsubishi Metal Corp. (Japan); W. L. Smith, Therma-Wave
Inc
.................192
1393-16
Rapid thermal processing induced defects and
gettering
effects in silicon
B. Hartiti, J.
Muller,
P. Siffert, Ctr.
de Recherches Nucléaires
(France);
T. Vu,
California Institute of Technology
.......................................................200
1393-17
RTP-induced defects in silicon studied by positron annihilation technique
N.
M.
Kulkami,
R.
N.
Kulkami, A.
D. Shaligram, Univ.
of
Poona (India)
......................207
SESSION
3
RAPID
THERMAL
CHEMICAL
VAPOR DEPOSITION
1393-18
Multiple photo-assisted CVD of thin-film materials for
ПІ
-V
device technology
(Invited Paper)
Y. I. Nissim, J. M. Moison, F. Houzay,
F. Lebland,
С.
Licoppe,
M. Bensoussan,
Lab. de
Bagneux/CNET (France)
.......................................................216
1393-19
Low-resistivity contacts to silicon using selective RTCVD of germanium (Invited Paper)
D. T. Grider, M. C.
Öztürk,
J. J. Wortman, M. A. Littlejohn, Y. Zhong,
North Carolina State Univ
.............................................................229
1393-20
Si-based epitaxial growth by rapid thermal processing chemical vapor deposition
K. H. Jung, T. Y. Hsieh, D. Kwong, Univ. of Texas/ Austin; D.
B. Spratt,
Texas Instruments Inc.
.. 240
1393-21
Control of oxygen incorporation and lifetime measurement in Six xGex epitaxial films
grown by rapid thermal chemical vapor deposition
J. C. Sturm, P. V. Schwartz, E. J.
Prinz,
Princeton Univ.; C. W. Magee, Evans East,
Inc
...........252
1393-22
Selective deposition of polycrystalline SL^Ge^ by rapid thermal processing
M. C.
Öztürk,
Y.
Zhong,
D. T.
Grider,
M. Sanganeria, J. J. Wortman, M.
A. Littlejohn,
Norm Carolina
State Univ
.............................................................260
1393-38
Epitaxial regrowth of silicon on sapphire by rapid isothermal processing
R. Madarazo, A. G. Pedrine, A. A. Sol, V. Baranauskas, State Univ. of Campinas (Brazil)
.........270
SESSION
4
PROCESS MONITORING, THERMAL STRESS, TEMPERATURE MEASUREMENT,
AND OTHER EQUIPMENT ISSUES
1393-23
Noninvasive sensors for in-eitu process monitoring and control in advanced
microelectronics manufacturing (Invited Paper)
M. M. Moslehi, Texas Instruments
bic
...................................................280
І
393-24
Systems-oriented survey of noncontact temperature measurement techniques for rapid
thermal processing
D. Peyton, H. Kinoshita, G. Q.
Lo,
D.
Kwong, Univ. of Texas/Austin
........................295
1393-25
Fundamental mechanisms and doping effects in silicon infrared absorption for
temperature measurement by infrared transmission
J. C. Sturm, C. M. Reaves, Princeton Univ
...............................................309
1393-26
Emis«
vity
of «Ikon wafers during rapid thermal processing (Invited Paper)
P. Vandenabeele, K.
Маех,
Interuniversity Microelectronic Ctr. (Belgium)
.....................316
1393-27
Pyrometer modeling for rapid thermal processing
S. C. Wood, P. P.
Apte, T.
King, Stanford Univ.;
M. M.
Moslehi, Texas Instruments Inc.;
К. С
Saraswat, Stanford Univ.
........................................................337
1393-28
In-eitu interferometric measurements in a rapid thermal processor
J. R. Dilhac, C. Ganibal,
N.
Nolhier,
L. Amat, Lab. d Automatique et d Analyse
des Systèmes/CNRS (France)
..........................................................349
КАРГО
THERMAL
AND RELATED PROCESSING TECHNIQUES
Volume
1393
1393-29
RTP temperature uniformity mapping
W. A. Keenan, W. H. Johnson, Prometrix Corp.; D. T.
Hódul, Varian
Research Ctr.;
D.
Mordo, AG
Associates
.............................................................354
1393-30
Noncontacting acoustics-based temperature measurement techniques in rapid
thermal processing
Y. J. Lee, C.
Chou,
В.
T.
Khuri-Yakub,
К. С.
Saraswat, Stanford Univ
........................366
1393-32
Round-robin comparison of temperature nonuniformity during RTP due to
patterned layers
P. Vandenabeele, K.
Маех,
Interuniversity Microelectronic Ctr. (Belgium)
.....................372
1393-33
Adaptive process control for a rapid thermal processor
J. R. Dilhac,
С
Ganibal, J. Bordeneuve, B. Dahhou, L.
Ämat,
Lab. d Automatique et d Analyse
des Systèmes/CNRS (France); A. Picard, SITESA-ADDAX (France)
.........................395
1393-34
Analyste
of temperature distribution and slip in rapid thermal processing
H. Lee, Y. Yoo, H. Shin, Y. Earmme, C. Kim, Korea Advanced Institute of Science
and Technology (Korea)
..............................................................404
1393-35
Uniformity characterization of rapid thermal processor thin films
C.B.
Yarling, Process Products Corp.;
D.M.
Wilson, Prometrix Corp
........................411
Addendum
.........................................................................421
Author Index
.......................................................................422
RAPID
THERMAL
AND RELATED PROCESSING TECHNIQUES
Volume
1393
AUTHOR INDEX
Affolter,
К. В.,
49
Agnello,
P.
D.,
Addendum
Ämat,
U
349, 395
Apte, Pushkar P.,
337
Arias, Louie J.
