Holdings: Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110)

Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110): a magnetic resonance study in UHV

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Bibliographic Details
Main Author:	Li, Yi (Author)
Format:	Thesis Microfilm Book
Language:	English
Published:	1991
Subjects:	Dünne Schicht Kristallfläche Magnetische Resonanz Nickel Wolfram Hochschulschrift
Physical Description:	2 Mikrofiches 24x

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MARC


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Record in the Search Index

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genre_facet	Hochschulschrift
id	DE-604.BV006173084
illustrated	Not Illustrated
indexdate	2024-07-09T16:41:31Z
institution	BVB
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-003905319
oclc_num	256238747
open_access_boolean
owner	DE-12 DE-29T
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physical	2 Mikrofiches 24x
publishDate	1991
publishDateSearch	1991
publishDateSort	1991
record_format	marc
spelling	Li, Yi Verfasser aut Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV 1991 2 Mikrofiches 24x txt rdacontent h rdamedia he rdacarrier Berlin, Freie Univ., Diss., 1991 Dünne Schicht swd Kristallfläche swd Magnetische Resonanz swd Nickel swd Wolfram swd Wolfram (DE-588)4066862-9 gnd rswk-swf Magnetische Resonanz (DE-588)4196789-6 gnd rswk-swf Kristallfläche (DE-588)4151344-7 gnd rswk-swf Nickel (DE-588)4042133-8 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Nickel (DE-588)4042133-8 s Dünne Schicht (DE-588)4136925-7 s Wolfram (DE-588)4066862-9 s Kristallfläche (DE-588)4151344-7 s Magnetische Resonanz (DE-588)4196789-6 s 1\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	Li, Yi Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV Dünne Schicht swd Kristallfläche swd Magnetische Resonanz swd Nickel swd Wolfram swd Wolfram (DE-588)4066862-9 gnd Magnetische Resonanz (DE-588)4196789-6 gnd Kristallfläche (DE-588)4151344-7 gnd Nickel (DE-588)4042133-8 gnd Dünne Schicht (DE-588)4136925-7 gnd
subject_GND	(DE-588)4066862-9 (DE-588)4196789-6 (DE-588)4151344-7 (DE-588)4042133-8 (DE-588)4136925-7 (DE-588)4113937-9
title	Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV
title_auth	Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV
title_exact_search	Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV
title_full	Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV
title_fullStr	Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV
title_full_unstemmed	Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110) a magnetic resonance study in UHV
title_short	Magnetic critical behavior and anisotropy of ultrathin Ni films on W(110)
title_sort	magnetic critical behavior and anisotropy of ultrathin ni films on w 110 a magnetic resonance study in uhv
title_sub	a magnetic resonance study in UHV
topic	Dünne Schicht swd Kristallfläche swd Magnetische Resonanz swd Nickel swd Wolfram swd Wolfram (DE-588)4066862-9 gnd Magnetische Resonanz (DE-588)4196789-6 gnd Kristallfläche (DE-588)4151344-7 gnd Nickel (DE-588)4042133-8 gnd Dünne Schicht (DE-588)4136925-7 gnd
topic_facet	Dünne Schicht Kristallfläche Magnetische Resonanz Nickel Wolfram Hochschulschrift
work_keys_str_mv	AT liyi magneticcriticalbehaviorandanisotropyofultrathinnifilmsonw110amagneticresonancestudyinuhv

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