Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Mikrofilm Buch |
| Sprache: | French |
| Veröffentlicht: |
1988
|
| Schlagworte: | |
| Beschreibung: | Lausanne, Techn. Hochsch., Diss. - Mikroreprod. e. Ms. 157 S. : Ill., zahlr. graph. Darst. |
| Beschreibung: | 2 Mikrofiches 24x |
Internformat
MARC
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Datensatz im Suchindex
| _version_ | 1804122013579608064 |
|---|---|
| any_adam_object | |
| author | Fazan, Pierre-Christophe |
| author_facet | Fazan, Pierre-Christophe |
| author_role | aut |
| author_sort | Fazan, Pierre-Christophe |
| author_variant | p c f pcf |
| building | Verbundindex |
| bvnumber | BV007660488 |
| ctrlnum | (OCoLC)256407181 (DE-599)BVBBV007660488 |
| format | Microfilm Book |
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| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV007660488 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T17:07:07Z |
| institution | BVB |
| language | French |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-005022623 |
| oclc_num | 256407181 |
| open_access_boolean | |
| owner | DE-355 DE-BY-UBR |
| owner_facet | DE-355 DE-BY-UBR |
| physical | 2 Mikrofiches 24x |
| publishDate | 1988 |
| publishDateSearch | 1988 |
| publishDateSort | 1988 |
| record_format | marc |
| spelling | Fazan, Pierre-Christophe Verfasser aut Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos 1988 2 Mikrofiches 24x txt rdacontent h rdamedia he rdacarrier Lausanne, Techn. Hochsch., Diss. - Mikroreprod. e. Ms. 157 S. : Ill., zahlr. graph. Darst. Siliciumdioxid (DE-588)4077447-8 gnd rswk-swf MOS (DE-588)4130209-6 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Siliciumdioxid (DE-588)4077447-8 s Dünne Schicht (DE-588)4136925-7 s MOS (DE-588)4130209-6 s DE-604 |
| spellingShingle | Fazan, Pierre-Christophe Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos Siliciumdioxid (DE-588)4077447-8 gnd MOS (DE-588)4130209-6 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| subject_GND | (DE-588)4077447-8 (DE-588)4130209-6 (DE-588)4136925-7 (DE-588)4113937-9 |
| title | Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| title_auth | Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| title_exact_search | Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| title_full | Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| title_fullStr | Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| title_full_unstemmed | Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| title_short | Fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| title_sort | fabrication et caracterisation de couches dielektriques minces utilisees en technologie mos |
| topic | Siliciumdioxid (DE-588)4077447-8 gnd MOS (DE-588)4130209-6 gnd Dünne Schicht (DE-588)4136925-7 gnd |
| topic_facet | Siliciumdioxid MOS Dünne Schicht Hochschulschrift |
| work_keys_str_mv | AT fazanpierrechristophe fabricationetcaracterisationdecouchesdielektriquesmincesutiliseesentechnologiemos |