,
Jr., Addendum
Bararrauskas, Vitor,
270
Bensoussan, M.,
216
Bordeneuve, J.,
395
Brerman, Roger, Addendum,
161
Chatterjee, Pallab K.,
2
Chen,W. S.,
172
Cho, Byung-Jin,
180
Chou,
China
Hua,
366
Current, Michael I.,
161
Dahhou,
В.,
395
Dickey, D. H., Addendum
Dilhac, Jean-Marie R.,
349, 395
Earmme, Youn-Young,
404
Ganibal, Christian,
349, 395
Geva, M.,
150
Grkter, Douglas
T.,
229, 260
Hahn, Sookap, 192
Harrison, J. M.,
36
Hartiti, Bouchaib,
200
Hodul, David
T.,
Addendum,
192, 354
Holton,
William C,
27
Houzay, Francoise,
216
Hsteh, T. Y.,
240
Hsu.J. M.,
172
Hsu,
N.
J.,
78
Huang,
Fon-Shan,
172
Johnson, Waiter H.,
354
Joshi.A.B.,
122
Jung, K. H.,
240
Katz, Avishay,
67, 150
Keenan, W.
Α.,
Addendum,
161, 354
Kermani, Ahmad,
109
Khuri-Yakub,
В. Т.,
366
Kim, Choong-Ki,
180,404
King, Tsu-Jae,
337
Kinoshite, H.,
295
Kutarni,
H. M.,
207
Kulkami. R.
N.. 207
Кттџ.
Own-Lee,
122, 240,296
Lefoten4F.,216
Lee,
Criungrtsjn, Addendum
Lee, Hyouk,
404
tae.YongJ.
386
lis»,
Jimmy C,
Addendum
iteoppe.
С,
21
β
Littlejohn,
Michael
Α.,
229, 260
U, G. Q.,
122, 295
Madarazo, R„
270
Маех,
Karen, 316, 372
Magee, Charles
W.,
252
Moison, Jean M., 216
Mordo,
David, 161, 354
Moslehi, Mehrdad M., 90, 280, 337
Moynagh, P.,
49
Muller, Jean-Claude, 200
Nissim, Yves
I.,
216
Nolhier, N., 349
Öztürk, Mehmet C, 229, 260
Pearton,
S. J.,
150
Pedrine,
A. G.,
270
Petroff, Pierre M., Addendum
Peyton,
David, 295
Picard,
Α.,
395
Prinz,
E. J.,
252
Raicu, Bruha,
161
Reaves,
C.
M.,
309
Rosser, Paul J.,
49
Sanganeria, M.,
260
Saraswat, Krishna C,
36, 337, 366
Sasa,
S.,
Addendum
Schwartz, P. V.,
252
Sedgwick, T. 0.,
Addendum
Shaligram, A. D.,
207
Shih,
Dennis
К.,
122
Shin, Hyun-Dong,
404
Siffert, Paul,
200
Singh, Rajendra,
78
Sinha, Sanjai,
78
Smith,
W. U
192
Sol,
Α. Α.,
270
Spratt,
D.
В.,
240
Sturm,
James C,
252, 309
Suga,
Hisaaki,
192
Thakur,
Randhir P.,
78
Tobias, Eric, Addendum
Vandenabeele, Peter,
316, 372
Vu,
Thuong-Quat,
200
Wilson, Dawn M.,
411
Wood, Samuel C,
36, 337
Wortman, Jim J.,
229,260
Xu, Z., Addendum
Yarting, Charles
В.,
Addendum,
192, 411
Yoo, Young-Don,
404
Zhong. Y.,
229, 260
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| genre | (DE-588)1071861417 Konferenzschrift 1990 Santa Clara Calif. gnd-content |
| genre_facet | Konferenzschrift 1990 Santa Clara Calif. |
| id | DE-604.BV008062143 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:13:42Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-005305216 |
| oclc_num | 23606222 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-83 |
| owner_facet | DE-91 DE-BY-TUM DE-83 |
| physical | IX, 422 S. Ill., graph. Darst. |
| publishDate | 1991 |
| publishDateSearch | 1991 |
| publishDateSort | 1991 |
| publisher | SPIE |
| record_format | marc |
| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California Rajendra Singh ... chairs/eds. Bellingham, Washington, USA SPIE 1991 IX, 422 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1393 Literaturangaben Rapid thermal processing Congresses Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1990 Santa Clara Calif. gnd-content Halbleitertechnologie (DE-588)4158814-9 s DE-604 Singh, Rajendra Sonstige oth Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1393 (DE-604)BV000010887 1393 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005305216&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Rapid thermal processing Congresses Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie (DE-588)4158814-9 gnd |
| subject_GND | (DE-588)4158814-9 (DE-588)1071861417 |
| title | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California |
| title_auth | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California |
| title_exact_search | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California |
| title_full | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California Rajendra Singh ... chairs/eds. |
| title_fullStr | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California Rajendra Singh ... chairs/eds. |
| title_full_unstemmed | Rapid thermal and related processing techniques 2 - 3 October 1990, Santa Clara, California Rajendra Singh ... chairs/eds. |
| title_short | Rapid thermal and related processing techniques |
| title_sort | rapid thermal and related processing techniques 2 3 october 1990 santa clara california |
| title_sub | 2 - 3 October 1990, Santa Clara, California |
| topic | Rapid thermal processing Congresses Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie (DE-588)4158814-9 gnd |
| topic_facet | Rapid thermal processing Congresses Semiconductor doping Congresses Semiconductors Heat treatment Congresses Vapor-plating Congresses Halbleitertechnologie Konferenzschrift 1990 Santa Clara Calif. |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005305216&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV000010887 |
| work_keys_str_mv | AT singhrajendra rapidthermalandrelatedprocessingtechniques23october1990santaclaracalifornia |